Inventor · disambiguated record
Nobuyuki Nagayama
Also filed as: MITSUHASHI KOUJI · NAGAYAMA NOBUYUKI
36 granted patents·22 pending applications·775 citations·filing 1999–2023
97Inventor score
Top patents by PatentIndex Score
58 records- 0198US10622196B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 14, 2020·341 cites·13 claims
- 0298US6783863B2Plasma processing container internal member and production method thereofTOCALO CO LTD·Filed 2000·Granted Aug 31, 2004·88 cites·39 claims
- 0397US7364798B2Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2005·Granted Apr 29, 2008·34 cites·30 claims
- 0495US9117635B2Electrode plate for plasma etching and plasma etching apparatusSATOH NAOYUKI·Filed 2011·Granted Aug 25, 2015·11 cites·5 claims
- 0595US6884516B2Internal member for plasma-treating vessel and method of producing the sameTOKYO ELECTRON CO LTD·Filed 2004·Granted Apr 26, 2005·84 cites·30 claims
- 0694US8877002B2Internal member of a plasma processing vesselTOKYO ELECTRON LTD·Filed 2013·Granted Nov 4, 2014·7 cites·13 claims
- 0794US7780786B2Internal member of a plasma processing vesselTOKYO ELECTRON LTD·Filed 2003·Granted Aug 24, 2010·51 cites·9 claims
- 0891US10566175B2Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 18, 2020·2 cites·1 claims
- 0991US8449715B2Internal member of a plasma processing vesselMITSUHASHI KOUJI·Filed 2010·Granted May 28, 2013·9 cites·5 claims
- 1091US6899786B2Processing device and method of maintaining the device, mechanism and method for assembling processing device part, and lock mechanism and method for locking the lock mechanismTOKYO ELECTRON LTD·Filed 2001·Granted May 31, 2005·52 cites·4 claims
- 1190US7646581B2Electrostatic chuckSUMITOMO OSAKA CEMENT CO LTD·Filed 2007·Granted Jan 12, 2010·16 cites·11 claims
- 1288US10138167B2Thermal spray material, thermal spray coating and thermal spray coated articleTOKYO ELECTRON LTD·Filed 2016·Granted Nov 27, 2018·3 cites·6 claims
- 1388US10106466B2Thermal spray material, thermal spray coating and thermal spray coated articleTOKYO ELECTRON LTD·Filed 2016·Granted Oct 23, 2018·3 cites·8 claims
- 1488US9818583B2Electrode plate for plasma etching and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Nov 14, 2017·2 cites·15 claims
- 1588US6790289B2Method of cleaning a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Sep 14, 2004·22 cites·14 claims
- 1686US10227263B2Thermal spray material and thermal spray coated articleTOKYO ELECTRON LTD·Filed 2017·Granted Mar 12, 2019·1 cites·8 claims
- 1786US7481903B2Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanismTOKYO ELECTRON LTD·Filed 2005·Granted Jan 27, 2009·11 cites·3 claims
- 1884US8896210B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2012·Granted Nov 25, 2014·10 cites·21 claims
- 1981US11434174B2Member for plasma processing apparatus, plasma processing apparatus with the same and method for using sintered bodyNIPPON TUNGSTEN·Filed 2020·Granted Sep 6, 2022·1 cites·14 claims
- 2077US10766822B2Thermal spray material and thermal spray coated articleTOKYO ELECTRON LTD·Filed 2019·Granted Sep 8, 2020·0 cites·7 claims
- 2177US8950469B2Temperature control system and temperature control method for substrate mounting tableSASAKI YASUHARU·Filed 2010·Granted Feb 10, 2015·4 cites·6 claims
- 2277US8221579B2Method of reusing a consumable part for use in a plasma processing apparatusNAGAYAMA NOBUYUKI·Filed 2010·Granted Jul 17, 2012·3 cites·8 claims
- 2373US8475622B2Method of reusing a consumable part for use in a plasma processing apparatusNAGAYAMA NOBUYUKI·Filed 2012·Granted Jul 2, 2013·2 cites·6 claims
- 2473US8349450B2Thermal spray powder, method for forming thermal spray coating, and plasma resistant memberFUJIMI INC·Filed 2007·Granted Jan 8, 2013·1 cites·30 claims
- 2572US8945313B2Vacuum exhaust method and a substrate processing apparatus thereforTOKYO ELECTRON LTD·Filed 2012·Granted Feb 3, 2015·2 cites·18 claims
- 2667US8715782B2Surface processing methodTOKYO ELECTRON LTD·Filed 2012·Granted May 6, 2014·0 cites·4 claims
- 2763US2015114567A1Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2862US2008070051A1Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2007·Application pending·0 cites
- 2960US2008066647A1Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2007·Application pending·0 cites
- 3060US2008070028A1Internal member for plasma-treating vessel and method of producing the sameTOCALO CO LTD·Filed 2007·Application pending·0 cites
- 3158US2017233860A1Manufacturing method for component in plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 3257US10106879B2Thermal spray material, thermal spray coating and thermal spray coated articleTOKYO ELECTRON LTD·Filed 2016·Granted Oct 23, 2018·0 cites·8 claims
- 3357US2024128057A1Consumable member, plasma processing apparatus, and method of manufacturing consumable memberTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3456US11548827B2Member for plasma processing apparatus and plasma processing apparatus with the sameNIPPON TUNGSTEN·Filed 2020·Granted Jan 10, 2023·0 cites·8 claims
- 3556US7892361B2In-chamber member, a cleaning method therefor and a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Feb 22, 2011·0 cites·10 claims
- 3656US2023260757A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3756US2008145556A1Method for manufacturing substrate mounting tableTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3855US2010104760A1Vacuum exhaust method and a substrate processing apparatus thereforTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3955US2022319800A1Plasma processing system, transfer arm, and method of transferring annular memberTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4054US2009294064A1Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 4154US2013284375A1Consumable part for use in a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4253US2016076129A1Component for plasma processing apparatus, and manufacturing method thereforTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4353US2018301313A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 4452US10056223B2Plasma processing apparatus and temperature control methodTOKYO ELECTRON LIMTED·Filed 2013·Granted Aug 21, 2018·0 cites·6 claims
- 4550US2004216769A1Method of cleaning a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 4649US8318034B2Surface processing methodSATOH NAOYUKI·Filed 2010·Granted Nov 27, 2012·0 cites·4 claims
- 4749US2022020596A1Etching processing apparatus, quartz member and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4848US2009080136A1Electrostatic chuck memberTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 4946US2008087382A1Substrate stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 5045US8739732B2Plasma treatment container internal member, and plasma treatment apparatus having the plasma treatment container internal memberNAGAYAMA NOBUYUKI·Filed 2002·Granted Jun 3, 2014·1 cites·26 claims
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →