Inventor · disambiguated record
Frank Laske
Also filed as: LASKE FRANK
18 granted patents·4 pending applications·56 citations·filing 2008–2025
91Inventor score
Files withKLA TENCOR CORP12KLA CORP7CHOI DONGSUB1KLA TENCOR MIE GMBH1VISTEC SEMICONDUCTOR SYSTEM GMBH1
Top patents by PatentIndex Score
22 records- 0194US10473460B2Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signalsKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·20 cites·35 claims
- 0293US10533848B2Metrology and control of overlay and edge placement errorsKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·5 cites·42 claims
- 0390US10474040B2Systems and methods for device-correlated overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·4 cites·36 claims
- 0490US9704238B2Method for correcting position measurements for optical errors and method for determining mask writer errorsKLA TENCOR CORP·Filed 2015·Granted Jul 11, 2017·5 cites·25 claims
- 0582US10303153B2Method and computer program product for controlling the positioning of patterns on a substrate in a manufacturing processKLA TENCOR CORP·Filed 2016·Granted May 28, 2019·3 cites·23 claims
- 0681US10141156B2Measurement of overlay and edge placement errors with an electron beam column arrayKLA TENCOR CORP·Filed 2017·Granted Nov 27, 2018·3 cites·20 claims
- 0780US10185800B2Apparatus and method for the measurement of pattern placement and size of pattern and computer program thereforKLA TENCOR CORP·Filed 2016·Granted Jan 22, 2019·3 cites·19 claims
- 0880US9201312B2Method for correcting position measurements for optical errors and method for determining mask writer errorsKLA TENCOR CORP·Filed 2014·Granted Dec 1, 2015·3 cites·26 claims
- 0975US8804137B2Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capabilityCHOI DONGSUB·Filed 2010·Granted Aug 12, 2014·4 cites·21 claims
- 1073US8352886B2Method for the reproducible determination of the position of structures on a mask with a pellicle frameKLA TENCOR MIE GMBH·Filed 2011·Granted Jan 8, 2013·4 cites·9 claims
- 1168US10337852B1Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrateKLA TENCOR CORP·Filed 2018·Granted Jul 2, 2019·1 cites·16 claims
- 1266US2025271776A1Image modeling-assisted metrologyKLA CORP·Filed 2025·Application pending·0 cites
- 1365US12092966B2Device feature specific edge placement error (EPE)KLA CORP·Filed 2023·Granted Sep 17, 2024·0 cites·32 claims
- 1463US12085385B2Design-assisted large field of view metrologyKLA CORP·Filed 2021·Granted Sep 10, 2024·0 cites·41 claims
- 1559US9424636B2Method for measuring positions of structures on a mask and thereby determining mask manufacturing errorsKLA TENCOR CORP·Filed 2015·Granted Aug 23, 2016·1 cites·13 claims
- 1659US2024094639A1High-resolution evaluation of optical metrology targets for process controlKLA CORP·Filed 2022·Application pending·0 cites
- 1753US12444628B2Image modeling-assisted contour extractionKLA CORP·Filed 2022·Granted Oct 14, 2025·0 cites·14 claims
- 1850US2024093985A1System and method for acquiring alignment measurements of structures of a bonded sampleKLA CORP·Filed 2022·Application pending·0 cites
- 1949US11637030B2Multi-stage, multi-zone substrate positioning systemsKLA CORP·Filed 2020·Granted Apr 25, 2023·0 cites·28 claims
- 2039US9892885B2System and method for drift compensation on an electron beam based characterization toolKLA TENCOR CORP·Filed 2016·Granted Feb 13, 2018·0 cites·22 claims
- 2135US7864319B2Device and method for determining an optical property of a maskVISTEC SEMICONDUCTOR SYSTEM GMBH·Filed 2008·Granted Jan 4, 2011·0 cites·15 claims
- 2233US2015310160A1Method, system and computer program product for generating high density registration maps for masksKLA TENCOR CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →