Inventor · disambiguated record
Keita Ishiduka
Also filed as: ISHIDUKA KEITA
20 granted patents·9 pending applications·139 citations·filing 2004–2012
94Inventor score
Top patents by PatentIndex Score
29 records- 0198US7713679B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted May 11, 2010·57 cites·11 claims
- 0292US7776510B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 17, 2010·14 cites·12 claims
- 0389US8338076B2Resist composition, method of forming resist pattern, novel compound, and acid generatorKAWAUE AKIYA·Filed 2009·Granted Dec 25, 2012·7 cites·24 claims
- 0488US7799883B2Norbornene-type polymers, compositions thereof and lithographic process using such compositionsPROMERUS LLC·Filed 2006·Granted Sep 21, 2010·10 cites·23 claims
- 0585US7745097B2Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 29, 2010·4 cites·19 claims
- 0683US7488568B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 10, 2009·7 cites·15 claims
- 0782US7955777B2Compound, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 7, 2011·4 cites·14 claims
- 0876US8252505B2Compound and method of producing same, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2009·Granted Aug 28, 2012·4 cites·12 claims
- 0974US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 1073US8329838B2Norbornene-type polymers, compositions thereof and lithographic processes using such compositionsRHODES LARRY F·Filed 2010·Granted Dec 11, 2012·2 cites·18 claims
- 1168US8247160B2Resist composition, method of forming resist pattern, and novel compound and acid generatorUTSUMI YOSHIYUKI·Filed 2009·Granted Aug 21, 2012·2 cites·14 claims
- 1268US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 1363US8097397B2Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective filmTAKAYAMA TOSHIKAZU·Filed 2007·Granted Jan 17, 2012·2 cites·14 claims
- 1458US9040220B2Compound and method of producing the same, acid generator, resist composition and method of forming resist patternHADA HIDEO·Filed 2012·Granted May 26, 2015·0 cites·17 claims
- 1557US7501220B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 10, 2009·9 cites·10 claims
- 1649US8211616B2Positive resist composition and method of forming resist patternSHIMIZU HIROAKI·Filed 2009·Granted Jul 3, 2012·0 cites·5 claims
- 1747US9034556B2Compound and method of producing the same, acid generator, resist composition and method of forming resist patternHADA HIDEO·Filed 2008·Granted May 19, 2015·2 cites·11 claims
- 1844US2009280431A1Material for protective film formation, and method for photoresist pattern formation using the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 1943US2010124720A1Material for protective film formation, and method for photoresist pattern formation using the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 2042US8278025B2Material for forming resist protection films and method for resist pattern formation with the sameISHIDUKA KEITA·Filed 2005·Granted Oct 2, 2012·0 cites·6 claims
- 2141US2006235174A1Norbornene-type polymers, compositions thereof and lithographic processes using such compositionsTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 2241US2009048409A1Acrylic copolymerTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 2340US8409781B2Composition for formation of resist protection film, and method for formation of resist pattern using the sameISHIDUKA KEITA·Filed 2007·Granted Apr 2, 2013·0 cites·3 claims
- 2437US2009053646A1Material for protective film formation and method of forming resist pattern therewithISHIDUKA KEITA·Filed 2006·Application pending·0 cites
- 2536US2007190448A1Positive-type resist composition for liquid immersion lithography and method for forming resist patternISHIDUKA KEITA·Filed 2005·Application pending·0 cites
- 2633US8198004B2Resist compositionHIRAYAMA TAKU·Filed 2008·Granted Jun 12, 2012·0 cites·2 claims
- 2732US2011053097A1Protective film-forming material and method of photoresist patterning with itISHIDUKA KEITA·Filed 2010·Application pending·0 cites
- 2831US2006154171A1Photoresist composition and method of forming resist patternHIRAYAMA TAKU·Filed 2004·Application pending·0 cites
- 2930US2010151395A1Protective film-removing solvent and method of photoresist patterning with itISHIDUKA KEITA·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →