Inventor · disambiguated record
John Holland
Also filed as: HOLLAND JOHN · HOLLAND JOHN P · HOLLAND JOHN PATRICK
130 granted patents·59 pending applications·4,630 citations·filing 1994–2025
99Inventor score
Files withLAM RES CORP107APPLIED MATERIALS INC57HOLLAND JOHN PATRICK7MATYUSHKIN ALEXANDER3PATERSON ALEXANDER3
Top patents by PatentIndex Score
189 records- 0198US10115568B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2017·Granted Oct 30, 2018·57 cites·26 claims
- 0298US10026592B2Systems and methods for tailoring ion energy distribution function by odd harmonic mixingLAM RES CORP·Filed 2016·Granted Jul 17, 2018·37 cites·20 claims
- 0398US9852889B1Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2016·Granted Dec 26, 2017·135 cites·21 claims
- 0498US9536749B2Ion energy control by RF pulse shapeLAM RES CORP·Filed 2014·Granted Jan 3, 2017·69 cites·21 claims
- 0598US6635578B1Method of operating a dual chamber reactor with neutral density decoupled from ion densityAPPLIED MATERIALS INC·Filed 2000·Granted Oct 21, 2003·615 cites·51 claims
- 0697US11935726B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2021·Granted Mar 19, 2024·6 cites·31 claims
- 0797US10504744B1Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 10, 2019·25 cites·12 claims
- 0897US9761414B2Uniformity control circuit for use within an impedance matching circuitLAM RES CORP·Filed 2015·Granted Sep 12, 2017·38 cites·23 claims
- 0997US9595424B2Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processesLAM RES CORP·Filed 2015·Granted Mar 14, 2017·50 cites·21 claims
- 1097US7264688B1Plasma reactor apparatus with independent capacitive and toroidal plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 4, 2007·73 cites·16 claims
- 1197US6818562B2Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Nov 16, 2004·94 cites·12 claims
- 1297US6617794B2Method for controlling etch uniformityAPPLIED MATERIALS INC·Filed 2001·Granted Sep 9, 2003·87 cites·31 claims
- 1397US6507155B1Inductively coupled plasma source with controllable power depositionAPPLIED MATERIALS INC·Filed 2000·Granted Jan 14, 2003·106 cites·61 claims
- 1497US6472822B1Pulsed RF power delivery for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Oct 29, 2002·178 cites·34 claims
- 1597US6414648B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·142 cites·36 claims
- 1697US5800619AVacuum plasma processor having coil with minimum magnetic field in its centerLAM RES CORP·Filed 1996·Granted Sep 1, 1998·111 cites·41 claims
- 1796US12387909B2Low frequency RF generator and associated electrostatic chuckLAM RES CORP·Filed 2021·Granted Aug 12, 2025·3 cites·20 claims
- 1896US11908660B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2022·Granted Feb 20, 2024·2 cites·20 claims
- 1996US10283330B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2017·Granted May 7, 2019·14 cites·19 claims
- 2096US8900402B2Semiconductor processing system having multiple decoupled plasma sourcesHOLLAND JOHN PATRICK·Filed 2011·Granted Dec 2, 2014·38 cites·20 claims
- 2196US8226769B2Substrate support with electrostatic chuck having dual temperature zonesMATYUSHKIN ALEXANDER·Filed 2007·Granted Jul 24, 2012·80 cites·34 claims
- 2296US8075729B2Method and apparatus for controlling temperature of a substrateHOLLAND JOHN·Filed 2005·Granted Dec 13, 2011·51 cites·22 claims
- 2396US7645357B2Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequencyAPPLIED MATERIALS INC·Filed 2006·Granted Jan 12, 2010·40 cites·12 claims
- 2496US6685798B1Plasma reactor having a symmetrical parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 3, 2004·75 cites·13 claims
- 2596US6447636B1Plasma reactor with dynamic RF inductive and capacitive coupling controlAPPLIED MATERIALS INC·Filed 2000·Granted Sep 10, 2002·215 cites·43 claims
- 2695US12165844B2Uniformity control circuit for impedance matchLAM RES CORP·Filed 2021·Granted Dec 10, 2024·3 cites·20 claims
- 2795US11651991B2Electrostatic Chuck design for cooling-gas light-up preventionLAM RES CORP·Filed 2021·Granted May 16, 2023·2 cites·15 claims
- 2895US10615003B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2018·Granted Apr 7, 2020·9 cites·20 claims
- 2995US9984859B2Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processesLAM RES CORP·Filed 2017·Granted May 29, 2018·15 cites·18 claims
- 3095US9673058B1Method for etching features in dielectric layersLAM RES CORP·Filed 2016·Granted Jun 6, 2017·24 cites·17 claims
- 3195US8663391B2Electrostatic chuck having a plurality of heater coilsMATYUSHKIN ALEXANDER·Filed 2012·Granted Mar 4, 2014·35 cites·20 claims
- 3295US6962644B2Tandem etch chamber plasma processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Nov 8, 2005·108 cites·35 claims
- 3395US6893533B2Plasma reactor having a symmetric parallel conductor coil antennaFiled 2003·Granted May 17, 2005·64 cites·22 claims
- 3495US6462481B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Oct 8, 2002·68 cites·41 claims
- 3595US5892198AMethod of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for sameLAM RES CORP·Filed 1996·Granted Apr 6, 1999·102 cites·31 claims
- 3694US11158488B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2019·Granted Oct 26, 2021·13 cites·36 claims
- 3794US9177756B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Nov 3, 2015·23 cites·19 claims
- 3894US6706138B2Adjustable dual frequency voltage dividing plasma reactorAPPLIED MATERIALS INC·Filed 2001·Granted Mar 16, 2004·56 cites·12 claims
- 3994US6694915B1Plasma reactor having a symmetrical parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 24, 2004·60 cites·38 claims
- 4094US6280563B1Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasmaLAM RES CORP·Filed 1997·Granted Aug 28, 2001·101 cites·27 claims
- 4194US6125025AElectrostatic dechucking method and apparatus for dielectric workpieces in vacuum processorsLAM RES CORP·Filed 1998·Granted Sep 26, 2000·158 cites·42 claims
- 4293US11195706B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2019·Granted Dec 7, 2021·7 cites·21 claims
- 4393US10340122B2Systems and methods for tailoring ion energy distribution function by odd harmonic mixingLAM RES CORP·Filed 2018·Granted Jul 2, 2019·7 cites·15 claims
- 4493US10257887B2Substrate support assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·6 cites·20 claims
- 4593US7780864B2Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·21 cites·17 claims
- 4693US7436645B2Method and apparatus for controlling temperature of a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Oct 14, 2008·37 cites·14 claims
- 4792US11335539B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2018·Granted May 17, 2022·6 cites·29 claims
- 4892US10002746B1Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2017·Granted Jun 19, 2018·8 cites·26 claims
- 4992US9883549B2Substrate support assembly having rapid temperature controlAPPLIED MATERIALS INC·Filed 2016·Granted Jan 30, 2018·6 cites·20 claims
- 5092US9275887B2Substrate processing with rapid temperature gradient controlMATYUSHKIN ALEXANDER·Filed 2007·Granted Mar 1, 2016·20 cites·19 claims
Showing the top 50 of 189 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →