Inventor · disambiguated record
Haoquan Fang
Also filed as: FANG HAOQUAN
12 granted patents·9 pending applications·97 citations·filing 2002–2024
90Inventor score
Top patents by PatentIndex Score
21 records- 0192US12272570B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2024·Granted Apr 8, 2025·1 cites·19 claims
- 0292US7513062B2Single wafer dryer and drying methodsAPPLIED MATERIALS INC·Filed 2005·Granted Apr 7, 2009·23 cites·13 claims
- 0391US12272571B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2024·Granted Apr 8, 2025·1 cites·19 claims
- 0491US12211709B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2023·Granted Jan 28, 2025·1 cites·18 claims
- 0591US11694911B2Systems and methods for metastable activated radical selective strip and etch using dual plenum showerheadLAM RES CORP·Filed 2017·Granted Jul 4, 2023·7 cites·35 claims
- 0690US9397011B1Systems and methods for reducing copper contamination due to substrate processing chambers with components made of alloys including copperLAM RES CORP·Filed 2015·Granted Jul 19, 2016·9 cites·20 claims
- 0789US6955516B2Single wafer dryer and drying methodsAPPLIED MATERIALS INC·Filed 2002·Granted Oct 18, 2005·33 cites·20 claims
- 0887US10267728B2Systems and methods for detecting oxygen in-situ in a substrate area of a substrate processing systemLAM RES CORP·Filed 2017·Granted Apr 23, 2019·3 cites·28 claims
- 0987US7980255B2Single wafer dryer and drying methodsAPPLIED MATERIALS INC·Filed 2007·Granted Jul 19, 2011·10 cites·18 claims
- 1079US8721797B2Enhanced passivation process to protect silicon prior to high dose implant stripCHEUNG DAVID·Filed 2010·Granted May 13, 2014·6 cites·13 claims
- 1174US9564344B2Ultra low silicon loss high dose implant stripNOVELLUS SYSTEMS INC·Filed 2015·Granted Feb 7, 2017·2 cites·21 claims
- 1271US12451332B2Atomic layer treatment process using metastable activated radical speciesLAM RES CORP·Filed 2019·Granted Oct 21, 2025·1 cites·9 claims
- 1367US2024139905A1Carrier head acoustic monitoring with sensor in platenAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1463US2023390891A1Acoustic monitoring of conditioner during polishingAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1560US2023390883A1Acoustic monitoring of cmp retaining ringAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1658US2009241996A1Single wafer dryer and drying methodsACHKIRE YOUNES·Filed 2008·Application pending·0 cites
- 1755US2025062163A1Acoustic monitoring for process reliability during polishingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1852US2011143548A1Ultra low silicon loss high dose implant stripCHEUNG DAVID·Filed 2009·Application pending·0 cites
- 1951US2006174921A1Single wafer dryer and drying methodsAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2050US2005241684A1Single wafer dryer and drying methodsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2143US2010120335A1Partial Contact Wafer Retaining Ring ApparatusNOVELLUS SYSTEMS INC·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →