Inventor · disambiguated record
Jiro Higashijima
Also filed as: HIGASHIJIMA JIRO
39 granted patents·5 pending applications·103 citations·filing 2007–2023
96Inventor score
Top patents by PatentIndex Score
44 records- 0197US11430673B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 30, 2022·4 cites·18 claims
- 0291US9773687B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Sep 26, 2017·11 cites·17 claims
- 0388US8398817B2Chemical-liquid processing apparatus and chemical-liquid processing methodNAMBA HIROMITSU·Filed 2010·Granted Mar 19, 2013·15 cites·11 claims
- 0486US11574827B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Feb 7, 2023·4 cites·16 claims
- 0586US9355871B2Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cupHIGASHIJIMA JIRO·Filed 2012·Granted May 31, 2016·8 cites·8 claims
- 0685US8696863B2Liquid processing apparatus and liquid processing methodHIGASHIJIMA JIRO·Filed 2010·Granted Apr 15, 2014·8 cites·3 claims
- 0784US9953848B2Substrate liquid processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·6 cites·15 claims
- 0884US8607807B2Liquid treatment apparatus and methodHIGASHIJIMA JIRO·Filed 2012·Granted Dec 17, 2013·7 cites·6 claims
- 0983US9048269B2Substrate liquid treatment apparatus with lift pin plateHIGASHIJIMA JIRO·Filed 2011·Granted Jun 2, 2015·6 cites·14 claims
- 1083US8887741B2Liquid processing apparatus, liquid processing method and storage mediumHIGASHIJIMA JIRO·Filed 2011·Granted Nov 18, 2014·6 cites·10 claims
- 1183US8268087B2Liquid processing apparatus, liquid processing method, and storage mediumKAMIKAWA YUJI·Filed 2008·Granted Sep 18, 2012·8 cites·13 claims
- 1276US8567339B2Liquid processing apparatusHIGASHIJIMA JIRO·Filed 2010·Granted Oct 29, 2013·4 cites·13 claims
- 1375US11056335B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 6, 2021·1 cites·2 claims
- 1472US10297473B2Liquid processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted May 21, 2019·1 cites·15 claims
- 1569US8905051B2Liquid processing apparatus and liquid processing methodHIGASHIJIMA JIRO·Filed 2012·Granted Dec 9, 2014·2 cites·10 claims
- 1668US8741099B2Liquid processing apparatusHIGASHIJIMA JIRO·Filed 2011·Granted Jun 3, 2014·2 cites·8 claims
- 1766US8002894B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Aug 23, 2011·3 cites·14 claims
- 1865US9508569B2Substrate liquid processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Nov 29, 2016·1 cites·11 claims
- 1965US8409482B2Porous memberHIGASHIJIMA JIRO·Filed 2009·Granted Apr 2, 2013·0 cites·5 claims
- 2065US8313536B2Functional member having surface cleanlinessHIGASHIJIMA JIRO·Filed 2009·Granted Nov 20, 2012·0 cites·10 claims
- 2164US10276425B2Substrate processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 30, 2019·1 cites·12 claims
- 2263US9953852B2Liquid processing aparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·1 cites·9 claims
- 2363US9190311B2Liquid arm cleaning unit for substrate processing apparatusHIGASHIJIMA JIRO·Filed 2012·Granted Nov 17, 2015·1 cites·12 claims
- 2462US9159594B2Liquid processing apparatus and liquid processing methodHIGASHIJIMA JIRO·Filed 2012·Granted Oct 13, 2015·1 cites·8 claims
- 2561US9793142B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 17, 2017·1 cites·13 claims
- 2661US9396975B2Liquid treatment apparatus and methodHIGASHIJIMA JIRO·Filed 2012·Granted Jul 19, 2016·1 cites·5 claims
- 2759US2024124984A1Substrate processing apparatus and substrate gripping deviceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2855US12148632B2Substrate processing apparatus and cleaning method of mist guardTOKYO ELECTRON LTD·Filed 2022·Granted Nov 19, 2024·0 cites·17 claims
- 2951US11715650B2Substrate processing apparatus and manufacturing method thereforTOKYO ELECTRON LTD·Filed 2020·Granted Aug 1, 2023·0 cites·10 claims
- 3050US2018090306A1Substrate processing apparatus and processing liquid supply methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3149US8590547B2Liquid processing apparatusHIGASHIJIMA JIRO·Filed 2009·Granted Nov 26, 2013·0 cites·9 claims
- 3246US8298344B2Method of processing workpieces using a vessel with a low pressure space surrounding a processing space for the purpose of preventing the leakage of atmosphere into the processing spaceHIGASHIJIMA JIRO·Filed 2007·Granted Oct 30, 2012·0 cites·6 claims
- 3345US8246759B2Substrate processing apparatus, substrate processing method, and program storage mediumITOH NORIHIRO·Filed 2009·Granted Aug 21, 2012·0 cites·20 claims
- 3444US9933702B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Apr 3, 2018·0 cites·9 claims
- 3543US9818626B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 14, 2017·0 cites·11 claims
- 3642US8944081B2Liquid processing apparatus and liquid processing methodHIGASHIJIMA JIRO·Filed 2012·Granted Feb 3, 2015·0 cites·8 claims
- 3742US2014251539A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3839US10486208B2Substrate processing apparatus, method of cleaning substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Nov 26, 2019·0 cites·14 claims
- 3939US10475671B2Substrate processing apparatus and method of cleaning substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Nov 12, 2019·0 cites·13 claims
- 4039US9022045B2Substrate liquid cleaning apparatus with controlled liquid port ejection angleHIGASHIJIMA JIRO·Filed 2011·Granted May 5, 2015·0 cites·17 claims
- 4139US2012160277A1Liquid Processing Apparatus and Liquid Processing MethodHIGASHIJIMA JIRO·Filed 2011·Application pending·0 cites
- 4239US2012180829A1Liquid Processing ApparatusHIGASHIJIMA JIRO·Filed 2012·Application pending·0 cites
- 4337US11024518B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Jun 1, 2021·0 cites·16 claims
- 4436US11158525B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Oct 26, 2021·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →