Inventor · disambiguated record
Hitoshi Murata
Also filed as: MURATA HITOSHI
31 granted patents·12 pending applications·627 citations·filing 1983–2025
96Inventor score
Files withKOKUSAI ELECTRIC CORP16HITACHI INT ELECTRIC INC12MURATA HITOSHI4NISSAN MOTOR2TOKYO ELECTRON LTD2
Top patents by PatentIndex Score
43 records- 0198US6383300B1Heat treatment apparatus and cleaning method of the sameTOKYO ELECTRON LTD·Filed 1999·Granted May 7, 2002·458 cites·31 claims
- 0292US6807971B2Heat treatment apparatus and cleaning method of the sameTOKYO ELECTRON LTD·Filed 2002·Granted Oct 26, 2004·56 cites·12 claims
- 0387US11043402B2Cooling unit, heat insulating structure, and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2018·Granted Jun 22, 2021·4 cites·11 claims
- 0484US9587884B2Insulation structure and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Mar 7, 2017·2 cites·20 claims
- 0582US4575934AMethod and system for automatically attaching sub-assembly to main assembly using industrial robotsNISSAN MOTOR·Filed 1983·Granted Mar 18, 1986·46 cites·19 claims
- 0681US12504332B2Substrate temperature sensor, substrate retainer and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2024·Granted Dec 23, 2025·0 cites·20 claims
- 0776US9695511B2Substrate processing apparatus, method of manufacturing semiconductor device and method of processing substrateHITACHI INT ELECTRIC INC·Filed 2014·Granted Jul 4, 2017·3 cites·6 claims
- 0876US9460946B2Substrate processing apparatus and heating equipmentMURATA HITOSHI·Filed 2011·Granted Oct 4, 2016·4 cites·8 claims
- 0974US10340151B2Substrate processing apparatus, heating apparatus, ceiling heat insulator, and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted Jul 2, 2019·2 cites·12 claims
- 1073US9449849B2Method of manufacturing semiconductor device using meander-shaped heating elementHITACHI INT ELECTRIC INC·Filed 2014·Granted Sep 20, 2016·2 cites·7 claims
- 1173US2025239472A1Substrate processing apparatus, method of manufacturing semiconductor device, temperature meter and heater unitKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 1269US11906367B2Substrate temperature sensor, substrate retainer and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2021·Granted Feb 20, 2024·0 cites·16 claims
- 1368US4604797AMethod for automatically attaching sub-assembly to main assembly and system thereof using industrial robotsNISSAN MOTOR·Filed 1983·Granted Aug 12, 1986·23 cites·4 claims
- 1468US2025179642A1Substrate processing apparatus and ceiling heaterKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 1563US12293930B2Substrate processing apparatus, method of manufacturing semiconductor device and heaterKOKUSAI ELECTRIC CORP·Filed 2021·Granted May 6, 2025·0 cites·15 claims
- 1663US8847124B2Heating device having a meander-shaped heating element with an insulating body accomodating the same, and the substrate processing apparatus including the sameMURATA HITOSHI·Filed 2010·Granted Sep 30, 2014·1 cites·7 claims
- 1761US2024234187A1Substrate supporter, substrate processing apparatus, method of measuring temperature, method of manufacturing semiconductor device and recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1860US12241159B2Substrate processing apparatus and ceiling heaterKOKUSAI ELECTRIC CORP·Filed 2019·Granted Mar 4, 2025·0 cites·17 claims
- 1960US11359285B2Substrate processing apparatus, heater and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2020·Granted Jun 14, 2022·0 cites·15 claims
- 2059US8043438B2Device for cleaning CVD device and method of cleaning CVD deviceNAT INST OF ADVANCED IND SCIEN·Filed 2004·Granted Oct 25, 2011·4 cites·1 claims
- 2154US2025004489A1Temperature sensor, substrate processing apparatus, method of manufacturing semiconductor device, and temperature control systemKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 2253US10597780B2Substrate processing apparatus, heater and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2017·Granted Mar 24, 2020·0 cites·14 claims
- 2352US2025226244A1Temperature control method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2025·Application pending·0 cites
- 2451US2022122858A1Method of manufacturing semiconductor device and apparatus for manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2021·Application pending·0 cites
- 2551US2021407865A1Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-transitory Computer-readable Recording MediumKOKUSAI ELECTRIC CORP·Filed 2021·Application pending·0 cites
- 2650US2022122859A1Method of manufacturing semiconductor device and apparatus for manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2021·Application pending·0 cites
- 2748US8535444B2Substrate processing apparatus, method of manufacturing semiconductor device, and ceiling insulating partMURATA HITOSHI·Filed 2009·Granted Sep 17, 2013·0 cites·4 claims
- 2845USD818850SProtector tube for thermocoupleHITACHI INT ELECTRIC INC·Filed 2017·Granted May 29, 2018·4 cites·1 claims
- 2944USD860420SElectric furnace for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2018·Granted Sep 17, 2019·3 cites·1 claims
- 3044USD860419SElectric furnace for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2018·Granted Sep 17, 2019·3 cites·1 claims
- 3144US6935351B2Method of cleaning CVD device and cleaning device thereforRENESAS TECH CORP·Filed 2002·Granted Aug 30, 2005·7 cites·14 claims
- 3241US9957616B2Substrate processing apparatus and heating unitHITACHI INT ELECTRIC INC·Filed 2016·Granted May 1, 2018·0 cites·10 claims
- 3341US8277560B2CVD apparatus and method of cleaning the CVD apparatusSAKAI KATSUO·Filed 2003·Granted Oct 2, 2012·2 cites·6 claims
- 3440US2019024232A1Substrate processing apparatus and substrate retainerHITACHI INT ELECTRIC INC·Filed 2018·Application pending·0 cites
- 3540US2005252451A1Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gasBEPPU TATSURO·Filed 2003·Application pending·0 cites
- 3638US2006201533A1Cvd apparatus and method for cleaning cvd apparatusRES INST OF INNOVATIVE TECH FO·Filed 2004·Application pending·0 cites
- 3737USD819463SProtector tube for thermocoupleHITACHI INT ELECTRIC INC·Filed 2017·Granted Jun 5, 2018·2 cites·1 claims
- 3836US9064912B2Heating device, substrate processing apparatus, and method of manufacturing semiconductor deviceMURATA HITOSHI·Filed 2010·Granted Jun 23, 2015·0 cites·11 claims
- 3935US2004255854A1Cvd apparatus and method of cleaning the cvd apparatusFiled 2003·Application pending·0 cites
- 4034US9779970B2Heater supporting deviceKOSUGI TETSUYA·Filed 2011·Granted Oct 3, 2017·0 cites·15 claims
- 4134USD795209SHeater for semiconductor thermal processHITACHI INT ELECTRIC INC·Filed 2016·Granted Aug 22, 2017·1 cites·1 claims
- 4230USD793974SHeater for semiconductor thermal processHITACHI INT ELECTRIC INC·Filed 2016·Granted Aug 8, 2017·0 cites·1 claims
- 4330USD793975SHeater for semiconductor thermal processHITACHI INT ELECTRIC INC·Filed 2016·Granted Aug 8, 2017·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →