Inventor · disambiguated record
Ratsamee Limdulpaiboon
Also filed as: LIMDULPAIBOON RATSAMEE
13 granted patents·5 pending applications·133 citations·filing 2004–2023
90Inventor score
Top patents by PatentIndex Score
18 records- 0193US7435684B1Resolving of fluorine loading effect in the vacuum chamberNOVELLUS SYSTEMS INC·Filed 2006·Granted Oct 14, 2008·67 cites·13 claims
- 0292US11694902B2Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layersAPPLIED MATERIALS INC·Filed 2021·Granted Jul 4, 2023·2 cites·18 claims
- 0392US7344996B1Helium-based etch process in deposition-etch-deposition gap fillNOVELLUS SYSTEMS INC·Filed 2005·Granted Mar 18, 2008·22 cites·10 claims
- 0491US11674222B2Method of in situ ceramic coating depositionAPPLIED MATERIALS INC·Filed 2020·Granted Jun 13, 2023·2 cites·19 claims
- 0580US9245793B2Plasma treatment of low-K surface to improve barrier depositionINTERMOLECULAR INC·Filed 2013·Granted Jan 26, 2016·5 cites·14 claims
- 0679US9196475B2Methods for fabricating integrated circuits including fluorine incorporationGLOBALFOUNDRIES INC·Filed 2014·Granted Nov 24, 2015·4 cites·18 claims
- 0779US7381451B1Strain engineering—HDP thin film with tensile stress for FEOL and other applicationsNOVELLUS SYSTEMS INC·Filed 2004·Granted Jun 3, 2008·28 cites·35 claims
- 0877US12234549B2Method of in situ ceramic coating depositionAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 0977US12131913B2Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layersAPPLIED MATERIALS INC·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 1075US2023151487A1Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1170US8987143B2Hydrogen plasma cleaning of germanium oxide surfacesINTERMOLECULAR INC·Filed 2013·Granted Mar 24, 2015·1 cites·20 claims
- 1269US8901677B2Nucleation interface for high-k layer on germaniumINTERMOLECULAR INC·Filed 2014·Granted Dec 2, 2014·2 cites·20 claims
- 1368US11560623B2Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·16 claims
- 1464US11699577B2Treatment for high-temperature cleansAPPLIED MATERIALS INC·Filed 2021·Granted Jul 11, 2023·0 cites·20 claims
- 1557US2014264281A1Channel-Last Methods for Making FETSINTERMOLECULAR INC·Filed 2013·Application pending·0 cites
- 1655US2014273309A1Controlling Radical Lifetimes in a Remote Plasma ChamberINTERMOLECULAR INC·Filed 2013·Application pending·0 cites
- 1746US2020328066A1Plasma densification within a processing chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1846US2022020589A1Dielectric coating for deposition chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →