Inventor · disambiguated record
Masahisa Ueda
Also filed as: UEDA MASAHISA
6 granted patents·7 pending applications·51 citations·filing 2001–2018
74Inventor score
Top patents by PatentIndex Score
13 records- 0187US6495413B2Structure for masking integrated capacitors of particular utility for ferroelectric memory integrated circuitsRAMTRON INT CORP·Filed 2001·Granted Dec 17, 2002·49 cites·11 claims
- 0259US9059105B2Ashing apparatusUEDA MASAHISA·Filed 2007·Granted Jun 16, 2015·2 cites·13 claims
- 0353US10619261B2Manufacturing method for electronic componentULVAC INC·Filed 2018·Granted Apr 14, 2020·0 cites·4 claims
- 0448US9466475B2Ashing deviceULVAC INC·Filed 2014·Granted Oct 11, 2016·0 cites·8 claims
- 0547US2010193131A1Ashing deviceULVAC INC·Filed 2008·Application pending·0 cites
- 0643US2010213170A1Etching method and etching apparatusULVAC INC·Filed 2008·Application pending·0 cites
- 0742US2009275146A1Method and apparatus for manufacturing deviceULVAC INC·Filed 2009·Application pending·0 cites
- 0841US2010151150A1Plasma processing apparatus and manufacturing method of deposition-inhibitory memberULVAC INC·Filed 2008·Application pending·0 cites
- 0939US2008026539A1Capacitance element manufacturing method and etching methodULVAC INC·Filed 2007·Application pending·0 cites
- 1037US8133325B2Dry cleaning method for plasma processing apparatusUEDA MASAHISA·Filed 2008·Granted Mar 13, 2012·0 cites·7 claims
- 1136US2003071294A1Process and structure for masking integrated capacitors of particular utility for ferroelectric memory integrated circuitsFiled 2002·Application pending·0 cites
- 1230US2012152889A1Method for manufacturing piezoelectric elementUEDA MASAHISA·Filed 2012·Application pending·0 cites
- 1326US9305752B2Method for operating substrate processing apparatusKOKAZE YUTAKA·Filed 2012·Granted Apr 5, 2016·0 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Masahisa Ueda files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →