Inventor · disambiguated record
Mark Ghinovker
Also filed as: GHINOVKER MARK
81 granted patents·7 pending applications·1,731 citations·filing 2001–2025
99Inventor score
Top patents by PatentIndex Score
88 records- 0198US11164307B1Misregistration metrology by using fringe Moiré and optical Moiré effectsKLA CORP·Filed 2020·Granted Nov 2, 2021·18 cites·35 claims
- 0298US10527951B2Compound imaging metrology targetsKLA TENCOR CORP·Filed 2016·Granted Jan 7, 2020·18 cites·21 claims
- 0397US11355375B2Device-like overlay metrology targets displaying Moiré effectsKLA CORP·Filed 2020·Granted Jun 7, 2022·6 cites·21 claims
- 0497US9347879B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR CORP·Filed 2015·Granted May 24, 2016·17 cites·21 claims
- 0597US8330281B2Overlay marks, methods of overlay mark design and methods of overlay measurementsGHINOVKER MARK·Filed 2007·Granted Dec 11, 2012·43 cites·9 claims
- 0697US8138498B2Apparatus and methods for determining overlay of structures having rotational or mirror symmetryGHINOVKER MARK·Filed 2009·Granted Mar 20, 2012·60 cites·11 claims
- 0797US7541201B2Apparatus and methods for determining overlay of structures having rotational or mirror symmetryKLA TENCOR TECH CORP·Filed 2005·Granted Jun 2, 2009·41 cites·22 claims
- 0897US7433040B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Oct 7, 2008·28 cites·18 claims
- 0997US7317824B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2006·Granted Jan 8, 2008·22 cites·60 claims
- 1097US7317531B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2003·Granted Jan 8, 2008·83 cites·30 claims
- 1197US7242477B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jul 10, 2007·124 cites·20 claims
- 1297US6985618B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2002·Granted Jan 10, 2006·98 cites·41 claims
- 1396US11073768B2Metrology target for scanning metrologyKLA CORP·Filed 2019·Granted Jul 27, 2021·19 cites·21 claims
- 1496US8345243B2Overlay metrology targetKLA TENCOR CORP·Filed 2010·Granted Jan 1, 2013·15 cites·2 claims
- 1596US7557921B1Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic toolsKLA TENCOR TECH CORP·Filed 2005·Granted Jul 7, 2009·55 cites·14 claims
- 1696US7298481B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 20, 2007·46 cites·11 claims
- 1796US7280212B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Oct 9, 2007·45 cites·12 claims
- 1896US6928628B2Use of overlay diagnostics for enhanced automatic process controlKLA TENCOR TECH CORP·Filed 2003·Granted Aug 9, 2005·141 cites·21 claims
- 1996US6921916B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENOCOR TECHNOLOGIES CORP·Filed 2002·Granted Jul 26, 2005·122 cites·27 claims
- 2095US12105433B2Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2022·Granted Oct 1, 2024·2 cites·6 claims
- 2195US7933016B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Apr 26, 2011·15 cites·20 claims
- 2295US7663753B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Feb 16, 2010·19 cites·45 claims
- 2395US7608468B1Apparatus and methods for determining overlay and uses of sameKLA TENCOR TECH CORP·Filed 2004·Granted Oct 27, 2009·75 cites·23 claims
- 2494US8513822B1Thin overlay mark for imaging based metrologyGHINOVKER MARK·Filed 2010·Granted Aug 20, 2013·10 cites·25 claims
- 2594US7385699B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Jun 10, 2008·34 cites·33 claims
- 2694US7310789B2Use of overlay diagnostics for enhanced automatic process controlKLA TENCOR TECH CORP·Filed 2006·Granted Dec 18, 2007·20 cites·33 claims
- 2794US7301634B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted Nov 27, 2007·35 cites·33 claims
- 2894US7177457B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2002·Granted Feb 13, 2007·33 cites·36 claims
- 2994US7068833B1Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2001·Granted Jun 27, 2006·81 cites·38 claims
- 3093US9702693B2Apparatus for measuring overlay errorsKLA TENCOR CORP·Filed 2016·Granted Jul 11, 2017·6 cites·64 claims
- 3193US7879627B2Overlay marks and methods of manufacturing such marksKLA TENCOR TECH CORP·Filed 2009·Granted Feb 1, 2011·25 cites·12 claims
- 3292US11862524B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jan 2, 2024·2 cites·20 claims
- 3392US7876438B2Apparatus and methods for determining overlay and uses of sameKLA TENCOR TECH CORP·Filed 2009·Granted Jan 25, 2011·31 cites·20 claims
- 3492US7804994B2Overlay metrology and control methodKLA TENCOR TECH CORP·Filed 2003·Granted Sep 28, 2010·54 cites·16 claims
- 3591US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 3691US7368208B1Measuring phase errors on phase shift masksKLA TENCOR TECH CORP·Filed 2006·Granted May 6, 2008·12 cites·12 claims
- 3790US7355291B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2005·Granted Apr 8, 2008·13 cites·17 claims
- 3890US7346878B1Apparatus and methods for providing in-chip microtargets for metrology or inspectionKLA TENCOR TECH CORP·Filed 2004·Granted Mar 18, 2008·65 cites·53 claims
- 3989US9784987B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·5 cites·26 claims
- 4089US7684038B1Overlay metrology targetKLA TENCOR CORP·Filed 2008·Granted Mar 23, 2010·9 cites·2 claims
- 4189US7274814B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR CORP·Filed 2006·Granted Sep 25, 2007·18 cites·27 claims
- 4288US11874605B2Verification metrology targets and their designKLA CORP·Filed 2020·Granted Jan 16, 2024·2 cites·19 claims
- 4388US11532566B2Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devicesKLA CORP·Filed 2020·Granted Dec 20, 2022·2 cites·19 claims
- 4488US10203200B2Analyzing root causes of process variation in scatterometry metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·7 cites·23 claims
- 4588US7379183B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2004·Granted May 27, 2008·18 cites·44 claims
- 4687US11809090B2Composite overlay metrology targetKLA CORP·Filed 2020·Granted Nov 7, 2023·2 cites·49 claims
- 4787US11137692B2Metrology targets and methods with oblique periodic structuresKLA TENCOR CORP·Filed 2018·Granted Oct 5, 2021·3 cites·22 claims
- 4887US8243273B2Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methodsLEVINSKI VLADIMIR·Filed 2009·Granted Aug 14, 2012·11 cites·21 claims
- 4987US7181057B2Overlay marks, methods of overlay mark design and methods of overlay measurementsKLA TENCOR TECH CORP·Filed 2002·Granted Feb 20, 2007·40 cites·25 claims
- 5086US9091650B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2013·Granted Jul 28, 2015·5 cites·30 claims
Showing the top 50 of 88 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →