Inventor · disambiguated record
Moshe E. Preil
Also filed as: PREIL MOSHE · PREIL MOSHE E
28 granted patents·3 pending applications·754 citations·filing 2003–2020
97Inventor score
Files withGLOBALFOUNDRIES INC7PREIL MOSHE E7KLA TENCOR TECH CORP5KLA TENCOR CORP4ASML NETHERLANDS BV2
Top patents by PatentIndex Score
31 records- 0198US8057967B2Process window signature patterns for lithography process controlYE JUN·Filed 2010·Granted Nov 15, 2011·39 cites·11 claims
- 0298US7646906B2Computer-implemented methods for detecting defects in reticle design dataKLA TENCOR TECH CORP·Filed 2005·Granted Jan 12, 2010·85 cites·22 claims
- 0397US7853920B2Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturingASML NETHERLANDS BV·Filed 2006·Granted Dec 14, 2010·67 cites·28 claims
- 0497US7769225B2Methods and systems for detecting defects in a reticle design patternKLA TENCOR TECH CORP·Filed 2005·Granted Aug 3, 2010·80 cites·19 claims
- 0597US7695876B2Method for identifying and using process window signature patterns for lithography process controlBRION TECH INC·Filed 2006·Granted Apr 13, 2010·61 cites·26 claims
- 0696US8318391B2Process window signature patterns for lithography process controlYE JUN·Filed 2011·Granted Nov 27, 2012·12 cites·21 claims
- 0796US8208712B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2009·Granted Jun 26, 2012·24 cites·20 claims
- 0896US8200002B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2009·Granted Jun 12, 2012·22 cites·20 claims
- 0996US7749666B2System and method for measuring and analyzing lithographic parameters and determining optimal process correctionsASML NETHERLANDS BV·Filed 2006·Granted Jul 6, 2010·44 cites·13 claims
- 1096US7689966B2Methods, systems, and carrier media for evaluating reticle layout dataKLA TENCOR TECH CORP·Filed 2005·Granted Mar 30, 2010·57 cites·31 claims
- 1196US7557921B1Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic toolsKLA TENCOR TECH CORP·Filed 2005·Granted Jul 7, 2009·55 cites·14 claims
- 1293US10990019B2Stochastic reticle defect dispositioningKLA CORP·Filed 2020·Granted Apr 27, 2021·4 cites·28 claims
- 1393US8204295B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2009·Granted Jun 19, 2012·21 cites·19 claims
- 1492US8956808B2Asymmetric templates for forming non-periodic patterns using directed self-assembly materialsGLOBALFOUNDRIES INC·Filed 2012·Granted Feb 17, 2015·11 cites·18 claims
- 1592US8790522B1Chemical and physical templates for forming patterns using directed self-assembly materialsGLOBALFOUNDRIES INC·Filed 2013·Granted Jul 29, 2014·20 cites·18 claims
- 1692US8331645B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2009·Granted Dec 11, 2012·15 cites·19 claims
- 1792US7804994B2Overlay metrology and control methodKLA TENCOR TECH CORP·Filed 2003·Granted Sep 28, 2010·54 cites·16 claims
- 1890US10474042B2Stochastically-aware metrology and fabricationKLA TENCOR CORP·Filed 2017·Granted Nov 12, 2019·7 cites·36 claims
- 1990US8260032B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2009·Granted Sep 4, 2012·14 cites·19 claims
- 2089US9188974B1Methods for improved monitor and control of lithography processesMACK CHRIS·Filed 2011·Granted Nov 17, 2015·16 cites·27 claims
- 2189US8889343B2Optimizing lithographic processes using laser annealing techniquesGLOBALFOUNDRIES INC·Filed 2012·Granted Nov 18, 2014·6 cites·22 claims
- 2289US8280146B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2009·Granted Oct 2, 2012·13 cites·23 claims
- 2386US8644588B2Photo-mask and wafer image reconstructionPREIL MOSHE E·Filed 2007·Granted Feb 4, 2014·5 cites·29 claims
- 2483US10262408B2System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor waferKLA TENCOR CORP·Filed 2017·Granted Apr 16, 2019·4 cites·19 claims
- 2578US6868301B1Method and application of metrology and process diagnostic information for improved overlay controlKLA TENCOR CORP·Filed 2003·Granted Mar 15, 2005·16 cites·31 claims
- 2671US9508562B2Sidewall image templates for directed self-assembly materialsGLOBALFOUNDRIES INC·Filed 2014·Granted Nov 29, 2016·2 cites·20 claims
- 2746US2016033879A1Methods and controllers for controlling focus of ultraviolet light from a lithographic imaging system, and apparatuses for forming an integrated circuit employing the sameGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 2844US10777377B2Multi-column spacing for photomask and reticle inspection and wafer print check verificationKLA TENCOR CORP·Filed 2018·Granted Sep 15, 2020·0 cites·21 claims
- 2940US2020018709A1Wafer distortion measurement and overlay correctionGLOBALFOUNDRIES INC·Filed 2018·Application pending·0 cites
- 3038US9530662B2Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability controlGLOBALFOUNDRIES INC·Filed 2015·Granted Dec 27, 2016·0 cites·20 claims
- 3133US2013325395A1Co-optimization of scatterometry mark design and process monitor mark designZHOU WENZHAN·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →