Inventor · disambiguated record
Kensaku Narushima
Also filed as: NARUSHIMA KENSAKU
22 granted patents·16 pending applications·33 citations·filing 2005–2025
91Inventor score
Top patents by PatentIndex Score
38 records- 0184US9536745B2Tungsten film forming methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 3, 2017·5 cites·18 claims
- 0283US10872814B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 22, 2020·3 cites·8 claims
- 0382US8257790B2Ti-containing film formation method and storage mediumNARUSHIMA KENSAKU·Filed 2007·Granted Sep 4, 2012·6 cites·20 claims
- 0480US7737005B2Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer programTOKYO ELECTRON LTD·Filed 2005·Granted Jun 15, 2010·6 cites·15 claims
- 0577US7981794B2Film forming method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Jul 19, 2011·6 cites·16 claims
- 0672US9390933B2Etching method, storage medium and etching apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Jul 12, 2016·3 cites·11 claims
- 0767US10870919B2Gas supply method and film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Dec 22, 2020·1 cites·5 claims
- 0864US12463041B2Method and apparatus for forming ruthenium silicide film on surface of substrateTOKYO ELECTRON LTD·Filed 2023·Granted Nov 4, 2025·0 cites·20 claims
- 0964US9646848B2Etching method, etching apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted May 9, 2017·1 cites·5 claims
- 1062US10221478B2Film formation deviceTOKYO ELECTRON LTD·Filed 2014·Granted Mar 5, 2019·1 cites·17 claims
- 1161US2024337022A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1260US10829854B2Film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Nov 10, 2020·0 cites·12 claims
- 1360US2025379072A1Substrate heating apparatus and substrate heating methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1455US11155923B2Gas supply device, gas supply method and film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 26, 2021·0 cites·4 claims
- 1555US8334208B2Film-forming method and film-forming apparatusNARUSHIMA KENSAKU·Filed 2011·Granted Dec 18, 2012·1 cites·33 claims
- 1653US2023076867A1Film forming method, method of manufacturing semiconductor device, and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1749US11873556B2Raw material supply apparatus and film forming apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 16, 2024·0 cites·14 claims
- 1849US10910225B2Film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Feb 2, 2021·0 cites·6 claims
- 1946US11629404B2Method of forming tungsten film and controllerTOKYO ELECTRON LTD·Filed 2019·Granted Apr 18, 2023·0 cites·11 claims
- 2046US2011061432A1Surface treatment method, shower head, processing container, and processing apparatus using themTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2145US11984319B2Substrate processing method and film forming systemTOKYO ELECTRON LTD·Filed 2020·Granted May 14, 2024·0 cites·16 claims
- 2245US8263181B2Ti-based film forming method and storage mediumNARUSHIMA KENSAKU·Filed 2009·Granted Sep 11, 2012·0 cites·20 claims
- 2345US2010216304A1Method for forming ti film and tin film, contact structure, computer readable storage medium and computer programTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2445US2012115400A1Surface treatment method, shower head, processing container, and processing apparatus using themKAKEGAWA TAKASHI·Filed 2012·Application pending·0 cites
- 2545US2011159188A1Film deposition apparatus, film deposition method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2645US2021010130A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2745US2023212738A1Method and device for forming tungsten film, and device for forming intermediate film before forming tungsten filmTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2844US2015184294A1Film deposition apparatus, film deposition method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2943US7906442B2Gas treatment method and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2006·Granted Mar 15, 2011·0 cites·17 claims
- 3043US2022356581A1Gas supply device and gas supply methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3142US10316410B2Method of filling recesses in substrate with tungstenTOKYO ELECTRON LTD·Filed 2017·Granted Jun 11, 2019·0 cites·12 claims
- 3240US11753719B2Flow rate control method, flow rate control device, and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 12, 2023·0 cites·8 claims
- 3339US2005233093A1Film formation method and apparatus utilizing plasma CVDTADA KUNIHIRO·Filed 2005·Application pending·0 cites
- 3439US2007131168A1Gas Supplying unit and substrate processing apparatusGOMI HISASHI·Filed 2006·Application pending·0 cites
- 3538US2010240216A1Film formation method and apparatus utilizing plasma cvdTADA KUNIHIRO·Filed 2010·Application pending·0 cites
- 3637US2006127601A1Film formation methodTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 3735US2012034793A1Method for forming metal nitride filmNARUSHIMA KENSAKU·Filed 2011·Application pending·0 cites
- 3829US10256101B2Raw material gas supply apparatus, raw material gas supply method and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Apr 9, 2019·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →