Inventor · disambiguated record
Kunihiro Miyazaki
Also filed as: MIYAZAKI KUNIHIRO
40 granted patents·16 pending applications·719 citations·filing 1986–2017
98Inventor score
Top patents by PatentIndex Score
56 records- 0194US4954141APolishing pad for semiconductor wafersSHOWA DENKO KK·Filed 1989·Granted Sep 4, 1990·194 cites·6 claims
- 0286US4915710AAbrasive composition and process for polishingSHOWA DENKO KK·Filed 1989·Granted Apr 10, 1990·43 cites·17 claims
- 0384US7619896B2Electrical junction boxAUTONETWORKS TECHNOLOGIES LTD·Filed 2005·Granted Nov 17, 2009·14 cites·17 claims
- 0484US4902649AHard tissue substitute compositionSHOWA DENKO KK·Filed 1987·Granted Feb 20, 1990·72 cites·16 claims
- 0583US6444047B1Method of cleaning a semiconductor substrateTOSHIBA KK·Filed 2000·Granted Sep 3, 2002·24 cites·6 claims
- 0679US10281210B2Substrate processing apparatus and substrate processing methodSHIBAURA MECHATRONICS CORP·Filed 2014·Granted May 7, 2019·4 cites·10 claims
- 0778US6832616B2Substrate treating apparatusTOSHIBA KK·Filed 2002·Granted Dec 21, 2004·18 cites·16 claims
- 0876US5686314ASurface processing method effected for total-reflection X-ray fluorescence analysisTOSHIBA KK·Filed 1994·Granted Nov 11, 1997·40 cites·22 claims
- 0974US4929257AAbrasive composition and process for polishingSHOWA DENKO KK·Filed 1989·Granted May 29, 1990·31 cites·15 claims
- 1073US7902030B2Manufacturing method for semiconductor device and semiconductor deviceTOSHIBA KK·Filed 2009·Granted Mar 8, 2011·3 cites·9 claims
- 1171US4935039AAbrasive composition and process for polishing plastic articleSHOWA DENKO KK·Filed 1989·Granted Jun 19, 1990·22 cites·11 claims
- 1269US6645876B2Etching for manufacture of semiconductor devicesTOSHIBA KK·Filed 2001·Granted Nov 11, 2003·12 cites·23 claims
- 1369US5732120AFluorescent X-ray analyzing apparatusRIGAKU IND CORP·Filed 1997·Granted Mar 24, 1998·35 cites·7 claims
- 1468US5868855ASurface processing method and surface processing device for silicon substratesKABUSHKI KAISHA TOSHIBA·Filed 1996·Granted Feb 9, 1999·34 cites·10 claims
- 1567US5632868AMethod and apparatus for generating ozone and methods of its useEBARA CORP·Filed 1995·Granted May 27, 1997·24 cites·1 claims
- 1666US5497407AContaminating-element analyzing methodTOSHIBA KK·Filed 1993·Granted Mar 5, 1996·28 cites·5 claims
- 1765US5457726AAnalyzer for total reflection fluorescent x-ray and its correcting methodTOSHIBA KK·Filed 1994·Granted Oct 10, 1995·26 cites·11 claims
- 1864US7365012B2Etching method, a method of forming a trench isolation structure, a semiconductor substrate and a semiconductor apparatusSEIKO EPSON CORP·Filed 2005·Granted Apr 29, 2008·2 cites·17 claims
- 1963US7635601B2Method of manufacturing semiconductor device and cleaning apparatusTOSHIBA KK·Filed 2006·Granted Dec 22, 2009·1 cites·11 claims
- 2062US7875557B2Semiconductor substrate treating method, semiconductor component and electronic applianceSEIKO EPSON CORP·Filed 2005·Granted Jan 25, 2011·1 cites·10 claims
- 2160US5430786AElement analyzing methodTOSHIBA KK·Filed 1993·Granted Jul 4, 1995·22 cites·7 claims
- 2258US7850818B2Method of manufacturing semiconductor device and cleaning apparatusTOSHIBA KK·Filed 2009·Granted Dec 14, 2010·0 cites·5 claims
- 2357US7305275B2Material supply system in semiconductor device manufacturing plantEBARA CORP·Filed 2003·Granted Dec 4, 2007·6 cites·16 claims
- 2456US5792326AMethod and apparatus for generating ozone and methods of its useFiled 1997·Granted Aug 11, 1998·14 cites·5 claims
- 2554US10406566B2Substrate processing device and substrate processing methodSHIBAURA MECHATRONICS CORP·Filed 2017·Granted Sep 10, 2019·0 cites·4 claims
- 2653US2008202559A1Wafer cleaning method and equipmentSEIKO EPSON CORP·Filed 2008·Application pending·0 cites
- 2752US7875527B2Manufacturing method for semiconductor device and semiconductor deviceTOSHIBA KK·Filed 2009·Granted Jan 25, 2011·0 cites·15 claims
- 2852US2015090297A1Substrate processing device and substrate processing methodSHIBAURA MECHATRONICS CORP·Filed 2014·Application pending·0 cites
- 2951US8066020B2Substrate cleaning apparatus and substrate cleaning methodTOMITA HIROSHI·Filed 2006·Granted Nov 29, 2011·0 cites·5 claims
- 3051US4883502AAbrasive composition and process for polishingSHOWA DENKO KK·Filed 1988·Granted Nov 28, 1989·8 cites·12 claims
- 3150US8148717B2Manufacturing method for semiconductor device and semiconductor deviceITO TAKAYUKI·Filed 2011·Granted Apr 3, 2012·0 cites·7 claims
- 3250US2010151696A1Manufacturing method for semiconductor device and heat treatment apparatusITO TAKAYUKI·Filed 2009·Application pending·0 cites
- 3349US7141120B2Manufacturing apparatus of semiconductor device having introducing section and withdrawing sectionTOSHIBA KK·Filed 2002·Granted Nov 28, 2006·2 cites·11 claims
- 3448US2012031441A1Substrate cleaning apparatus and substrate cleaning methodTOMITA HIROSHI·Filed 2011·Application pending·0 cites
- 3546US5422925AContaminating-element analyzing method and apparatus of the sameTOSHIBA KK·Filed 1993·Granted Jun 6, 1995·12 cites·9 claims
- 3644US7439183B2Method of manufacturing a semiconductor device, and a semiconductor substrateTOSHIBA KK·Filed 2005·Granted Oct 21, 2008·0 cites·14 claims
- 3744US2011089525A1Manufacturing method for semiconductor device and semiconductor deviceTOSHIBA KK·Filed 2010·Application pending·0 cites
- 3844US2008006295A1Semiconductor manufacturing apparatus for use in process of cleaning semiconductor substrate and method of manufacturing semiconductor device using the sameMIYAZAKI KUNIHIRO·Filed 2006·Application pending·0 cites
- 3943US2015090298A1Substrate processing device and substrate processing methodSHIBAURA MECHANTRONICS CORP·Filed 2014·Application pending·0 cites
- 4043US2007233302A1System for controlling production of electronic devices, system and method for producing electronic devices, and computer program productMIYAZAKI KUNIHIRO·Filed 2006·Application pending·0 cites
- 4143US2005081886A1Wafer cleaning method and equipmentFiled 2004·Application pending·0 cites
- 4243US2014041694A1Cleaning solution producing apparatus, cleaning solution producing method, and substrate cleaning apparatusSHIBAURA MECHATRONICS CORP·Filed 2013·Application pending·0 cites
- 4340US5636256AApparatus used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impuritiesTOSHIBA KK·Filed 1996·Granted Jun 3, 1997·11 cites·10 claims
- 4440US2006042756A1Semiconductor manufacturing apparatus and chemical exchanging methodMIYAZAKI KUNIHIRO·Filed 2005·Application pending·0 cites
- 4540US2015090296A1Substrate processing device and substrate processing methodSHIBAURA MECHATRONICS CORP·Filed 2014·Application pending·0 cites
- 4639US11670522B2Processing liquid generator and substrate processing apparatus using the sameSHIBAURA MECHATRONICS CORP·Filed 2017·Granted Jun 6, 2023·0 cites·19 claims
- 4738US5490194AMethod and apparatus for analyzing contaminative element concentrationsTOSHIBA KK·Filed 1994·Granted Feb 6, 1996·7 cites·4 claims
- 4838US2003221960A1Semiconductor manufacturing device, semiconductor manufacturing system and substrate treating methodFiled 2003·Application pending·0 cites
- 4937US8841205B2Manufacturing method and apparatus for semiconductor deviceKAMIMURA MASAKI·Filed 2011·Granted Sep 23, 2014·0 cites·10 claims
- 5037US2011034015A1Heat treatment apparatus and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2010·Application pending·0 cites
Showing the top 50 of 56 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →