Inventor · disambiguated record
Stig Bieling
Also filed as: BIELING STIG
21 granted patents·5 pending applications·40 citations·filing 2010–2025
92Inventor score
Top patents by PatentIndex Score
26 records- 0195US11169445B2Pupil facet mirror, optical system and illumination optics for a projection lithography systemZEISS CARL SMT GMBH·Filed 2020·Granted Nov 9, 2021·3 cites·21 claims
- 0291US9983484B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted May 29, 2018·5 cites·20 claims
- 0389US8294877B2Illumination optical unit for projection lithographyWANGLER JOHANNES·Filed 2012·Granted Oct 23, 2012·7 cites·15 claims
- 0488US9874819B2Mirror arrayZEISS CARL SMT GMBH·Filed 2016·Granted Jan 23, 2018·4 cites·23 claims
- 0588US9046786B2Illumination system of a microlithographic projection exposure apparatusPATRA MICHAEL·Filed 2012·Granted Jun 2, 2015·5 cites·19 claims
- 0686US10018917B2Illumination optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Jul 10, 2018·3 cites·19 claims
- 0785US9983483B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted May 29, 2018·2 cites·19 claims
- 0884US9477157B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Oct 25, 2016·2 cites·19 claims
- 0977US8395754B2Illumination optical unit for EUV microlithographyENDRES MARTIN·Filed 2010·Granted Mar 12, 2013·4 cites·20 claims
- 1072US2025389927A1Optical modules for the ultraviolet wavelength rangeZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1170US2025199413A1Illumination system, radiation source apparatus, method for illuminating a reticle, and lithography systemZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1270US2025341782A1Chromatically corrected imaging illumination optical unit for use in a lithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1369US2025068081A1Illumination system, projection illumination facility and projection illumination methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1469US2025068083A1Catadioptric projection objective, projection illumination system and projection illumination methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1568US10146136B2Reflecting coating with optimized thicknessZEISS CARL SMT GMBH·Filed 2015·Granted Dec 4, 2018·1 cites·19 claims
- 1667US12468228B2Illumination optical system for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2022·Granted Nov 11, 2025·0 cites·24 claims
- 1765US10599041B2Facet mirrorZEISS CARL SMT GMBH·Filed 2014·Granted Mar 24, 2020·1 cites·24 claims
- 1865US9983482B2Radiation collector, radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted May 29, 2018·2 cites·18 claims
- 1963US9791784B2Assembly for a projection exposure apparatus for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Oct 17, 2017·1 cites·20 claims
- 2058US10948828B2Illumination optical element for projection lithographyZEISS CARL SMT GMBH·Filed 2020·Granted Mar 16, 2021·0 cites·20 claims
- 2157US11003086B2Illumination optical device for projection lithographyZEISS CARL SMT GMBH·Filed 2020·Granted May 11, 2021·0 cites·20 claims
- 2251US10324380B2Projection exposure apparatus and method for measuring an imaging aberrationZEISS CARL SMT GMBH·Filed 2018·Granted Jun 18, 2019·0 cites·22 claims
- 2350US10394129B2Microlithographic illumination unitZEISS CARL SMT GMBH·Filed 2018·Granted Aug 27, 2019·0 cites·20 claims
- 2444US8345219B2Method and apparatus for setting an illumination optical unitZEISS CARL SMT GMBH·Filed 2012·Granted Jan 1, 2013·0 cites·11 claims
- 2541US10133182B2Illumination optical assembly for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Nov 20, 2018·0 cites·18 claims
- 2635US10409167B2Method for illuminating an object field of a projection exposure systemZEISS CARL SMT GMBH·Filed 2016·Granted Sep 10, 2019·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →