Inventor · disambiguated record
Louis John Markoya
Also filed as: MARKOYA LOUIS · MARKOYA LOUIS J · MARKOYA LOUIS JOHN · SEWELL HARRY
28 granted patents·3 pending applications·144 citations·filing 1996–2018
96Inventor score
Files withASML HOLDING NV14ASML NETHERLANDS BV5SEWELL HARRY5SVG LITHOGRAPHY SYSTEMS INC2ASML HOLDING B V1
Top patents by PatentIndex Score
31 records- 0190US6628372B2Use of multiple reticles in lithographic printing toolsFiled 2001·Granted Sep 30, 2003·44 cites·5 claims
- 0288US10001713B2Lithographic apparatus and methodASML HOLDING NV·Filed 2014·Granted Jun 19, 2018·7 cites·15 claims
- 0387US10649349B2Lithographic apparatus, a dryer and a method of removing liquid from a surfaceASML NETHERLANDS BV·Filed 2018·Granted May 12, 2020·2 cites·20 claims
- 0487US7256864B2Liquid immersion lithography system having a tilted showerhead relative to a substrateASML NETHERLANDS BV·Filed 2006·Granted Aug 14, 2007·7 cites·5 claims
- 0586US7253879B2Liquid immersion lithography system with tilted liquid flowASML HOLDING NV·Filed 2006·Granted Aug 7, 2007·6 cites·3 claims
- 0685US10185231B2Lithographic apparatus, a dryer and a method of removing liquid from a surfaceASML NETHERLANDS BV·Filed 2017·Granted Jan 22, 2019·2 cites·20 claims
- 0784US7474385B2Adjustable resolution interferometric lithography systemASML HOLDING NV·Filed 2006·Granted Jan 6, 2009·6 cites·19 claims
- 0879US8629970B2Immersion lithographic apparatus with immersion fluid re-circulating systemSEWELL HARRY·Filed 2009·Granted Jan 14, 2014·5 cites·28 claims
- 0978US7751030B2Interferometric lithographic projection apparatusASML HOLDING NV·Filed 2006·Granted Jul 6, 2010·5 cites·25 claims
- 1077US7499146B2Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cuppingASML NETHERLANDS BV·Filed 2005·Granted Mar 3, 2009·4 cites·19 claims
- 1176US8817226B2Systems and methods for insitu lens cleaning using ozone in immersion lithographySEWELL HARRY·Filed 2008·Granted Aug 26, 2014·4 cites·7 claims
- 1273US7684014B2Lithographic apparatus and device manufacturing methodASML HOLDING B V·Filed 2006·Granted Mar 23, 2010·5 cites·20 claims
- 1371US9632425B2Lithographic apparatus, a dryer and a method of removing liquid from a surfaceLEENDERS MARTINUS HENDRIKUS ANTONIUS·Filed 2007·Granted Apr 25, 2017·2 cites·37 claims
- 1467US7112890B2Tunable alignment geometryASML HOLDING NV·Filed 2003·Granted Sep 26, 2006·10 cites·10 claims
- 1565US9330912B2Lithographic apparatus, fluid combining unit and device manufacturing methodMULKENS JOHANNES CATHARINUS HUBERTUS·Filed 2011·Granted May 3, 2016·1 cites·19 claims
- 1665US6967713B2Use of multiple reticles in lithographic printing toolsASML HOLDING NV·Filed 2004·Granted Nov 22, 2005·7 cites·12 claims
- 1764US7492442B2Adjustable resolution interferometric lithography systemASML HOLDING NV·Filed 2004·Granted Feb 17, 2009·6 cites·15 claims
- 1863US8045135B2Lithographic apparatus with a fluid combining unit and related device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Oct 25, 2011·1 cites·18 claims
- 1963US7995185B2Systems and methods for thermally-induced aberration correction in immersion lithographyASML HOLDING NV·Filed 2006·Granted Aug 9, 2011·1 cites·19 claims
- 2056US10908518B2Lithographic apparatus and methodASML HOLDING NV·Filed 2018·Granted Feb 2, 2021·0 cites·19 claims
- 2156US7838310B2Tunable alignment geometryASML HOLDING NV·Filed 2009·Granted Nov 23, 2010·0 cites·19 claims
- 2256US5966215ALine width insensitive wafer target detection in two directionsSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Oct 12, 1999·14 cites·12 claims
- 2352US8736807B2Systems and methods for thermally-induced aberration correction in immersion lithographySEWELL HARRY·Filed 2011·Granted May 27, 2014·0 cites·15 claims
- 2452US8451422B2Re-flow and buffer system for immersion lithographySEWELL HARRY·Filed 2009·Granted May 28, 2013·0 cites·29 claims
- 2551US7534637B2Tunable alignment geometryASML HOLDING NV·Filed 2006·Granted May 19, 2009·0 cites·16 claims
- 2650US2006232753A1Liquid immersion lithography system with tilted liquid flowASML HOLDING NV·Filed 2005·Application pending·0 cites
- 2748US2009190106A1Immersion lithography apparatusASML HOLDING NV·Filed 2009·Application pending·0 cites
- 2847US8203693B2Liquid immersion lithography system comprising a tilted showerhead relative to a substrateKHMELICHEK ALEKSANDR·Filed 2006·Granted Jun 19, 2012·0 cites·20 claims
- 2944US8654305B2Systems and methods for insitu lens cleaning in immersion lithographySEWELL HARRY·Filed 2007·Granted Feb 18, 2014·0 cites·15 claims
- 3039US5920396ALine width insensitive wafer target detectionSVG LITHOGRAPHY SYSTEMS INC·Filed 1996·Granted Jul 6, 1999·5 cites·17 claims
- 3138US2010214544A1Fluid handling device, an immersion lithographic apparatus and a device manufacturing methodASML HOLDING NV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →