Inventor · disambiguated record
Hideo Hada
Also filed as: HADA HIDEO
94 granted patents·10 pending applications·1,169 citations·filing 1996–2014
99Inventor score
Top patents by PatentIndex Score
104 records- 0198US7713679B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted May 11, 2010·57 cites·11 claims
- 0298US7323287B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 29, 2008·77 cites·1 claims
- 0397US7682772B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 23, 2010·20 cites·16 claims
- 0497US7074543B2Positive resist composition and method of forming resist pattern from the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 11, 2006·151 cites·20 claims
- 0597US5714625ACyanooxime sulfonate compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Feb 3, 1998·143 cites·6 claims
- 0696US7482108B2Polymer compound, acid generator, positive resist composition, and method for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 27, 2009·92 cites·18 claims
- 0795US6388101B1Chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 14, 2002·42 cites·4 claims
- 0894US7504196B2Positive resist composition, method for resist pattern formation and compoundTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Mar 17, 2009·21 cites·5 claims
- 0994US6063953AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 16, 2000·90 cites·6 claims
- 1093US6444397B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 3, 2002·39 cites·15 claims
- 1192US7776510B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 17, 2010·14 cites·12 claims
- 1290US7927780B2Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Apr 19, 2011·9 cites·11 claims
- 1389US8338076B2Resist composition, method of forming resist pattern, novel compound, and acid generatorKAWAUE AKIYA·Filed 2009·Granted Dec 25, 2012·7 cites·24 claims
- 1488US8012669B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Sep 6, 2011·15 cites·8 claims
- 1587US8415085B2Resist composition, method of forming resist pattern, novel compound, and acid generatorHADA HIDEO·Filed 2012·Granted Apr 9, 2013·3 cites·9 claims
- 1685US8187789B2Positive resist composition and method of forming resist patternYONEMURA KOJI·Filed 2009·Granted May 29, 2012·9 cites·7 claims
- 1785US7745097B2Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 29, 2010·4 cites·19 claims
- 1883US7488568B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 10, 2009·7 cites·15 claims
- 1981US8124313B2Resist composition, method of forming resist pattern, novel compound, and acid generatorSESHIMO TAKEHIRO·Filed 2010·Granted Feb 28, 2012·11 cites·19 claims
- 2081US6897012B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted May 24, 2005·13 cites·11 claims
- 2179US7723007B2Polymer compound, photoresist composition including the polymer compound, and resist pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted May 25, 2010·5 cites·13 claims
- 2279US6087063APositive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Jul 11, 2000·37 cites·14 claims
- 2374US7829259B2Resin for photoresist composition, photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Nov 9, 2010·2 cites·9 claims
- 2474US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 2574US6982140B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO LTD·Filed 2002·Granted Jan 3, 2006·34 cites·12 claims
- 2674US5929271ACompounds for use in a positive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 27, 1999·26 cites·2 claims
- 2772US7183368B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Feb 27, 2007·7 cites·2 claims
- 2871US5902713AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted May 11, 1999·23 cites·10 claims
- 2970US7932013B2Pattern coating material and pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Apr 26, 2011·3 cites·7 claims
- 3070US7700259B2Polymer compound, photoresist composition containing such polymer compound, and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Apr 20, 2010·2 cites·14 claims
- 3170US6759176B2Positive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jul 6, 2004·10 cites·10 claims
- 3269US8367299B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2011·Granted Feb 5, 2013·1 cites·15 claims
- 3369US8206890B2Resist composition, method of forming resist pattern, compound and acid generatorKAWAUE AKIYA·Filed 2009·Granted Jun 26, 2012·2 cites·10 claims
- 3469US7862981B2Compound, positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 4, 2011·1 cites·8 claims
- 3569US6022666AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Feb 8, 2000·21 cites·10 claims
- 3668US8227169B2Compound, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2008·Granted Jul 24, 2012·2 cites·9 claims
- 3768US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 3868US7494759B2Positive resist compositions and process for the formation of resist patterns with the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Feb 24, 2009·2 cites·17 claims
- 3968US7435530B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Oct 14, 2008·5 cites·55 claims
- 4067US9012129B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Apr 21, 2015·0 cites·9 claims
- 4167US7851129B2Resist composition, resist pattern forming method and compoundTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 14, 2010·2 cites·5 claims
- 4265US8808959B2Resist composition, method of forming resist pattern, novel compound, and acid generatorHADA HIDEO·Filed 2009·Granted Aug 19, 2014·0 cites·9 claims
- 4364US7592122B2Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 22, 2009·3 cites·6 claims
- 4463US8097397B2Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective filmTAKAYAMA TOSHIKAZU·Filed 2007·Granted Jan 17, 2012·2 cites·14 claims
- 4562US8741538B2Polymer compound, photoresist composition containing such polymer compound, and method for forming resist patternOGATA TOSHIYUKI·Filed 2010·Granted Jun 3, 2014·1 cites·3 claims
- 4662US7993706B2Method of forming a nano-structure and the nano-structureRIKEN·Filed 2005·Granted Aug 9, 2011·1 cites·5 claims
- 4762US7592123B2Resin for photoresist composition, photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 22, 2009·5 cites·11 claims
- 4862US7316885B2Method of forming resist pattern, positive resist composition, and layered productTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Jan 8, 2008·6 cites·16 claims
- 4961US7901865B2Resist composition and process for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 8, 2011·1 cites·15 claims
- 5060US6749989B2Positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Jun 15, 2004·16 cites·6 claims
Showing the top 50 of 104 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →