Inventor · disambiguated record
Hideharu Kyouda
Also filed as: KYOUDA HIDEHARU
32 granted patents·6 pending applications·197 citations·filing 2001–2018
96Inventor score
Top patents by PatentIndex Score
38 records- 0194US8366872B2Substrate treatment method, coating film removing apparatus, and substrate treatment systemTOKYO ELECTRON LTD·Filed 2011·Granted Feb 5, 2013·16 cites·7 claims
- 0289US7926441B2Substrate treatment method, coating treatment apparatus, and substrate treatment systemTOKYO ELECTRON LTD·Filed 2008·Granted Apr 19, 2011·13 cites·7 claims
- 0387US8026048B2Developing apparatus and developing methodTOKYO ELECTRON LTD·Filed 2010·Granted Sep 27, 2011·7 cites·13 claims
- 0485US6811962B2Method for developing processing and apparatus for supplying developing solutionTOKYO ELECTRON LTD·Filed 2002·Granted Nov 2, 2004·29 cites·10 claims
- 0583US6496245B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Dec 17, 2002·23 cites·13 claims
- 0682US7959988B2Coating film forming apparatus and methodTOKYO ELECTRON LTD·Filed 2007·Granted Jun 14, 2011·8 cites·12 claims
- 0782US6709174B2Apparatus and method for developmentTOKYO ELECTRON LTD·Filed 2002·Granted Mar 23, 2004·27 cites·14 claims
- 0881US9947556B2Substrate cleaning apparatus, substrate cleaning method, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 17, 2018·5 cites·12 claims
- 0981US9214363B2Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the methodTOKYO ELECTRON LTD·Filed 2013·Granted Dec 15, 2015·4 cites·5 claims
- 1078US8037890B2Substrate cleaning device and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 18, 2011·5 cites·6 claims
- 1178US7665916B2Coater/developer and coating/developing methodTOKYO ELECTRON LTD·Filed 2004·Granted Feb 23, 2010·21 cites·17 claims
- 1276US8010221B2Cleaning apparatus and method for immersion light exposureTOKYO ELECTRON LTD·Filed 2007·Granted Aug 30, 2011·6 cites·20 claims
- 1366US9568829B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 14, 2017·1 cites·14 claims
- 1466US7918182B2Developing device and developing methodTOKYO ELECTRON LTD·Filed 2004·Granted Apr 5, 2011·7 cites·13 claims
- 1565US8757089B2Coating and developing apparatus, coating and developing method, and storage mediumHONTAKE KOUICHI·Filed 2012·Granted Jun 24, 2014·2 cites·7 claims
- 1664US8163469B2Coating and developing apparatus, coating and developing method, and storage mediumHONTAKE KOUICHI·Filed 2010·Granted Apr 24, 2012·2 cites·4 claims
- 1763US7742146B2Coating and developing method, coating and developing system and storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Jun 22, 2010·1 cites·17 claims
- 1862US8111372B2Coating film forming apparatus and coating film forming method for immersion light exposureKYOUDA HIDEHARU·Filed 2007·Granted Feb 7, 2012·2 cites·11 claims
- 1961US7823534B2Development device and development methodTOKYO ELECTRON LTD·Filed 2004·Granted Nov 2, 2010·6 cites·14 claims
- 2061US7601933B2Heat processing apparatus and heat processing methodTOKYO ELECTRON LTD·Filed 2004·Granted Oct 13, 2009·8 cites·15 claims
- 2155US6991385B2Method for developing processing and apparatus for supplying developing solutionTOKYO ELECTRON LTD·Filed 2004·Granted Jan 31, 2006·4 cites·2 claims
- 2254US9575411B2Developing apparatus, developing method and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Feb 21, 2017·0 cites·11 claims
- 2353US8518494B2Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the methodYAMAMOTO TARO·Filed 2007·Granted Aug 27, 2013·0 cites·11 claims
- 2453US2008176002A1Substrate treatment method, coating film removing apparatus, and substrate treatment systemTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2552US11031261B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 8, 2021·0 cites·9 claims
- 2652US10289004B2Developing apparatus, developing method and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 14, 2019·0 cites·8 claims
- 2752US10014190B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 3, 2018·0 cites·15 claims
- 2851US8445189B2Developing device and developing methodYAMAMOTO TARO·Filed 2011·Granted May 21, 2013·0 cites·12 claims
- 2951US8083959B2Substrate processing method, substrate processing system, and computer-readable storage mediumKYOUDA HIDEHARU·Filed 2007·Granted Dec 27, 2011·0 cites·8 claims
- 3050US10120285B2Developing method, developing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Nov 6, 2018·0 cites·14 claims
- 3148US8703400B2Substrate treatment method, coating treatment apparatus, and substrate treatment systemTSUTSUMI KENJI·Filed 2011·Granted Apr 22, 2014·0 cites·5 claims
- 3247US2012006362A1Substrate cleaning device and substrate cleaning methodYAMAMOTO TARO·Filed 2011·Application pending·0 cites
- 3345US2008070167A1Exposure and developing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3445US2012061021A1Substrate processing method, substrate processing system, and computer-readable storage mediumKYOUDA HIDEHARU·Filed 2011·Application pending·0 cites
- 3538US11524383B2Substrate processing apparatus, substrate processing method, and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Dec 13, 2022·0 cites·1 claims
- 3638US2009004607A1Substrate Processing MethodSHIMOAOKI TAKESHI·Filed 2005·Application pending·0 cites
- 3735US2012218531A1Developing method and apparatus using organic-solvent containing developerHONTAKE KOUICHI·Filed 2012·Application pending·0 cites
- 3831US8110325B2Substrate treatment methodNIWA TAKAFUMI·Filed 2011·Granted Feb 7, 2012·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →