Inventor
SASAKI YASUHARU
JP76 patents
⚠️ This page may combine multiple inventors who share the name “SASAKI YASUHARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
35 patentsUSD803802SNov 28, 2017
Electrostatic chuck for semiconductor manufacturing equipment
TOKYO ELECTRON LTD285 citations99
USD802472SNov 14, 2017
Electrostatic chuck for semiconductor manufacturing equipment
TOKYO ELECTRON LTD280 citations99
USD795208SAug 22, 2017
Electrostatic chuck for semiconductor manufacturing equipment
TOKYO ELECTRON LTD445 citations99
USD587222SFeb 24, 2009
Attracting plate of an electrostatic chuck for semiconductor manufacturing
TOKYO ELECTRON LTD55 citations98
USD496008SSep 14, 2004
Exhaust ring for manufacturing semiconductors
TOKYO ELECTRON LTD441 citations98
US7337745B1Mar 4, 2008
Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
TOKYO ELECTRON LTD83 citations97
US7033444B1Apr 25, 2006
Plasma processing apparatus, and electrode structure and table structure of processing apparatus
TOKYO ELECTRON LTD129 citations97
USD992614SJul 18, 2023
Focus ring
TOKYO ELECTRON LTD24 citations94
USD570310SJun 3, 2008
Attracting plate of an electrostatic chuck for semiconductor manufacturing
TOKYO ELECTRON LTD22 citations93
USD992615SJul 18, 2023
Focus ring
TOKYO ELECTRON LTD25 citations91
US8043971B2Oct 25, 2011
Plasma processing apparatus, ring member and plasma processing method
TOKYO ELECTRON LTD13 citations84
US7582491B2Sep 1, 2009
Method for diagnosing electrostatic chuck, vacuum processing apparatus, and storage medium
TOKYO ELECTRON LTD16 citations82
USD1012051SJan 23, 2024
Electrostatic chuck for semiconductor manufacturing device
TOKYO ELECTRON LTD5 citations74
US12046457B2Jul 23, 2024
Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing method
TOKYO ELECTRON LTD2 citations73
US11908666B2Feb 20, 2024
Stage and plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US11935729B2Mar 19, 2024
Substrate support and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US11894218B2Feb 6, 2024
Electrostatic chuck, support platform, and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US11830751B2Nov 28, 2023
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations72
US11538668B2Dec 27, 2022
Mounting stage, substrate processing device, and edge ring
TOKYO ELECTRON LTD2 citations72
US9412635B2Aug 9, 2016
Electrostatic chuck device
TOKYO ELECTRON LTD4 citations72
US11437223B2Sep 6, 2022
Stage and plasma processing apparatus
TOKYO ELECTRON LTD1 citations71
US10388558B2Aug 20, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD2 citations71
US9721822B2Aug 1, 2017
Electrostatic chuck apparatus
TOKYO ELECTRON LTD3 citations71
US11923171B2Mar 5, 2024
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations70
US11664200B2May 30, 2023
Placing table, positioning method of edge ring and substrate processing apparatus
TOKYO ELECTRON LTD2 citations70
US10410902B2Sep 10, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD3 citations69
US9589823B2Mar 7, 2017
Mounting table and plasma processing apparatus
TOKYO ELECTRON LTD4 citations69
US11004717B2May 11, 2021
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD1 citations62
US10886108B2Jan 5, 2021
Power feed structure and plasma processing apparatus
TOKYO ELECTRON LTD1 citations62
US12293903B2May 6, 2025
Substrate support and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US12272528B2Apr 8, 2025
Stage and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11037815B2Jun 15, 2021
Dechuck control method and plasma processing apparatus
TOKYO ELECTRON LTD1 citations61
US10591194B2Mar 17, 2020
Temperature control method
TOKYO ELECTRON LTD1 citations61
US11764038B2Sep 19, 2023
Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program
TOKYO ELECTRON LTD0 citations60
US11688587B2Jun 27, 2023
Substrate support assembly, plasma processing apparatus, and plasma processing method
TOKYO ELECTRON LTD0 citations60
SASAKI YASUHARU
6 patentsUS8696862B2Apr 15, 2014
Substrate mounting table, substrate processing apparatus and substrate temperature control method
SASAKI YASUHARU11 citations84
US8981263B2Mar 17, 2015
Electrostatic chuck apparatus
SASAKI YASUHARU15 citations82
US8823404B2Sep 2, 2014
Evaluation device and evaluation method for substrate mounting apparatus and evaluation substrate used for the same
SASAKI YASUHARU4 citations73
US8950469B2Feb 10, 2015
Temperature control system and temperature control method for substrate mounting table
SASAKI YASUHARU4 citations72
US8573836B2Nov 5, 2013
Apparatus and method for evaluating a substrate mounting device
SASAKI YASUHARU6 citations71
US6753295B1Jun 22, 2004
Plant activator, process for producing the same, activation method, activity promoter and method for applying the promoter
SASAKI YASUHARU6 citations62
ASAHI CHEMICAL IND
5 patentsUS4525589AJun 25, 1985
Isoquinolinesulfonyl derivatives
ASAHI CHEMICAL IND39 citations96
US4456757AJun 26, 1984
Isoquinolinesulfonyl derivatives and process for the preparation thereof
ASAHI CHEMICAL IND61 citations96
US4560755ADec 24, 1985
Isoquinolinesulfonyl derivatives which possess a relaxatory action
ASAHI CHEMICAL IND11 citations73
US4510307AApr 9, 1985
6-Quinazolinesulfonyl derivatives and process for preparation thereof
ASAHI CHEMICAL IND11 citations72
US4048307ASep 13, 1977
Cyclic adenosine monophosphate 8-substituted derivatives
ASAHI CHEMICAL IND15 citations70
HOKKAIDO GREEN KOSAN INC
1 patentSUMITOMO OSAKA CEMENT CO LTD
1 patentYOSHIOKA KEN
1 patentHIMORI SHINJI
1 patentShowing the top 50 of 76 patents by PatentIndex Score.