Inventor · disambiguated record
Leonid Poslavsky
Also filed as: POSLAVSKY LEONID
49 granted patents·2 pending applications·518 citations·filing 1996–2019
98Inventor score
Top patents by PatentIndex Score
51 records- 0196US9291554B2Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspectionKUZNETSOV ALEXANDER·Filed 2014·Granted Mar 22, 2016·67 cites·23 claims
- 0294US10345095B1Model based measurement systems with improved electromagnetic solver performanceKLA TENCOR CORP·Filed 2015·Granted Jul 9, 2019·11 cites·20 claims
- 0394US9915522B1Optimized spatial modeling for optical CD metrologyJIANG PEILIN·Filed 2014·Granted Mar 13, 2018·94 cites·26 claims
- 0493US10006865B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2017·Granted Jun 26, 2018·8 cites·15 claims
- 0593US9405290B1Model for optical dispersion of high-K dielectrics including defectsKLA TENCOR CORP·Filed 2014·Granted Aug 2, 2016·19 cites·20 claims
- 0692US9595481B1Dispersion model for band gap trackingKLA TENCOR CORP·Filed 2014·Granted Mar 14, 2017·18 cites·20 claims
- 0792US9347872B1Meta-model based measurement refinementKLA TENCOR CORP·Filed 2014·Granted May 24, 2016·11 cites·20 claims
- 0892US8045179B1Bright and dark field scatterometry systems for line roughness metrologyKLA TENCOR CORP·Filed 2008·Granted Oct 25, 2011·25 cites·25 claims
- 0992US7321426B1Optical metrology on patterned samplesKLA TENCOR TECH CORP·Filed 2004·Granted Jan 22, 2008·66 cites·42 claims
- 1091US10605722B2Metrology system calibration refinementKLA TENCOR CORP·Filed 2017·Granted Mar 31, 2020·5 cites·20 claims
- 1190US9412673B2Multi-model metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 9, 2016·10 cites·25 claims
- 1289US10151986B2Signal response metrology based on measurements of proxy structuresKLA TENCOR CORP·Filed 2015·Granted Dec 11, 2018·6 cites·22 claims
- 1389US9903711B2Feed forward of metrology data in a metrology systemKLA TENCOR CORP·Filed 2016·Granted Feb 27, 2018·5 cites·33 claims
- 1487US9664734B2Multi-oscillator, continuous Cody-Lorentz model of optical dispersionKLA TENCOR CORP·Filed 2016·Granted May 30, 2017·6 cites·20 claims
- 1584US10386729B2Dynamic removal of correlation of highly correlated parameters for optical metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 20, 2019·4 cites·22 claims
- 1684US9857291B2Metrology system calibration refinementKLA TENCOR CORP·Filed 2014·Granted Jan 2, 2018·5 cites·21 claims
- 1783US8711349B2High throughput thin film characterization and defect detectionKLA TENCOR CORP·Filed 2012·Granted Apr 29, 2014·8 cites·21 claims
- 1880US7760358B1Film measurementKLA TENCOR CORP·Filed 2007·Granted Jul 20, 2010·7 cites·20 claims
- 1978US8930156B2Metrology through use of feed forward feed sideways and measurement cell re-useADEL MICHAEL·Filed 2009·Granted Jan 6, 2015·5 cites·37 claims
- 2076US8577820B2Accurate and fast neural network training for library-based critical dimension (CD) metrologyJIN WEN·Filed 2011·Granted Nov 5, 2013·8 cites·18 claims
- 2176US7375828B1Modal method modeling of binary gratings with improved eigenvalue computationKLA TENCOR CORP·Filed 2005·Granted May 20, 2008·9 cites·14 claims
- 2275US10393647B1System, method, and computer program product for automatically determining a parameter causing an abnormal semiconductor metrology measurementKLA TENCOR CORP·Filed 2014·Granted Aug 27, 2019·4 cites·17 claims
- 2375US10190868B2Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processingKLA TENCOR CORP·Filed 2015·Granted Jan 29, 2019·2 cites·11 claims
- 2475US9625823B1Calculation method for local film stress measurements using local film thickness valuesKAACK TORSTEN R·Filed 2011·Granted Apr 18, 2017·7 cites·19 claims
- 2575US9311431B2Secondary target design for optical measurementsKLA TENCOR CORP·Filed 2012·Granted Apr 12, 2016·5 cites·32 claims
- 2675US9127927B2Techniques for optimized scatterometryILORETA JONATHAN·Filed 2012·Granted Sep 8, 2015·5 cites·40 claims
- 2774US9719932B1Confined illumination for small spot size metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·2 cites·11 claims
- 2873US10079183B2Calculated electrical performance metrics for process monitoring and yield managementKLA TENCOR CORP·Filed 2014·Granted Sep 18, 2018·3 cites·19 claims
- 2971US9607265B2Accurate and fast neural network training for library-based critical dimension (CD) metrologyJIN WEN·Filed 2013·Granted Mar 28, 2017·5 cites·8 claims
- 3070US10410935B1Dispersion model for band gap trackingKLA TENCOR CORP·Filed 2017·Granted Sep 10, 2019·1 cites·16 claims
- 3170US9553033B2Semiconductor device models including re-usable sub-structuresKLA TENCOR CORP·Filed 2015·Granted Jan 24, 2017·2 cites·20 claims
- 3270US9046474B2Multi-analyzer angle spectroscopic ellipsometryKWAK HIDONG·Filed 2012·Granted Jun 2, 2015·2 cites·18 claims
- 3368US8797534B2Optical system polarizer calibrationKLA TENCOR CORP·Filed 2013·Granted Aug 5, 2014·1 cites·20 claims
- 3467US6649075B1Method and apparatus for measuring etch uniformity of a semiconductor waferAPPLIED MATERIALS INC·Filed 1996·Granted Nov 18, 2003·22 cites·6 claims
- 3567US6535779B1Apparatus and method for endpoint control and plasma monitoringAPPLIED MATERIALS INC·Filed 1998·Granted Mar 18, 2003·41 cites·40 claims
- 3662US11175589B2Automatic wavelength or angle pruning for optical metrologyLEE LIE QUAN·Filed 2014·Granted Nov 16, 2021·1 cites·28 claims
- 3762US10770362B1Dispersion model for band gap trackingKLA CORP·Filed 2019·Granted Sep 8, 2020·0 cites·19 claims
- 3860US9442063B2Measurement of composition for thin filmsDi ming·Filed 2012·Granted Sep 13, 2016·1 cites·33 claims
- 3960US7345761B1Film measurementKLA TENCOR TECH CORP·Filed 2004·Granted Mar 18, 2008·3 cites·20 claims
- 4059US10088413B2Spectral matching based calibrationKLA TENCOR CORP·Filed 2012·Granted Oct 2, 2018·1 cites·23 claims
- 4156US9559019B2Metrology through use of feed forward feed sideways and measurement cell re-useKLA TENCOR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·7 claims
- 4255US7362686B1Film measurement using reflectance computationKLA TENCOR TECH CORP·Filed 2004·Granted Apr 22, 2008·7 cites·20 claims
- 4350US7190453B1Film measurementKLA TENCOR TECH CORP·Filed 2004·Granted Mar 13, 2007·5 cites·20 claims
- 4449US7801713B1Generating a model using global node optimizationKLA TENCOR CORP·Filed 2006·Granted Sep 21, 2010·1 cites·10 claims
- 4547US2016322267A1Multi-model metrologyKLA TENCOR CORP·Filed 2016·Application pending·0 cites
- 4643US8570514B2Optical system polarizer calibrationDE VEER JOHANNES D·Filed 2011·Granted Oct 29, 2013·0 cites·1 claims
- 4741US10895810B2Automatic selection of sample values for optical metrologyCAO MENG·Filed 2014·Granted Jan 19, 2021·0 cites·24 claims
- 4840US10481088B2Automatic determination of fourier harmonic order for computation of spectral information for diffraction structuresBACKUES MARK·Filed 2014·Granted Nov 19, 2019·0 cites·29 claims
- 4938US10648793B2Library expansion system, method, and computer program product for metrologyKLA TENCOR CORP·Filed 2015·Granted May 12, 2020·0 cites·13 claims
- 5036US2013158957A1Library generation with derivatives in optical metrologyLEE LIE-QUAN·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →