Inventor · disambiguated record
Satoshi Taga
Also filed as: TAGA SATOSHI
15 granted patents·8 pending applications·20 citations·filing 2008–2024
88Inventor score
Top patents by PatentIndex Score
23 records- 0184US10557190B2Substrate processing apparatus and susceptorTOKYO ELECTRON LTD·Filed 2014·Granted Feb 11, 2020·5 cites·19 claims
- 0282US9404180B2Deposition deviceHARA MASAMICHI·Filed 2011·Granted Aug 2, 2016·6 cites·6 claims
- 0379US9587300B2Electrode manufacturing apparatus for lithium ion capacitor and electrode manufacturing method thereforTOKYO ELECTRON LTD·Filed 2013·Granted Mar 7, 2017·1 cites·3 claims
- 0478US11676847B2Substrate placing table and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jun 13, 2023·0 cites·16 claims
- 0574US11508603B2Substrate placing table and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Nov 22, 2022·0 cites·17 claims
- 0671US9202728B2Substrate mounting mechanism, and substrate processing apparatusHARA MASAMICHI·Filed 2012·Granted Dec 1, 2015·2 cites·10 claims
- 0771US8992686B2Mounting table structure, film forming apparatus and raw material recovery methodGOMI ATSUSHI·Filed 2011·Granted Mar 31, 2015·3 cites·41 claims
- 0867US9976217B2Film forming method using reversible decomposition reactionTOKYO ELECTRON LTD·Filed 2014·Granted May 22, 2018·1 cites·4 claims
- 0965US11217470B2Substrate placing table and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jan 4, 2022·0 cites·10 claims
- 1064US10941477B2Substrate processing apparatus and susceptorTOKYO ELECTRON LTD·Filed 2019·Granted Mar 9, 2021·0 cites·20 claims
- 1164US8277889B2Film formation method and film formation apparatusGOMI ATSUSHI·Filed 2008·Granted Oct 2, 2012·2 cites·4 claims
- 1263US9777362B2Electrode manufacturing apparatus for lithium ion capacitorTOKYO ELECTRON LTD·Filed 2017·Granted Oct 3, 2017·0 cites·3 claims
- 1360US2010062158A1Gas supply method and gas supply deviceTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1457US2024038507A1Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1556US2014251212A1Hopper and thermal spraying apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1655US2024321559A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1755US2011263123A1Placing table structureTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1854US9062374B2Method for film formation, apparatus for film formation, and computer-readable recording mediumHARA MASAMICHI·Filed 2009·Granted Jun 23, 2015·0 cites·12 claims
- 1949US8273409B2Method for film formation, apparatus for film formation, and computer-readable recording mediumHARA MASAMICHI·Filed 2011·Granted Sep 25, 2012·0 cites·5 claims
- 2047US11227786B2Method of manufacturing electrostatic chuck and electrostsatic chuckTOKYO ELECTRON LTD·Filed 2018·Granted Jan 18, 2022·0 cites·20 claims
- 2146US2010210115A1Substrate mounting mechanism, substrate processing apparatus, method for suppressing film deposition on substrate mounting mechanism, and storage mediumTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2244US2010236480A1Raw material gas supply system and film forming apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2337US2010212594A1Substrate mounting mechanism and substrate processing apparatus having sameTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →