Inventor · disambiguated record
Katsutoshi Takagi
Also filed as: TAKAGI KATSUTOSHI
36 granted patents·16 pending applications·728 citations·filing 1994–2012
98Inventor score
Top patents by PatentIndex Score
52 records- 0197US7252314B2Crash energy absorption memberTOYOTA TEKKO KK·Filed 2006·Granted Aug 7, 2007·68 cites·14 claims
- 0297US6689444B2Reflection layer or semi-transparent reflection layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording mediaKOBE STEEL LTD·Filed 2001·Granted Feb 10, 2004·76 cites·17 claims
- 0396US7758942B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2008·Granted Jul 20, 2010·9 cites·6 claims
- 0496US7419711B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2005·Granted Sep 2, 2008·28 cites·61 claims
- 0595US7445097B2Crash energy absorption memberSUMITOMO METAL IND·Filed 2006·Granted Nov 4, 2008·30 cites·11 claims
- 0694US7507458B2Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering targetKOBE STEEL LTD·Filed 2005·Granted Mar 24, 2009·19 cites·18 claims
- 0792US7776420B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2008·Granted Aug 17, 2010·7 cites·32 claims
- 0892US7722942B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2006·Granted May 25, 2010·7 cites·23 claims
- 0991US7566417B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2006·Granted Jul 28, 2009·14 cites·4 claims
- 1091US7022384B2Reflective film, reflection type liquid crystal display, and sputtering target for forming the reflective filmKOBE STEEL LTD·Filed 2002·Granted Apr 4, 2006·42 cites·22 claims
- 1191US5514909AAluminum alloy electrode for semiconductor devicesKOBE STEEL LTD·Filed 1994·Granted May 7, 1996·93 cites·11 claims
- 1290US6033542AElectrode and its fabrication method for semiconductor devices, and sputtering target for forming electrode film for semiconductor devicesKOBE STEEL LTD·Filed 1995·Granted Mar 7, 2000·88 cites·5 claims
- 1388US7704581B2Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering targetKOBE STEEL LTD·Filed 2005·Granted Apr 27, 2010·8 cites·28 claims
- 1488US7514037B2AG base alloy thin film and sputtering target for forming AG base alloy thin filmKOBE STEEL LTD·Filed 2003·Granted Apr 7, 2009·19 cites·14 claims
- 1587US7695790B2Silver alloy reflective film, sputtering target therefor, and optical information recording medium using the sameKOBE STEEL LTD·Filed 2005·Granted Apr 13, 2010·7 cites·19 claims
- 1686US7803238B2Al—Ni-rare earth element alloy sputtering targetKOBE STEEL LTD·Filed 2006·Granted Sep 28, 2010·8 cites·11 claims
- 1786US7452604B2Reflective Ag alloy film for reflectors and reflector provided with the sameKOBE STEEL LTD·Filed 2004·Granted Nov 18, 2008·27 cites·21 claims
- 1885US6096438AA1-N1-Y alloy films for electrodes of semiconductor devices and sputtering targets for depositing the A1-N1-Y alloy filmsKOBE STEEL LTD·Filed 1998·Granted Aug 1, 2000·78 cites·20 claims
- 1983US7203003B2Reflective Ag alloy film for reflectors and reflector provided with the sameKOBE STEEL LTD·Filed 2004·Granted Apr 10, 2007·31 cites·8 claims
- 2083US6557378B2Method for pressing oxynitride glass, disk of oxynitride glass made by said method, and pressing die for said methodKOBE STEEL LTD·Filed 2000·Granted May 6, 2003·14 cites·7 claims
- 2181US8123875B2AG base sputtering target and process for producing the sameTAKAGI KATSUTOSHI·Filed 2010·Granted Feb 28, 2012·2 cites·9 claims
- 2281US7871686B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2008·Granted Jan 18, 2011·5 cites·14 claims
- 2378US8163143B2Al-Ni-La-Si system Al-based alloy sputtering target and process for producing the sameTAKAGI KATSUTOSHI·Filed 2008·Granted Apr 24, 2012·4 cites·2 claims
- 2476US7767041B2Ag-Bi-base alloy sputtering target, and method for producing the sameKOBE STEEL LTD·Filed 2004·Granted Aug 3, 2010·12 cites·16 claims
- 2573US7763126B2Ag base sputtering target and process for producing the sameKOBE STEEL LTD·Filed 2004·Granted Jul 27, 2010·6 cites·9 claims
- 2669US6387536B1A1 alloy thin film for semiconductor device electrode and sputtering target to deposit A1 film by sputtering process for semiconductor device electrodeKOBE STEEL LTD·Filed 2000·Granted May 14, 2002·12 cites·9 claims
- 2766US8178174B2Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmTAUCHI YUUKI·Filed 2010·Granted May 15, 2012·0 cites·8 claims
- 2865US2010038233A1Ag-bi-base alloy sputtering target, and method for producing the sameKOBE STEEL LTD·Filed 2009·Application pending·0 cites
- 2963US7448658B2Bumper beam for vehicleTOYOTA TEKKO KK·Filed 2005·Granted Nov 11, 2008·4 cites·10 claims
- 3062US2010065425A1Silver alloy sputtering target and process for producing the sameKOBELCO RES INST INC·Filed 2009·Application pending·0 cites
- 3161US7665586B2Crash boxSUMITOMO METAL IND·Filed 2006·Granted Feb 23, 2010·2 cites·11 claims
- 3261US2006171842A1Ag base alloy thin film and sputtering target for forming Ag base alloy thin filmKOBE STEEL LTD·Filed 2006·Application pending·0 cites
- 3360US8936856B2AG base alloy thin film and sputtering target for forming AG base alloy thin filmTAUCHI YUUKI·Filed 2012·Granted Jan 20, 2015·0 cites·18 claims
- 3459US9212418B2Al-Ni-La system Al-based alloy sputtering targetEHIRA MASAYA·Filed 2007·Granted Dec 15, 2015·1 cites·16 claims
- 3556US8580093B2AL-Ni-La-Cu alloy sputtering target and manufacturing method thereofTAKAGI KATSUTOSHI·Filed 2009·Granted Nov 12, 2013·0 cites·20 claims
- 3654US2009242394A1Al-based alloy sputtering target and manufacturing method thereofKOBELCO RES INST INC·Filed 2009·Application pending·0 cites
- 3752US8172961B2Al-Ni-rare earth element alloy sputtering targetKUGIMIYA TOSHIHIRO·Filed 2010·Granted May 8, 2012·0 cites·6 claims
- 3852US2006226005A1Aluminum-based sputtering targetsKOBE STEEL LTD·Filed 2006·Application pending·0 cites
- 3952US2009133784A1Copper alloy thin films, copper alloy sputtering targets and flat panel displaysKOBE STEEL LTD·Filed 2009·Application pending·0 cites
- 4051US2008223718A1Ai-based alloy sputtering target and process for producing the sameKOBE STEEL LTD·Filed 2007·Application pending·0 cites
- 4151US2009057140A1Ag base alloy sputtering target and method for manufacturing the sameKOBELCO RES INST INC·Filed 2008·Application pending·0 cites
- 4248US2010202280A1Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recordingKOBE STEEL LTD·Filed 2010·Application pending·0 cites
- 4347US2005153162A1Ag-base interconnecting film for flat panel display, Ag-base sputtering target and flat panel displayKOBE STEEL LTD·Filed 2004·Application pending·0 cites
- 4447US2005112019A1Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recordingKOBE STEEL LTD·Filed 2004·Application pending·0 cites
- 4546USRE44239EElectrode and its fabrication method for semiconductor devices, and sputtering target for forming electrode film for semiconductor devicesYAMAMOTO SEIGO·Filed 2006·Granted May 28, 2013·0 cites·10 claims
- 4646USRE43590EAluminum alloy electrode for semiconductor devicesYAMAMOTO SEIGO·Filed 2006·Granted Aug 21, 2012·0 cites·31 claims
- 4746US2006091792A1Copper alloy thin films, copper alloy sputtering targets and flat panel displaysKOBE STEEL LTD·Filed 2005·Application pending·0 cites
- 4844US2004238356A1Silver alloy sputtering target and process for producing the sameFiled 2003·Application pending·0 cites
- 4941US6333267B1Method of manufacturing active matrix type liquid crystal displayKOBE STEEL LTD·Filed 1995·Granted Dec 25, 2001·7 cites·3 claims
- 5041US2013233706A1Al-based alloy sputtering target and production method of sameMATSUMOTO KATSUSHI·Filed 2011·Application pending·0 cites
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