Inventor · disambiguated record
Junqi Wei
Also filed as: WEI JUNQI
16 granted patents·3 pending applications·39 citations·filing 2014–2023
88Inventor score
Files withAPPLIED MATERIALS INC19
Top patents by PatentIndex Score
19 records- 0187USD913979SInner shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Mar 23, 2021·27 cites·1 claims
- 0283US12148629B2Shutter diskAPPLIED MATERIALS INC·Filed 2023·Granted Nov 19, 2024·0 cites·10 claims
- 0380US11328929B2Methods, apparatuses and systems for substrate processing for lowering contact resistanceAPPLIED MATERIALS INC·Filed 2019·Granted May 10, 2022·2 cites·13 claims
- 0474US11862480B2Shutter diskAPPLIED MATERIALS INC·Filed 2021·Granted Jan 2, 2024·0 cites·9 claims
- 0571USD973609SUpper shield with showerhead for a process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Dec 27, 2022·5 cites·1 claims
- 0668US11171017B2Shutter diskAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·12 claims
- 0764US11670513B2Apparatus and systems for substrate processing for lowering contact resistanceAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·0 cites·18 claims
- 0858US9960023B2Methods and apparatus for nodule control in a titanium-tungsten targetAPPLIED MATERIALS INC·Filed 2014·Granted May 1, 2018·0 cites·16 claims
- 0957USD931241SLower shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Sep 21, 2021·5 cites·1 claims
- 1054US12080522B2Preclean chamber upper shield with showerheadAPPLIED MATERIALS INC·Filed 2020·Granted Sep 3, 2024·0 cites·19 claims
- 1154US2024395514A1Multi-chamber processing tool with enhanced throughputAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1253US2024068086A1Physical Vapor Deposition (PVD) Chamber Titanium-Tungsten (TiW) Target For Particle ImprovementAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1351US11913107B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2019·Granted Feb 27, 2024·0 cites·20 claims
- 1451US11881385B2Methods and apparatus for reducing defects in preclean chambersAPPLIED MATERIALS INC·Filed 2020·Granted Jan 23, 2024·0 cites·20 claims
- 1549US11114288B2Physical vapor deposition apparatusAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·0 cites·20 claims
- 1646US12100577B2High conductance inner shield for process chamberAPPLIED MATERIALS INC·Filed 2019·Granted Sep 24, 2024·0 cites·20 claims
- 1745US2021066051A1High conductance lower shield for process chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1842USD971167SLower shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2021·Granted Nov 29, 2022·0 cites·1 claims
- 1942US10115573B2Apparatus for high compressive stress film deposition to improve kit lifeAPPLIED MATERIALS INC·Filed 2015·Granted Oct 30, 2018·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Junqi Wei files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →