Inventor · disambiguated record
Hiroki Maehara
Also filed as: MAEHARA HIROKI
16 granted patents·11 pending applications·43 citations·filing 2005–2025
90Inventor score
Top patents by PatentIndex Score
27 records- 0184US8934290B2Magnetoresistance effect device and method of production of the sameCANON ANELVA CORP·Filed 2013·Granted Jan 13, 2015·3 cites·3 claims
- 0284US8131249B2Frequency converterMAEHARA HIROKI·Filed 2010·Granted Mar 6, 2012·9 cites·6 claims
- 0384US8013408B2Negative-resistance device with the use of magneto-resistive effectCANON ANELVA CORP·Filed 2009·Granted Sep 6, 2011·11 cites·9 claims
- 0472US8766629B2Frequency conversion apparatus and frequency conversion methodMAEHARA HIROKI·Filed 2009·Granted Jul 1, 2014·7 cites·10 claims
- 0572US8394649B2Method of production of a magnetoresistance effect deviceDJAYAPRAWIRA DAVID D·Filed 2008·Granted Mar 12, 2013·6 cites·4 claims
- 0671US2025372394A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0769US8540852B2Method and apparatus for manufacturing magnetoresistive devicesWATANABE NAOKI·Filed 2006·Granted Sep 24, 2013·3 cites·6 claims
- 0867US12400963B2Conductive superlattice structures and methods of forming the sameTOKYO ELECTRON LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 0963US7652852B2Magnetoresistance effect device and a preform thereforCANON ANELVA CORP·Filed 2005·Granted Jan 26, 2010·3 cites·4 claims
- 1062US2024371606A1Plasma film forming apparatus and plasma film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1160US2024150890A1Substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1259US10629804B2Method of manufacturing magnetoresistive deviceNAGAMINE YOSHINORI·Filed 2007·Granted Apr 21, 2020·0 cites·10 claims
- 1355US7727409B2Magnetoresistance effect device and method of production thereofCANON ANELVA CORP·Filed 2008·Granted Jun 1, 2010·1 cites·6 claims
- 1454US12336436B2Etching methodTOKYO ELECTRON LTD·Filed 2022·Granted Jun 17, 2025·0 cites·14 claims
- 1554US2025174465A1Hard mask, substrate processing method, and removal method for hard maskTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1653US8367156B2Method of manufacturing magnetoresistive device and apparatus for manufacturing the sameCANON ANELVA CORP·Filed 2011·Granted Feb 5, 2013·0 cites·2 claims
- 1750US12486575B2Apparatus for processing substrate, gas shower head, and method for processing substrateTOKYO ELECTRON LTD·Filed 2022·Granted Dec 2, 2025·0 cites·7 claims
- 1850US11616194B2Etching methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 28, 2023·0 cites·8 claims
- 1949US2009046395A1Magnetoresistive effect thin-film magnetic head and method for fabricating sameCANON ANELVA CORP·Filed 2007·Application pending·0 cites
- 2048US10566525B2Method for manufacturing magnetoresistive elementTOKYO ELECTRON LTD·Filed 2018·Granted Feb 18, 2020·0 cites·9 claims
- 2144US2011094875A1Magnetoresistance effect device and method of production of the sameCANON ANELVA CORP·Filed 2011·Application pending·0 cites
- 2244US2009322419A1Amplifying apparatus using magneto-resistive deviceCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 2343US2008180862A1Method of production of a magnetoresistance effect deviceANELVA CORP·Filed 2008·Application pending·0 cites
- 2442US2008055793A1Magnetoresistance effect deviceANELVA CORP·Filed 2007·Application pending·0 cites
- 2540US2006056115A1Magnetoresistance effect device and method of production of the sameNAT INST OF ADVANCED IND SCIEN·Filed 2005·Application pending·0 cites
- 2638US8836438B2Oscillator element and method for producing the oscillator elementCANON ANELVA CORP·Filed 2012·Granted Sep 16, 2014·0 cites·6 claims
- 2738US2020232090A1Substrate processing device and processing systemTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →