Inventor · disambiguated record
Dwayne L. Labrake
Also filed as: LABRAKE DWAYNE L
28 granted patents·15 pending applications·648 citations·filing 1997–2023
96Inventor score
Files withMOLECULAR IMPRINTS INC123M INNOVATIVE PROPERTIES CO10CANON KK7KHUSNATDINOV NIYAZ3CANON NANOTECHNOLOGIES INC2
Top patents by PatentIndex Score
43 records- 0197US6600866B2Filament organizer3M INNOVATIVE PROPERTIES CO·Filed 2001·Granted Jul 29, 2003·227 cites·17 claims
- 0292US8361371B2Extrusion reduction in imprint lithographyMOLECULAR IMPRINTS INC·Filed 2009·Granted Jan 29, 2013·16 cites·6 claims
- 0391US8641958B2Extrusion reduction in imprint lithographyKHUSNATDINOV NIYAZ·Filed 2013·Granted Feb 4, 2014·10 cites·6 claims
- 0490US7256131B2Method of controlling the critical dimension of structures formed on a substrateMOLECULAR IMPRINTS INC·Filed 2005·Granted Aug 14, 2007·18 cites·23 claims
- 0590US6404956B1Long-length continuous phase Bragg reflectors in optical media3M INNOVATIVE PROPERTIES CO·Filed 1998·Granted Jun 11, 2002·92 cites·12 claims
- 0688US10580659B2Planarization process and apparatusCANON KK·Filed 2018·Granted Mar 3, 2020·3 cites·14 claims
- 0787US8361546B2Facilitating adhesion between substrate and patterned layerMOLECULAR IMPRINTS INC·Filed 2009·Granted Jan 29, 2013·11 cites·5 claims
- 0885US6195484B1Method and apparatus for arbitrary spectral shaping of an optical pulse3M INNOVATIVE PROPERTIES CO·Filed 1999·Granted Feb 27, 2001·73 cites·20 claims
- 0984US6532327B1Refractive index grating manufacturing process3M INNOVATIVE PROPERTIES CO·Filed 2001·Granted Mar 11, 2003·30 cites·15 claims
- 1084US5912999AMethod for fabrication of in-line optical waveguide index grating of any length3M INNOVATIVE PROPERTIES CO·Filed 1997·Granted Jun 15, 1999·71 cites·44 claims
- 1180US8967992B2Optically absorptive material for alignment marksKHUSNATDINOV NIYAZ·Filed 2012·Granted Mar 3, 2015·3 cites·9 claims
- 1280US6035083AMethod for writing arbitrary index perturbations in a wave-guiding structure3M INNOVATIVE PROPERTIES CO·Filed 1998·Granted Mar 7, 2000·54 cites·24 claims
- 1378US8545709B2Critical dimension control during template formationBROOKS CYNTHIA B·Filed 2012·Granted Oct 1, 2013·4 cites·13 claims
- 1477US10304690B2Fluid dispense methodology and apparatus for imprint lithographyCANON KK·Filed 2017·Granted May 28, 2019·2 cites·18 claims
- 1577US7106939B2Optical and optoelectronic articles3M INNOVATIVE PROPERTIES CO·Filed 2002·Granted Sep 12, 2006·15 cites·21 claims
- 1676US9514950B2Methods for uniform imprint pattern transfer of sub-20 nm featuresCANON NANOTECHNOLOGIES INC·Filed 2014·Granted Dec 6, 2016·3 cites·20 claims
- 1774US10606171B2Superstrate and a method of using the sameCANON KK·Filed 2018·Granted Mar 31, 2020·1 cites·10 claims
- 1867US6728444B2Fabrication of chirped fiber bragg gratings of any desired bandwidth using frequency modulation3M INNOVATIVE PROPERTIES CO·Filed 2002·Granted Apr 27, 2004·10 cites·18 claims
- 1965US10859913B2Superstrate and a method of using the sameCANON KK·Filed 2020·Granted Dec 8, 2020·0 cites·19 claims
- 2065US7795132B2Self-aligned cross-point memory fabricationMOLECULAR IMPRINTS INC·Filed 2008·Granted Sep 14, 2010·2 cites·7 claims
- 2160US2025174594A1System and Method for Aligning Bonding Pads with Bonding Locations using Moiré PatternsCANON KK·Filed 2023·Application pending·0 cites
- 2258US8529778B2Large area patterning of nano-sized shapesSREENIVASAN SIDLGATA V·Filed 2009·Granted Sep 10, 2013·0 cites·18 claims
- 2356US2009212012A1Critical dimension control during template formationMOLECULAR IMPRINTS INC·Filed 2009·Application pending·0 cites
- 2456US2009148619A1Controlling Thickness of Residual LayerMOLECULAR IMPRINTS INC·Filed 2008·Application pending·0 cites
- 2556US2014021167A1Large Area Patterning of Nano-Sized ShapesUNIV TEXAS·Filed 2013·Application pending·0 cites
- 2654US2009200266A1Template Pillar FormationMOLECULAR IMPRINTS INC·Filed 2009·Application pending·0 cites
- 2754US2009053535A1Reduced Residual Formation in Etched Multi-Layer StacksMOLECULAR IMPRINTS INC·Filed 2008·Application pending·0 cites
- 2852US2012189780A1Controlling Thickness of Residual LayerLABRAKE DWAYNE L·Filed 2012·Application pending·0 cites
- 2952US2012288686A1Reduced residual formation in etched multi-layer stacksXU FRANK Y·Filed 2012·Application pending·0 cites
- 3051US8891080B2Contaminate detection and substrate cleaningKHUSNATDINOV NIYAZ·Filed 2011·Granted Nov 18, 2014·1 cites·4 claims
- 3149US7466892B2Optical and optoelectronic articles3M INNOVATIVE PROPERTIES CO·Filed 2006·Granted Dec 16, 2008·0 cites·20 claims
- 3248US2010095862A1Double Sidewall Angle Nano-Imprint TemplateMOLECULAR IMPRINTS INC·Filed 2009·Application pending·0 cites
- 3348US2015165655A1Optically Absorptive Material for Alignment MarksCANON NANOTECHNOLOGIES INC·Filed 2015·Application pending·0 cites
- 3447US8512585B2Template pillar formationDOYLE GARY F·Filed 2012·Granted Aug 20, 2013·0 cites·20 claims
- 3543US6917750B2System and method for characterizing optical devices3M INNOVATIVE PROPERTIES CO·Filed 2003·Granted Jul 12, 2005·2 cites·25 claims
- 3643US2009148032A1Alignment Using Moire PatternsMOLECULAR IMPRINTS INC·Filed 2008·Application pending·0 cites
- 3742US10079152B1Method for forming planarized etch mask structures over existing topographyCANON KK·Filed 2017·Granted Sep 18, 2018·0 cites·13 claims
- 3842US2010323490A1Self-Aligned Cross-Point Memory FabricationMOLECULAR IMPRINTS INC·Filed 2010·Application pending·0 cites
- 3940US2011165412A1Adhesion layers in nanoimprint lithograhyMOLECULAR IMPRINTS INC·Filed 2010·Application pending·0 cites
- 4039US2003059195A1Optical devices using shaped optical fibers and methods for making optical devices with shaped optical fibersFiled 2002·Application pending·0 cites
- 4137US10211051B2Method of reverse tone patterningCANON KK·Filed 2016·Granted Feb 19, 2019·0 cites·20 claims
- 4235US8935981B2High contrast alignment marks through multiple stage imprintingIMHOF JOSEPH MICHAEL·Filed 2011·Granted Jan 20, 2015·0 cites·15 claims
- 4335US2012070572A1Vapor Delivery System For Use in Imprint LithographyYE ZHENGMAO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →