Inventor · disambiguated record
Duan-Fu Stephen Hsu
Also filed as: HSU DUAN-FU · HSU DUAN-FU STEPHEN
59 granted patents·16 pending applications·523 citations·filing 2002–2025
98Inventor score
Files withASML NETHERLANDS BV45ASML MASKTOOLS BV15HSU DUAN-FU STEPHEN6CHEN JANG FUNG3ASML HOLDING NV2
Top patents by PatentIndex Score
75 records- 0199US11480882B2Flows of optimization for patterning processesASML NETHERLANDS BV·Filed 2021·Granted Oct 25, 2022·4 cites·20 claims
- 0298US11487198B2Patterning device, a method of making the same, and a patterning device design methodASML NETHERLANDS BV·Filed 2021·Granted Nov 1, 2022·3 cites·20 claims
- 0398US6792591B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2002·Granted Sep 14, 2004·160 cites·26 claims
- 0497US10670973B2Coloring aware optimizationASML NETHERLANDS BV·Filed 2016·Granted Jun 2, 2020·16 cites·20 claims
- 0595US10025201B2Flows of optimization for lithographic processesASML NETHERLANDS BV·Filed 2015·Granted Jul 17, 2018·6 cites·20 claims
- 0695US9588438B2Optimization flows of source, mask and projection opticsHSU DUAN-FU·Filed 2011·Granted Mar 7, 2017·60 cites·22 claims
- 0794US10990003B2Binarization method and freeform mask optimization flowASML NETHERLANDS BV·Filed 2019·Granted Apr 27, 2021·6 cites·20 claims
- 0894US10394131B2Image log slope (ILS) optimizationASML NETHERLANDS BV·Filed 2016·Granted Aug 27, 2019·6 cites·20 claims
- 0992US11137690B2Flows of optimization for patterning processesASML NETHERLANDS BV·Filed 2018·Granted Oct 5, 2021·3 cites·19 claims
- 1092US8132130B2Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure processCHEN JANG FUNG·Filed 2006·Granted Mar 6, 2012·15 cites·19 claims
- 1191US8629064B2Multiple patterning lithography using spacer and self-aligned assist patternsLI XIAOYANG·Filed 2011·Granted Jan 14, 2014·13 cites·18 claims
- 1291US8111921B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2007·Granted Feb 7, 2012·19 cites·16 claims
- 1390US7981576B2Method and apparatus for performing dark field double dipole lithography (DDL)ASML MASKTOOLS BV·Filed 2010·Granted Jul 19, 2011·5 cites·7 claims
- 1490US7824826B2Method and apparatus for performing dark field double dipole lithography (DDL)ASML MASKTOOLS BV·Filed 2007·Granted Nov 2, 2010·9 cites·15 claims
- 1590US7138212B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2003·Granted Nov 21, 2006·39 cites·21 claims
- 1689US8391605B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2012·Granted Mar 5, 2013·9 cites·22 claims
- 1788US8122391B2Method, program product and apparatus for performing double exposure lithographyCHEN JANG FUNG·Filed 2010·Granted Feb 21, 2012·4 cites·32 claims
- 1888US7681171B2Method, program product and apparatus for performing double exposure lithographyASML MASKTOOLS BV·Filed 2006·Granted Mar 16, 2010·14 cites·23 claims
- 1988US7666554B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2006·Granted Feb 23, 2010·11 cites·18 claims
- 2087US11586114B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2019·Granted Feb 21, 2023·2 cites·20 claims
- 2185US11126077B2Patterning device, a method of making the same, and a patterning device design methodASML NETHERLANDS BV·Filed 2018·Granted Sep 21, 2021·2 cites·19 claims
- 2285US8910091B2Method, program product and apparatus for performing double exposure lithographyCHEN JANG FUNG·Filed 2012·Granted Dec 9, 2014·3 cites·13 claims
- 2384US8644589B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2013·Granted Feb 4, 2014·8 cites·12 claims
- 2484US7617476B2Method for performing pattern pitch-split decomposition utilizing anchoring featuresASML MASKTOOLS BV·Filed 2007·Granted Nov 10, 2009·7 cites·20 claims
- 2584US7355673B2Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layoutASML MASKTOOLS BV·Filed 2004·Granted Apr 8, 2008·25 cites·11 claims
- 2682US8182969B2Lithographic processing method, and device manufactured therebyHSU DUAN-FU STEPHEN·Filed 2009·Granted May 22, 2012·6 cites·8 claims
- 2782US7434195B2Method for performing full-chip manufacturing reliability checking and correctionASML MASKTOOLS BV·Filed 2005·Granted Oct 7, 2008·13 cites·11 claims
- 2882US6875545B2Method of removing assist features utilized to improve process latitudeASML MASKTOOLS BV·Filed 2002·Granted Apr 5, 2005·27 cites·16 claims
- 2982US2025306453A1Optimization using a non-uniform illumination intensity profileASML HOLDING NV·Filed 2025·Application pending·0 cites
- 3081US11886124B2Flows of optimization for patterning processesASML NETHERLANDS BV·Filed 2022·Granted Jan 30, 2024·0 cites·20 claims
- 3181US2024419086A1Method of determining characteristic of patterning process based on defect for reducing hotspotASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 3280US8486589B2Lithographic processing method, and device manufactured therebyHSU DUAN-FU STEPHEN·Filed 2012·Granted Jul 16, 2013·3 cites·14 claims
- 3379US8632930B2Method and apparatus for performing dark field double dipole lithography (DDL)HSU DUAN-FU STEPHEN·Filed 2011·Granted Jan 21, 2014·2 cites·14 claims
- 3478US7100145B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2004·Granted Aug 29, 2006·13 cites·9 claims
- 3576US11977334B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2022·Granted May 7, 2024·0 cites·20 claims
- 3676US11681849B2Method for optimizing a patterning device patternASML NETHERLANDS BV·Filed 2017·Granted Jun 20, 2023·1 cites·20 claims
- 3776US10401732B2Optimization flows of source, mask and projection opticsASML NETHERLANDS BV·Filed 2017·Granted Sep 3, 2019·1 cites·20 claims
- 3876US7735052B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2006·Granted Jun 8, 2010·4 cites·16 claims
- 3974US2024219843A1Imaging via zeroth order suppressionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4070US2025138433A1Aberration impact systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 4169US12339583B2Optimization using a non-uniform illumination intensity profileASML HOLDING NV·Filed 2020·Granted Jun 24, 2025·0 cites·20 claims
- 4269US12222656B2Method for determining aberration sensitivity of patternsASML NETHERLANDS BV·Filed 2020·Granted Feb 11, 2025·0 cites·20 claims
- 4369US7433791B2Method of performing multiple stage model calibration for optical imaging simulation modelsASML MASKTOOLS BV·Filed 2007·Granted Oct 7, 2008·2 cites·12 claims
- 4469US2025155824A1Method for determining aberration sensitivity of patternsASML NETHERLAND BV·Filed 2025·Application pending·0 cites
- 4567US12210291B2Aberration impact systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2021·Granted Jan 28, 2025·0 cites·20 claims
- 4666US12092963B2Method of determining characteristic of patterning process based on defect for reducing hotspotASML NETHERLANDS BV·Filed 2020·Granted Sep 17, 2024·0 cites·20 claims
- 4765US11506984B2Simulation of lithography using multiple-sampling of angular distribution of source radiationASML NETHERLANDS BV·Filed 2016·Granted Nov 22, 2022·1 cites·24 claims
- 4864US11022894B2Rule-based deployment of assist featuresASML NETHERLANDS BV·Filed 2019·Granted Jun 1, 2021·0 cites·22 claims
- 4964US7892703B2CPL mask and a method and program product for generating the sameASML MASKTOOLS BV·Filed 2006·Granted Feb 22, 2011·1 cites·20 claims
- 5064US2025278026A1Stochastic-aware source mask optimization based on edge placement probability distributionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
Showing the top 50 of 75 patent records by PatentIndex Score.
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