Inventor · disambiguated record
Hong Shih
Also filed as: SHIH HONG · SHIH HONG-PIN
82 granted patents·26 pending applications·1,966 citations·filing 1990–2025
99Inventor score
Top patents by PatentIndex Score
108 records- 0199US6120640ABoron carbide parts and coatings in a plasma reactorAPPLIED MATERIALS INC·Filed 1996·Granted Sep 19, 2000·348 cites·43 claims
- 0297US6352611B1Ceramic composition for an apparatus and method for processing a substrateAPPLIED MATERIALS INC·Filed 2000·Granted Mar 5, 2002·97 cites·22 claims
- 0397US6123791ACeramic composition for an apparatus and method for processing a substrateAPPLIED MATERIALS INC·Filed 1998·Granted Sep 26, 2000·118 cites·52 claims
- 0496US9012030B2Process chamber component having yttrium—aluminum coatingHAN NIANCI·Filed 2012·Granted Apr 21, 2015·30 cites·18 claims
- 0596US8292698B1On-line chamber cleaning using dry ice blastingSHIH HONG·Filed 2007·Granted Oct 23, 2012·67 cites·20 claims
- 0696US7052553B1Wet cleaning of electrostatic chucksLAM RES CORP·Filed 2004·Granted May 30, 2006·174 cites·21 claims
- 0795US6942929B2Process chamber having component with yttrium-aluminum coatingFiled 2002·Granted Sep 13, 2005·90 cites·27 claims
- 0895US6808747B1Coating boron carbide on aluminumSHIH HONG·Filed 2000·Granted Oct 26, 2004·134 cites·22 claims
- 0995US6352081B1Method of cleaning a semiconductor device processing chamber after a copper etch processAPPLIED MATERIALS INC·Filed 1999·Granted Mar 5, 2002·252 cites·15 claims
- 1094US9873940B2Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatusLAM RES CORP·Filed 2014·Granted Jan 23, 2018·16 cites·9 claims
- 1193US6623595B1Wavy and roughened dome in plasma processing reactorAPPLIED MATERIALS INC·Filed 2000·Granted Sep 23, 2003·47 cites·11 claims
- 1293US6508911B1Diamond coated parts in a plasma reactorAPPLIED MATERIALS INC·Filed 1999·Granted Jan 21, 2003·80 cites·40 claims
- 1392US7371467B2Process chamber component having electroplated yttrium containing coatingAPPLIED MATERIALS INC·Filed 2004·Granted May 13, 2008·37 cites·30 claims
- 1492US6592707B2Corrosion-resistant protective coating for an apparatus and method for processing a substrateAPPLIED MATERIALS INC·Filed 2001·Granted Jul 15, 2003·63 cites·31 claims
- 1587US8313635B2Bare aluminum baffles for resist stripping chambersEGLEY FRED D·Filed 2010·Granted Nov 20, 2012·9 cites·11 claims
- 1687US7942973B2Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatusesLAM RES CORP·Filed 2006·Granted May 17, 2011·9 cites·12 claims
- 1787US7833401B2Electroplating an yttrium-containing coating on a chamber componentAPPLIED MATERIALS INC·Filed 2007·Granted Nov 16, 2010·7 cites·20 claims
- 1887US6641697B2Substrate processing using a member comprising an oxide of a group IIIB metalAPPLIED MATERIALS INC·Filed 2001·Granted Nov 4, 2003·53 cites·19 claims
- 1986US7498269B2Cleaning methods for silicon electrode assembly surface contamination removalLAM RES CORP·Filed 2007·Granted Mar 3, 2009·9 cites·5 claims
- 2085US7638004B1Method for cleaning microwave applicator tubeLAM RES CORP·Filed 2006·Granted Dec 29, 2009·8 cites·28 claims
- 2184US10967407B2Conditioning chamber componentLAM RES CORP·Filed 2018·Granted Apr 6, 2021·3 cites·11 claims
- 2284US9123651B2Dense oxide coated component of a plasma processing chamber and method of manufacture thereofLAM RES CORP·Filed 2013·Granted Sep 1, 2015·6 cites·12 claims
- 2384US2025379042A1Method of cleaning chamber components with metal etch residuesLAM RES CORP·Filed 2025·Application pending·0 cites
- 2483US8171877B2Backside mounted electrode carriers and assemblies incorporating the sameAUGUSTINO JASON·Filed 2008·Granted May 8, 2012·8 cites·20 claims
- 2583US7811409B2Bare aluminum baffles for resist stripping chambersLAM RES CORP·Filed 2007·Granted Oct 12, 2010·6 cites·10 claims
- 2683US5194138AMethod for creating a corrosion-resistant aluminum surfaceUNIV SOUTHERN CALIFORNIA·Filed 1990·Granted Mar 16, 1993·56 cites·42 claims
- 2782US8075701B2Processes for reconditioning multi-component electrodesAVOYAN ARMEN·Filed 2008·Granted Dec 13, 2011·7 cites·20 claims
- 2882US7578889B2Methodology for cleaning of surface metal contamination from electrode assembliesLAM RES CORP·Filed 2007·Granted Aug 25, 2009·9 cites·18 claims
- 2981US9546432B2Dense oxide coated component of a plasma processing chamber and method of manufacture thereofLAM RES CORP·Filed 2015·Granted Jan 17, 2017·3 cites·10 claims
- 3081US9337002B2Corrosion resistant aluminum coating on plasma chamber componentsLAM RES CORP·Filed 2013·Granted May 10, 2016·6 cites·21 claims
- 3181US8215321B2Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatusesSHIH HONG·Filed 2011·Granted Jul 10, 2012·3 cites·18 claims
- 3281US8097105B2Extending lifetime of yttrium oxide as a plasma chamber materialSHIH HONG·Filed 2007·Granted Jan 17, 2012·5 cites·11 claims
- 3380US8075703B2Immersive oxidation and etching process for cleaning silicon electrodesAVOYAN ARMEN·Filed 2009·Granted Dec 13, 2011·4 cites·21 claims
- 3479US9105676B2Method of removing damaged epoxy from electrostatic chuckLAM RES CORP·Filed 2012·Granted Aug 11, 2015·5 cites·12 claims
- 3579US7976641B1Extending storage time of removed plasma chamber components prior to cleaning thereofLAM RES CORP·Filed 2005·Granted Jul 12, 2011·3 cites·20 claims
- 3679US7247579B2Cleaning methods for silicon electrode assembly surface contamination removalLAM RES CORP·Filed 2004·Granted Jul 24, 2007·19 cites·24 claims
- 3778US7507670B2Silicon electrode assembly surface decontamination by acidic solutionLAM RES CORP·Filed 2004·Granted Mar 24, 2009·20 cites·21 claims
- 3877US9079228B2Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamberSHIH HONG·Filed 2010·Granted Jul 14, 2015·2 cites·13 claims
- 3977US8276898B2Electrode transporter and fixture sets incorporating the sameAVOYAN ARMEN·Filed 2008·Granted Oct 2, 2012·9 cites·18 claims
- 4075US8679252B2Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereofSHIH HONG·Filed 2005·Granted Mar 25, 2014·5 cites·10 claims
- 4174US6649532B1Methods for etching an organic anti-reflective coatingAPPLIED MATERIALS INC·Filed 2002·Granted Nov 18, 2003·16 cites·14 claims
- 4274US6466881B1Method for monitoring the quality of a protective coating in a reactor chamberAPPLIED MATERIALS INC·Filed 1999·Granted Oct 15, 2002·40 cites·3 claims
- 4373US8585844B2Extending lifetime of yttrium oxide as a plasma chamber materialSHIH HONG·Filed 2011·Granted Nov 19, 2013·2 cites·12 claims
- 4472US10391526B2Electrostatic chuck cleaning fixtureLAM RES CORP·Filed 2013·Granted Aug 27, 2019·3 cites·13 claims
- 4572US9396912B2Methods for mixed acid cleaning of showerhead electrodesAVOYAN ARMEN·Filed 2012·Granted Jul 19, 2016·1 cites·20 claims
- 4672US8276604B2Peripherally engaging electrode carriers and assemblies incorporating the sameAUGUSTINO JASON·Filed 2008·Granted Oct 2, 2012·4 cites·16 claims
- 4772US8110086B2Method of manufacturing a process chamber component having yttrium-aluminum coatingHAN NIANCI·Filed 2007·Granted Feb 7, 2012·2 cites·23 claims
- 4871US12400842B2Method of cleaning chamber components with metal etch residuesLAM RES CORP·Filed 2021·Granted Aug 26, 2025·0 cites·11 claims
- 4971US9293305B2Mixed acid cleaning assembliesAVOYAN ARMEN·Filed 2012·Granted Mar 22, 2016·2 cites·20 claims
- 5071US8022718B2Method for inspecting electrostatic chucks with Kelvin probe analysisLAM RES CORP·Filed 2009·Granted Sep 20, 2011·3 cites·11 claims
Showing the top 50 of 108 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →