Inventor · disambiguated record
Rongjun Wang
Also filed as: WANG RONGJUN
86 granted patents·45 pending applications·521 citations·filing 2004–2024
99Inventor score
Files withAPPLIED MATERIALS INC101UNIV TAIYUAN SCIENCE & TECH7HAWRYLCHAK LARA3RASHEED MUHAMMAD3WANG RONGJUN3
Top patents by PatentIndex Score
131 records- 0198US7241686B2Atomic layer deposition of tantalum-containing materials using the tantalum precursor TAIMATAAPPLIED MATERIALS INC·Filed 2005·Granted Jul 10, 2007·89 cites·31 claims
- 0297US7595263B2Atomic layer deposition of barrier materialsAPPLIED MATERIALS INC·Filed 2007·Granted Sep 29, 2009·68 cites·42 claims
- 0397US7524762B2Atomic layer deposition of tantalum-containing materials using the tantalum precursor TAIMATAAPPLIED MATERIALS INC·Filed 2007·Granted Apr 28, 2009·61 cites·26 claims
- 0496US10468592B1Magnetic tunnel junctions and methods of fabrication thereofAPPLIED MATERIALS INC·Filed 2018·Granted Nov 5, 2019·7 cites·24 claims
- 0596US7211508B2Atomic layer deposition of tantalum based barrier materialsAPPLIED MATERIALS INC·Filed 2004·Granted May 1, 2007·139 cites·25 claims
- 0695US11810770B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·2 cites·20 claims
- 0793US11081623B2Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2019·Granted Aug 3, 2021·2 cites·8 claims
- 0893US9689070B2Deposition ring and electrostatic chuck for physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2016·Granted Jun 27, 2017·6 cites·13 claims
- 0993US8968537B2PVD sputtering target with a protected backing plateRASHEED MUHAMMAD M·Filed 2011·Granted Mar 3, 2015·8 cites·20 claims
- 1091US7737028B2Selective ruthenium deposition on copper materialsAPPLIED MATERIALS INC·Filed 2008·Granted Jun 15, 2010·21 cites·21 claims
- 1190US10236412B2Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2018·Granted Mar 19, 2019·3 cites·11 claims
- 1290US8911601B2Deposition ring and electrostatic chuck for physical vapor deposition chamberRASHEED MUHAMMAD·Filed 2011·Granted Dec 16, 2014·8 cites·10 claims
- 1390US8133368B2Encapsulated sputtering targetHAWRYLCHAK LARA·Filed 2008·Granted Mar 13, 2012·14 cites·24 claims
- 1489US11898236B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·1 cites·17 claims
- 1589US10255935B2Magnetic tunnel junctions suitable for high temperature thermal processingAPPLIED MATERIALS INC·Filed 2018·Granted Apr 9, 2019·7 cites·20 claims
- 1688US11251364B2Magnetic tunnel junctions suitable for high temperature thermal processingAPPLIED MATERIALS INC·Filed 2020·Granted Feb 15, 2022·2 cites·17 claims
- 1787US11037768B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2017·Granted Jun 15, 2021·4 cites·8 claims
- 1887US8435392B2Encapsulated sputtering targetHAWRYLCHAK LARA·Filed 2012·Granted May 7, 2013·4 cites·20 claims
- 1986US11891261B2Device and method for detecting flatness of sheet materialUNIV TAIYUAN SCIENCE & TECH·Filed 2020·Granted Feb 6, 2024·2 cites·11 claims
- 2086US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 2186US10636964B2Magnetic tunnel junctions with tunable high perpendicular magnetic anisotropyAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·5 cites·20 claims
- 2285US8920611B2Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuningFORSTER JOHN C·Filed 2008·Granted Dec 30, 2014·10 cites·15 claims
- 2384US9396933B2PVD buffer layers for LED fabricationZHU MINGWEI·Filed 2013·Granted Jul 19, 2016·6 cites·7 claims
- 2483US10546973B2Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2019·Granted Jan 28, 2020·1 cites·14 claims
- 2582US12094699B2Methods and apparatus for controlling ion fraction in physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2023·Granted Sep 17, 2024·0 cites·20 claims
- 2682US9087679B2Uniformity tuning capable ESC grounding kit for RF PVD chamberRASHEED MUHAMMAD M·Filed 2012·Granted Jul 21, 2015·5 cites·20 claims
- 2779US12408557B2Methods for forming structures with desired crystallinity for MRAM applicationsAPPLIED MATERIALS INC·Filed 2021·Granted Sep 2, 2025·0 cites·20 claims
- 2879US10622011B2Magnetic tunnel junctions suitable for high temperature thermal processingAPPLIED MATERIALS INC·Filed 2019·Granted Apr 14, 2020·3 cites·20 claims
- 2978US11575071B2Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2021·Granted Feb 7, 2023·0 cites·15 claims
- 3078US10096725B2Method for graded anti-reflective coatings by physical vapor depositionAPPLIED MATERIALS INC·Filed 2014·Granted Oct 9, 2018·1 cites·14 claims
- 3178US9834840B2Process kit shield for improved particle reductionRASHEED MUHAMMAD·Filed 2011·Granted Dec 5, 2017·1 cites·12 claims
- 3278US2022310363A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 3376US9633839B2Methods for depositing dielectric films via physical vapor deposition processesAPPLIED MATERIALS INC·Filed 2015·Granted Apr 25, 2017·2 cites·19 claims
- 3476US8129280B2Substrate device having a tuned work function and methods of forming thereofWANG RONGJUN·Filed 2009·Granted Mar 6, 2012·7 cites·17 claims
- 3575US12473643B2Low resistivity gapfill for logic devicesAPPLIED MATERIALS INC·Filed 2024·Granted Nov 18, 2025·0 cites·20 claims
- 3675US10744558B2Magnesium alloy cast-rolling unitUNIV TAIYUAN SCIENCE & TECH·Filed 2019·Granted Aug 18, 2020·0 cites·5 claims
- 3775US10109481B2Aluminum-nitride buffer and active layers by physical vapor depositionAPPLIED MATERIALS INC·Filed 2013·Granted Oct 23, 2018·3 cites·16 claims
- 3874US11626410B2Silicon-containing layer for bit line resistance reductionAPPLIED MATERIALS INC·Filed 2022·Granted Apr 11, 2023·0 cites·16 claims
- 3974US9017533B2Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuningFORSTER JOHN C·Filed 2008·Granted Apr 28, 2015·3 cites·20 claims
- 4074US7659204B2Oxidized barrier layerAPPLIED MATERIALS INC·Filed 2007·Granted Feb 9, 2010·4 cites·11 claims
- 4174US2022310364A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4273US11075276B2Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 27, 2021·1 cites·16 claims
- 4372US11011357B2Methods and apparatus for multi-cathode substrate processingAPPLIED MATERIALS INC·Filed 2018·Granted May 18, 2021·1 cites·20 claims
- 4471US12402535B2Magnetic tunnel junctions with tunable high perpendicular magnetic anisotropyAPPLIED MATERIALS INC·Filed 2021·Granted Aug 26, 2025·0 cites·20 claims
- 4571US11133460B2Methods for forming structures with desired crystallinity for MRAM applicationsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 28, 2021·2 cites·20 claims
- 4671US9929310B2Oxygen controlled PVD aluminum nitride buffer for gallium nitride-based optoelectronic and electronic devicesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 27, 2018·1 cites·20 claims
- 4771US7691742B2Atomic layer deposition of tantalum-containing materials using the tantalum precursor TAIMATAAPPLIED MATERIALS INC·Filed 2009·Granted Apr 6, 2010·2 cites·20 claims
- 4870US11637107B2Silicon-containing layer for bit line resistance reductionAPPLIED MATERIALS INC·Filed 2021·Granted Apr 25, 2023·0 cites·12 claims
- 4970US10449602B2Magnesium alloy cast-rolling unitUNIV TAIYUAN SCIENCE & TECH·Filed 2018·Granted Oct 22, 2019·0 cites·5 claims
- 5070US8119525B2Process for selective growth of films during ECP platingYU JICK M·Filed 2008·Granted Feb 21, 2012·5 cites·20 claims
Showing the top 50 of 131 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →