Inventor · disambiguated record
Maolin Long
Also filed as: LONG MAOLIN
69 granted patents·26 pending applications·552 citations·filing 2001–2025
98Inventor score
Files withLAM RES CORP50BEIJING E TOWN SEMICONDUCTOR TECH CO LTD16MATTSON TECH INC9TOKYO ELECTRON LTD9LONG MAOLIN6
Top patents by PatentIndex Score
95 records- 0198US10264663B1Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2017·Granted Apr 16, 2019·29 cites·46 claims
- 0298US9761459B2Systems and methods for reverse pulsingLAM RES CORP·Filed 2015·Granted Sep 12, 2017·93 cites·17 claims
- 0398US9583357B1Systems and methods for reverse pulsingLAM RES CORP·Filed 2016·Granted Feb 28, 2017·98 cites·18 claims
- 0498US9515633B1Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambersLAM RES CORP·Filed 2016·Granted Dec 6, 2016·60 cites·13 claims
- 0597US11716805B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2021·Granted Aug 1, 2023·4 cites·20 claims
- 0697US9059678B2TCCT match circuit for plasma etch chambersLAM RES CORP·Filed 2013·Granted Jun 16, 2015·29 cites·12 claims
- 0796US12040159B2Dual frequency matching circuit for inductively coupled plasma (ICP) loadsMATTSON TECH INC·Filed 2022·Granted Jul 16, 2024·2 cites·19 claims
- 0896US11224116B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2020·Granted Jan 11, 2022·4 cites·19 claims
- 0996US10784083B2RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate supportLAM RES CORP·Filed 2018·Granted Sep 22, 2020·8 cites·20 claims
- 1096US10638593B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2019·Granted Apr 28, 2020·10 cites·20 claims
- 1195US12159770B2Cooled shield for ICP sourceMATTSON TECH INC·Filed 2021·Granted Dec 3, 2024·2 cites·16 claims
- 1295US10515781B1Direct drive RF circuit for substrate processing systemsLAM RES CORP·Filed 2018·Granted Dec 24, 2019·13 cites·19 claims
- 1395US10121641B2Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systemsLAM RES CORP·Filed 2015·Granted Nov 6, 2018·8 cites·20 claims
- 1494US6811651B2Gas temperature control for a plasma processTOKYO ELECTRON LTD·Filed 2002·Granted Nov 2, 2004·49 cites·13 claims
- 1593US12106947B2RF reference measuring circuit for a direct drive system supplying power to generate plasma in a substrate processing systemLAM RES CORP·Filed 2021·Granted Oct 1, 2024·2 cites·23 claims
- 1693US11728136B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2022·Granted Aug 15, 2023·2 cites·20 claims
- 1793US10847345B2Direct drive RF circuit for substrate processing systemsLAM RES CORP·Filed 2019·Granted Nov 24, 2020·7 cites·8 claims
- 1892US2025391638A1Rf pulsing within pulsing for semiconductor rf plasma processingLAM RES CORP·Filed 2025·Application pending·0 cites
- 1991US9966236B2Powered grid for plasma chamberLONG MAOLIN·Filed 2011·Granted May 8, 2018·13 cites·20 claims
- 2090US6916401B2Adjustable segmented electrode apparatus and methodTOKYO ELECTRON LTD·Filed 2003·Granted Jul 12, 2005·35 cites·30 claims
- 2189US2025364218A1Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP) LoadsBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2025·Application pending·0 cites
- 2289US2025106976A1Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2024·Application pending·0 cites
- 2388US10332725B2Systems and methods for reversing RF current polarity at one output of a multiple output RF matching networkLAM RES CORP·Filed 2015·Granted Jun 25, 2019·5 cites·18 claims
- 2487US12400831B2Dual frequency matching circuit for inductively coupled plasma (ICP) loadsMATTSON TECH INC·Filed 2024·Granted Aug 26, 2025·0 cites·17 claims
- 2587US9293353B2Faraday shield having plasma density decoupling structure between TCP coil zonesLONG MAOLIN·Filed 2012·Granted Mar 22, 2016·8 cites·10 claims
- 2686US10672590B2Frequency tuning for a matchless plasma sourceLAM RES CORP·Filed 2018·Granted Jun 2, 2020·3 cites·15 claims
- 2786US2025372353A1Plasma Processing ApparatusBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2025·Application pending·0 cites
- 2885US12437966B2Systems and methods for reverse pulsingLAM RES CORP·Filed 2023·Granted Oct 7, 2025·0 cites·7 claims
- 2985US12261073B2Electrostatic chuck assembly for plasma processing apparatusBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2024·Granted Mar 25, 2025·0 cites·20 claims
- 3085US9384948B2Hammerhead TCP coil support for high RF power conductor etch systemsLAM RES CORP·Filed 2013·Granted Jul 5, 2016·6 cites·20 claims
- 3185US7776156B2Side RF coil and side heater for plasma processing apparatusAPPLIED MATERIALS INC·Filed 2005·Granted Aug 17, 2010·13 cites·27 claims
- 3284US12193138B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2023·Granted Jan 7, 2025·0 cites·14 claims
- 3383US12507338B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Dec 23, 2025·0 cites·30 claims
- 3482US12490370B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Dec 2, 2025·0 cites·30 claims
- 3582US12484139B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Nov 25, 2025·0 cites·30 claims
- 3682US12471202B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2025·Granted Nov 11, 2025·0 cites·13 claims
- 3782US2025062103A1Cooled Shield for ICP SourceMATTSON TECH INC·Filed 2024·Application pending·0 cites
- 3881US2025232957A1Systems and methods for multi-level pulsing in rf plasma toolsLAM RES CORP·Filed 2025·Application pending·0 cites
- 3981US2025293007A1Configurable Faraday ShieldBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2025·Application pending·0 cites
- 4081US2025079121A1Dual-frequency, direct-drive inductively coupled plasma sourceLAM RES CORP·Filed 2024·Application pending·0 cites
- 4180US11342159B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2018·Granted May 24, 2022·2 cites·33 claims
- 4280US2025226182A1Systems and methods for multi-level pulsing in rf plasma toolsLAM RES CORP·Filed 2025·Application pending·0 cites
- 4379US9490106B2Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coilDREWERY JOHN·Filed 2011·Granted Nov 8, 2016·5 cites·9 claims
- 4479US7531061B2Gas temperature control for a plasma processTOKYO ELECTRON LTD·Filed 2004·Granted May 12, 2009·12 cites·6 claims
- 4578US12424410B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2023·Granted Sep 23, 2025·0 cites·20 claims
- 4678US8736175B2Current control in plasma processing systemsLONG MAOLIN·Filed 2010·Granted May 27, 2014·4 cites·21 claims
- 4777US12119254B2Electrostatic chuck assembly for plasma processing apparatusBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2023·Granted Oct 15, 2024·0 cites·20 claims
- 4877US2025273447A1Protection system for switches in direct drive circuits of substrate processing systemsLAM RES CORP·Filed 2025·Application pending·0 cites
- 4976US12266503B2Hybrid plasma source arrayBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2022·Granted Apr 1, 2025·0 cites·21 claims
- 5076US12002701B2Electrostatic chuck assembly for plasma processing apparatusMATTSON TECH INC·Filed 2021·Granted Jun 4, 2024·0 cites·20 claims
Showing the top 50 of 95 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Maolin Long files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →