Inventor · disambiguated record
Markus Franciscus Antonius Eurlings
Also filed as: EURLINGS MARKUS F · EURLINGS MARKUS F A · EURLINGS MARKUS FRANCISCUS A · EURLINGS MARKUS FRANCISCUS ANT
42 granted patents·2 pending applications·714 citations·filing 2000–2019
98Inventor score
Files withASML NETHERLANDS BV25ASML MASKTOOLS BV7ASML HOLDING NV3MULDER HEINE MELLE3DIERICHS MARCEL MATHIJS THEODORE MARIE2
Top patents by PatentIndex Score
44 records- 0197US6927004B2Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 9, 2005·100 cites·17 claims
- 0296US6737662B2Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program productASML NETHERLANDS BV·Filed 2002·Granted May 18, 2004·109 cites·23 claims
- 0395US6826451B2Lithography tool having a vacuum reticle library coupled to a vacuum chamberASML HOLDING NV·Filed 2002·Granted Nov 30, 2004·67 cites·48 claims
- 0494US7525642B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 28, 2009·32 cites·21 claims
- 0592US7015491B2Lithographic apparatus, device manufacturing method and device manufactured thereby, control systemASML NETHERLANDS BV·Filed 2003·Granted Mar 21, 2006·50 cites·22 claims
- 0690US7138212B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2003·Granted Nov 21, 2006·39 cites·21 claims
- 0789US7355681B2Optical proximity correction using chamfers and rounding at cornersASML MASKTOOLS BV·Filed 2005·Granted Apr 8, 2008·10 cites·16 claims
- 0889US6671035B2Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatusASML NETHERLANDS BV·Filed 2000·Granted Dec 30, 2003·39 cites·13 claims
- 0988US7666554B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2006·Granted Feb 23, 2010·11 cites·18 claims
- 1088US6583855B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Jun 24, 2003·41 cites·25 claims
- 1187US7349066B2Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influenceASML MASKTOOLS BV·Filed 2005·Granted Mar 25, 2008·9 cites·21 claims
- 1285US7030958B2Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 18, 2006·31 cites·47 claims
- 1383US7148952B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 12, 2006·24 cites·20 claims
- 1483US6741329B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2002·Granted May 25, 2004·30 cites·19 claims
- 1582US6875545B2Method of removing assist features utilized to improve process latitudeASML MASKTOOLS BV·Filed 2002·Granted Apr 5, 2005·27 cites·16 claims
- 1675US11150563B2Method of measuring a parameter of a patterning process, metrology apparatus, targetASML NETHERLANDS BV·Filed 2019·Granted Oct 19, 2021·1 cites·21 claims
- 1775US7026082B2Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Apr 11, 2006·17 cites·16 claims
- 1875US6710856B2Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 23, 2004·17 cites·26 claims
- 1974US9835950B2Radiation sourceASML NETHERLANDS BV·Filed 2014·Granted Dec 5, 2017·4 cites·24 claims
- 2073US7333178B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 19, 2008·3 cites·20 claims
- 2172US8937706B2Lithographic apparatus and methodMULDER HEINE MELLE·Filed 2007·Granted Jan 20, 2015·3 cites·24 claims
- 2270US7057711B2Lithography tool having a vacuum reticle library coupled to a vacuum chamberASML HOLDING NV·Filed 2004·Granted Jun 6, 2006·12 cites·13 claims
- 2369US8680493B2Radiation conduit for radiation sourceSCHEPERS MAIKEL ADRIANUS CORNELIS·Filed 2012·Granted Mar 25, 2014·3 cites·13 claims
- 2465US7316870B2Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer programASML NETHERLANDS BV·Filed 2004·Granted Jan 8, 2008·7 cites·17 claims
- 2565US7113261B2Radiation system, lithographic apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·8 cites·11 claims
- 2664US10222702B2Radiation sourceASML NETHERLANDS BV·Filed 2016·Granted Mar 5, 2019·1 cites·15 claims
- 2764US8587766B2Lithographic apparatus and device manufacturing methodMULDER HEINE MELLE·Filed 2009·Granted Nov 19, 2013·1 cites·21 claims
- 2862US8252487B2Device manufacturing method and mask for use thereinDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2003·Granted Aug 28, 2012·6 cites·14 claims
- 2961US10222703B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2017·Granted Mar 5, 2019·0 cites·20 claims
- 3061US6833907B2Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatusASML NETHERLANDS BV·Filed 2003·Granted Dec 21, 2004·8 cites·20 claims
- 3159US7985515B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2009·Granted Jul 26, 2011·0 cites·20 claims
- 3258US7856606B2Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systemsASML MASKTOOLS BV·Filed 2005·Granted Dec 21, 2010·1 cites·18 claims
- 3357US9778575B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Oct 3, 2017·0 cites·22 claims
- 3455US10495889B2Beam homogenizer, illumination system and metrology systemASML NETHERLANDS BV·Filed 2017·Granted Dec 3, 2019·0 cites·21 claims
- 3554US7177010B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Feb 13, 2007·3 cites·30 claims
- 3653US10289006B2Beam delivery for EUV lithographyASML NETHERLANDS BV·Filed 2013·Granted May 14, 2019·0 cites·19 claims
- 3753US9250536B2Lithographic apparatus and methodMULDER HEINE MELLE·Filed 2008·Granted Feb 2, 2016·0 cites·23 claims
- 3845US9645500B2Radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted May 9, 2017·0 cites·20 claims
- 3945US8830444B2Lithographic apparatus and methodVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2011·Granted Sep 9, 2014·0 cites·15 claims
- 4044US10754259B2Method and device for pupil illumination in overlay and critical dimension sensorsASML HOLDING NV·Filed 2017·Granted Aug 25, 2020·0 cites·24 claims
- 4141US7224440B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 29, 2007·0 cites·27 claims
- 4240US2007058151A1Optical element for use in lithography apparatus and method of conditioning radiation beamZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 4339US9188881B2Lithographic apparatus and method for reducing stray radiationDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2010·Granted Nov 17, 2015·0 cites·14 claims
- 4439US2013194562A1Lithographic Apparatus and Device Manufacturing MethodNEERHOF HENDRIK ANTONY JOHANNES·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →