Inventor
SAIDO SHUHEI
JP46 patents
⚠️ This page may combine multiple inventors who share the name “SAIDO SHUHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
21 patentsUSD916037SApr 13, 2021
Cover of seal cap for reaction chamber for semiconductor
KOKUSAI ELECTRIC CORP9 citations86
USD939459SDec 28, 2021
Boat for wafer processing apparatus
KOKUSAI ELECTRIC CORP15 citations85
USD937385SNov 30, 2021
Return nozzle
KOKUSAI ELECTRIC CORP10 citations85
US10593572B2Mar 17, 2020
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP9 citations84
US10453735B2Oct 22, 2019
Substrate processing apparatus, reaction tube, semiconductor device manufacturing method, and recording medium
KOKUSAI ELECTRIC CORP8 citations84
US11495477B2Nov 8, 2022
Substrate processing apparatus
KOKUSAI ELECTRIC CORP2 citations73
US11384434B2Jul 12, 2022
Substrate processing apparatus and heater device
KOKUSAI ELECTRIC CORP2 citations73
US11219096B2Jan 4, 2022
Substrate processing apparatus and furnace opening assembly thereof
KOKUSAI ELECTRIC CORP3 citations73
US10961625B2Mar 30, 2021
Substrate processing apparatus, reaction tube and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US10731254B2Aug 4, 2020
Protective plate, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP3 citations73
US10714362B2Jul 14, 2020
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US11685992B2Jun 27, 2023
Substrate processing apparatus, quartz reaction tube and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations72
US11261528B2Mar 1, 2022
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP5 citations71
US12344935B2Jul 1, 2025
Substrate processing apparatus, heat insulator assembly and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations70
US12241159B2Mar 4, 2025
Substrate processing apparatus and ceiling heater
KOKUSAI ELECTRIC CORP0 citations62
US11359285B2Jun 14, 2022
Substrate processing apparatus, heater and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
USD928106SAug 17, 2021
Supporting column of insulation unit for semiconductor manufacturing apparatus
KOKUSAI ELECTRIC CORP0 citations62
US12540388B2Feb 3, 2026
Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US12053805B2Aug 6, 2024
Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US11967501B2Apr 23, 2024
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations60
US10923366B2Feb 16, 2021
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations52
HITACHI INT ELECTRIC INC
20 patentsUS8882923B2Nov 11, 2014
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC466 citations99
USD826185SAug 21, 2018
Ceiling heater for substrate processing apparatus
HITACHI INT ELECTRIC INC24 citations94
USD813181SMar 20, 2018
Cover of seal cap for reaction chamber of semiconductor
HITACHI INT ELECTRIC INC41 citations91
USD872037SJan 7, 2020
Cover of seal cap for reaction chamber for semiconductor manufacturing
HITACHI INT ELECTRIC INC9 citations84
USD855027SJul 30, 2019
Cover of seal cap for reaction chamber of semiconductor
HITACHI INT ELECTRIC INC8 citations84
USD847301SApr 30, 2019
Return nozzle
HITACHI INT ELECTRIC INC7 citations84
USD843958SMar 26, 2019
Reaction tube
HITACHI INT ELECTRIC INC8 citations84
USD842823SMar 12, 2019
Reaction tube
HITACHI INT ELECTRIC INC9 citations84
USD825501SAug 14, 2018
Air flow controller for heater of substrate processing apparatus
HITACHI INT ELECTRIC INC6 citations84
US11222796B2Jan 11, 2022
Substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations73
USD825502SAug 14, 2018
Heater for substrate processing apparatus
HITACHI INT ELECTRIC INC2 citations73
US9502237B2Nov 22, 2016
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC5 citations73
US9062376B1Jun 23, 2015
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer readable recording medium
HITACHI INT ELECTRIC INC2 citations63
US10615061B2Apr 7, 2020
Substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations62
US10597780B2Mar 24, 2020
Substrate processing apparatus, heater and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52
USD795209SAug 22, 2017
Heater for semiconductor thermal process
HITACHI INT ELECTRIC INC1 citations52
USD793975SAug 8, 2017
Heater for semiconductor thermal process
HITACHI INT ELECTRIC INC0 citations52
US9365928B2Jun 14, 2016
Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations52
US9957616B2May 1, 2018
Substrate processing apparatus and heating unit
HITACHI INT ELECTRIC INC0 citations42
US10573535B2Feb 25, 2020
Substrate processing apparatus, lid cover and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations39