Inventor
ICHINO TAKAMASA
JP18 patents
⚠️ This page may combine multiple inventors who share the name “ICHINO TAKAMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
15 patentsUSD840364SFeb 12, 2019
Electrode cover for a plasma processing apparatus
HITACHI HIGH TECH CORP453 citations98
USD827592SSep 4, 2018
Electrode cover for a plasma processing apparatus
HITACHI HIGH TECH CORP448 citations98
USD840365SFeb 12, 2019
Cover ring for a plasma processing apparatus
HITACHI HIGH TECH CORP18 citations93
USD1005245SNov 21, 2023
Electrode cover for a plasma processing apparatus
HITACHI HIGH TECH CORP14 citations85
USD836573SDec 25, 2018
Ring for a plasma processing apparatus
HITACHI HIGH TECH CORP12 citations83
US10692784B2Jun 23, 2020
Vacuum processing apparatus
HITACHI HIGH TECH CORP3 citations73
US11094509B2Aug 17, 2021
Plasma processing apparatus
HITACHI HIGH TECH CORP2 citations71
US9566821B2Feb 14, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP2 citations71
US10763088B2Sep 1, 2020
Vacuum processing apparatus
HITACHI HIGH TECH CORP1 citations62
US12334316B2Jun 17, 2025
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US11315759B2Apr 26, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations51
US9887070B2Feb 6, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations48
US9779919B2Oct 3, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations48
US12224157B2Feb 11, 2025
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations46
US12592367B2Mar 31, 2026
Plasma processing apparatus and manufacturing method of wafer stage for plasma processing apparatus
HITACHI HIGH TECH CORP0 citations43