Inventor · disambiguated record
Bernhard Geuppert
Also filed as: GEUPPERT BERNHARD · GEUPPERT BERNHARD MATHIAS
35 granted patents·11 pending applications·136 citations·filing 2003–2021
96Inventor score
Files withZEISS CARL SMT GMBH20ZEISS CARL SMT AG10ASML NETHERLANDS BV3RAU JOHANNES3BLEIDISTEL SASCHA2
Top patents by PatentIndex Score
46 records- 0192US7321126B2Collector with fastening devices for fastening mirror shellsZEISS CARL SMT AG·Filed 2006·Granted Jan 22, 2008·26 cites·10 claims
- 0290US8169595B2Optical apparatus and method for modifying the imaging behavior of such apparatusSCHRIEVER MARTIN·Filed 2009·Granted May 1, 2012·23 cites·52 claims
- 0390US7724351B2Lithographic apparatus, device manufacturing method and exchangeable optical elementASML NETHERLANDS BV·Filed 2006·Granted May 25, 2010·12 cites·34 claims
- 0487US9304404B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 5, 2016·5 cites·53 claims
- 0585US10635003B2Lithography system and methodZEISS CARL SMT GMBH·Filed 2019·Granted Apr 28, 2020·2 cites·20 claims
- 0684US7760327B2Reflecting optical element with eccentric optical passagewayZEISS CARL SMT AG·Filed 2006·Granted Jul 20, 2010·8 cites·55 claims
- 0782US9104016B2Optical projection systemZEISS CARL SMT GMBH·Filed 2012·Granted Aug 11, 2015·2 cites·24 claims
- 0881US9696630B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jul 4, 2017·2 cites·20 claims
- 0978US9134632B2Lithographic apparatus and device manufacturing methodVAN DER WIJST MARC WILHELMUS MARIA·Filed 2011·Granted Sep 15, 2015·3 cites·19 claims
- 1078US8705185B2Optical elementRAU JOHANNES·Filed 2012·Granted Apr 22, 2014·4 cites·20 claims
- 1176US8300210B2Optical projection systemRAU JOHANNES·Filed 2005·Granted Oct 30, 2012·3 cites·33 claims
- 1275US9436095B2Exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2012·Granted Sep 6, 2016·1 cites·22 claims
- 1374US10416570B2Optical imaging arrangement with a piezoelectric deviceZEISS CARL SMT GMBH·Filed 2018·Granted Sep 17, 2019·3 cites·20 claims
- 1471US9410662B2Arrangement for mounting an optical element, in particular in an EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Aug 9, 2016·3 cites·25 claims
- 1571US9001304B2Projection exposure system for microlithography with a measurement deviceMUELLER ULRICH·Filed 2010·Granted Apr 7, 2015·1 cites·44 claims
- 1671US8269948B2Projection exposure apparatus and optical systemBLEIDISTEL SASCHA·Filed 2009·Granted Sep 18, 2012·5 cites·38 claims
- 1770US9557653B2Optical projection systemZEISS CARL SMT GMBH·Filed 2015·Granted Jan 31, 2017·1 cites·30 claims
- 1870US8330935B2Exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2010·Granted Dec 11, 2012·2 cites·24 claims
- 1967US7091505B2Collector with fastening devices for fastening mirror shellsZEISS CARL SMT AG·Filed 2004·Granted Aug 15, 2006·8 cites·11 claims
- 2065US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 2165US8441747B2Optical module with minimized overrun of the optical elementHEINTEL WILLI·Filed 2007·Granted May 14, 2013·6 cites·15 claims
- 2264US7410265B2Focusing-device for the radiation from a light sourceZEISS CARL SMT AG·Filed 2003·Granted Aug 12, 2008·7 cites·50 claims
- 2363US2018259856A1Optical Projection SystemZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2462US9891535B2Optical projection systemZEISS CARL SMT GMBH·Filed 2017·Granted Feb 13, 2018·0 cites·20 claims
- 2562US2019129318A1Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2661US10345710B2Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT GMBH·Filed 2016·Granted Jul 9, 2019·0 cites·22 claims
- 2761US10042271B2Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2017·Granted Aug 7, 2018·0 cites·13 claims
- 2861US7826155B2Vibration damping for photolithographic lens mountZEISS CARL SMT AG·Filed 2006·Granted Nov 2, 2010·4 cites·26 claims
- 2961US7692881B2Structure for use in a projection exposure system for manufacturing semiconductorsZEISS CARL SMT AG·Filed 2005·Granted Apr 6, 2010·2 cites·18 claims
- 3058US10599051B2Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Mar 24, 2020·0 cites·19 claims
- 3157US2008309894A1Microlithographic projection exposure apparatus and measuring device for a projection lensZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3256US9696639B2Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2015·Granted Jul 4, 2017·0 cites·10 claims
- 3356US2015168853A1Lithography apparatus with restricted movement relative to floor and related methodZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 3455US9551944B2Method for replacing objective partsZEISS CARL SMT GMBH·Filed 2014·Granted Jan 24, 2017·0 cites·20 claims
- 3554US11314177B2Supporting an optical elementZEISS CARL SMT GMBH·Filed 2021·Granted Apr 26, 2022·0 cites·21 claims
- 3653US9110388B2Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related methodBLEIDISTEL SASCHA·Filed 2012·Granted Aug 18, 2015·0 cites·48 claims
- 3753US2014021324A1Lithography apparatus and methodZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 3850US2008278828A1Optical ElementZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 3948US2009260654A1Method and device for replacing objective partsZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4048US2007070316A1Microlithographic projection exposure apparatus and measuring device for a projection lensEHRMANN ALBRECHT·Filed 2006·Application pending·0 cites
- 4145US8542346B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsLIMBACH GUIDO·Filed 2009·Granted Sep 24, 2013·0 cites·33 claims
- 4245US7581305B2Method of manufacturing an optical componentZEISS CARL SMT AG·Filed 2004·Granted Sep 1, 2009·2 cites·24 claims
- 4345US2008042079A1Collector with fastening devices for fastening mirror shellsCARL ZEISS SMT·Filed 2007·Application pending·0 cites
- 4443US10890850B2Optical imaging arrangement with actively adjustable metrology support unitsZEISS CARL SMT GMBH·Filed 2018·Granted Jan 12, 2021·0 cites·21 claims
- 4538US2020209757A1Lithographic Apparatus, Lithographic Projection Apparatus and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
- 4635US2006126195A1Device for receiving an optical module in an imaging unitRAU JOHANNES·Filed 2003·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Bernhard Geuppert files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →