Inventor · disambiguated record
Steven C. Shannon
Also filed as: SHANNON STEVEN · SHANNON STEVEN C
39 granted patents·8 pending applications·676 citations·filing 2001–2014
98Inventor score
Files withAPPLIED MATERIALS INC33SHANNON STEVEN C4COLLINS KENNETH S3MEHTA VINEET2APPLIED MARTERIALS INC1
Top patents by PatentIndex Score
47 records- 0198US8018164B2Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sourcesAPPLIED MATERIALS INC·Filed 2008·Granted Sep 13, 2011·47 cites·18 claims
- 0298US7967944B2Method of plasma load impedance tuning by modulation of an unmatched low power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Jun 28, 2011·57 cites·16 claims
- 0397US7359177B2Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply outputAPPLIED MATERIALS INC·Filed 2005·Granted Apr 15, 2008·42 cites·16 claims
- 0496US8357264B2Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·33 cites·8 claims
- 0596US7968469B2Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·46 cites·26 claims
- 0696US7780866B2Method of plasma confinement for enhancing magnetic control of plasma radial distributionAPPLIED MATERIALS INC·Filed 2007·Granted Aug 24, 2010·40 cites·20 claims
- 0794US8092605B2Magnetic confinement of a plasmaSHANNON STEVEN C·Filed 2006·Granted Jan 10, 2012·37 cites·22 claims
- 0893US8002945B2Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generatorAPPLIED MATERIALS INC·Filed 2008·Granted Aug 23, 2011·17 cites·19 claims
- 0992US7510665B2Plasma generation and control using dual frequency RF signalsAPPLIED MATERIALS INC·Filed 2006·Granted Mar 31, 2009·17 cites·19 claims
- 1091US7620511B2Method for determining plasma characteristicsAPPLIED MATERIALS INC·Filed 2007·Granted Nov 17, 2009·14 cites·13 claims
- 1191US7585384B2Apparatus and method to confine plasma and reduce flow resistance in a plasma reactorAPPLIED MATERIALS INC·Filed 2008·Granted Sep 8, 2009·10 cites·11 claims
- 1290US7879731B2Improving plasma process uniformity across a wafer by apportioning power among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·13 cites·28 claims
- 1390US7777599B2Methods and apparatus for controlling characteristics of a plasmaAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·12 cites·33 claims
- 1489US8337661B2Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generatorSHANNON STEVEN C·Filed 2008·Granted Dec 25, 2012·12 cites·7 claims
- 1589US8324525B2Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generatorSHANNON STEVEN C·Filed 2008·Granted Dec 4, 2012·12 cites·18 claims
- 1689US7848898B2Method for monitoring process drift using plasma characteristicsAPPLIED MATERIALS INC·Filed 2009·Granted Dec 7, 2010·11 cites·20 claims
- 1789US7812278B2Method for testing plasma reactor multi-frequency impedance match networksAPPLIED MATERIALS INC·Filed 2007·Granted Oct 12, 2010·13 cites·20 claims
- 1889US7813103B2Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodesAPPLIED MATERIALS INC·Filed 2007·Granted Oct 12, 2010·14 cites·20 claims
- 1988US8076247B2Plasma process uniformity across a wafer by controlling RF phase between opposing electrodesCOLLINS KENNETH S·Filed 2007·Granted Dec 13, 2011·11 cites·20 claims
- 2088US7754997B2Apparatus and method to confine plasma and reduce flow resistance in a plasmaAPPLIED MATERIALS INC·Filed 2007·Granted Jul 13, 2010·8 cites·5 claims
- 2187US7326872B2Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networksAPPLIED MATERIALS INC·Filed 2004·Granted Feb 5, 2008·19 cites·20 claims
- 2287US7286948B1Method for determining plasma characteristicsAPPLIED MATERIALS INC·Filed 2006·Granted Oct 23, 2007·9 cites·23 claims
- 2387US6652712B2Inductive antenna for a plasma reactor producing reduced fluorine dissociationAPPLIED MATERIALS INC·Filed 2001·Granted Nov 25, 2003·29 cites·12 claims
- 2486US7988815B2Plasma reactor with reduced electrical skew using electrical bypass elementsAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·11 cites·19 claims
- 2585US6667577B2Plasma reactor with spoke antenna having a VHF mode with the spokes in phaseAPPLIED MATERIALS INC·Filed 2001·Granted Dec 23, 2003·28 cites·59 claims
- 2683US7431857B2Plasma generation and control using a dual frequency RF sourceAPPLIED MATERIALS INC·Filed 2004·Granted Oct 7, 2008·26 cites·21 claims
- 2782US8080479B2Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonatorCOLLINS KENNETH S·Filed 2007·Granted Dec 20, 2011·6 cites·20 claims
- 2878US6879870B2Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamberFiled 2002·Granted Apr 12, 2005·24 cites·16 claims
- 2977US7972467B2Apparatus and method to confine plasma and reduce flow resistance in a plasma reactorAPPLIED MATERIALS INC·Filed 2003·Granted Jul 5, 2011·10 cites·26 claims
- 3077US7884025B2Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 8, 2011·4 cites·24 claims
- 3176US8435379B2Substrate cleaning chamber and cleaning and conditioning methodsMEHTA VINEET·Filed 2007·Granted May 7, 2013·6 cites·14 claims
- 3275US7994872B2Apparatus for multiple frequency power applicationAPPLIED MATERIALS INC·Filed 2009·Granted Aug 9, 2011·6 cites·12 claims
- 3375US7554334B2Matching network characterization using variable impedance analysisAPPLIED MARTERIALS INC·Filed 2006·Granted Jun 30, 2009·7 cites·19 claims
- 3474US8237517B2Apparatus for multiple frequency power applicationSHANNON STEVEN C·Filed 2011·Granted Aug 7, 2012·3 cites·20 claims
- 3572US7375947B2Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply outputAPPLIED MATERIALS INC·Filed 2007·Granted May 20, 2008·3 cites·16 claims
- 3670US7440859B2Method for determining plasma characteristicsAPPLIED MATERIALS INC·Filed 2006·Granted Oct 21, 2008·2 cites·17 claims
- 3768US9475710B2Very high frequency (VHF) driven atmospheric plasma sources and point of use fertigation of irrigation water utilizing plasma production of nitrogen bearing speciesUNIV NORTH CAROLINA STATE·Filed 2014·Granted Oct 25, 2016·2 cites·6 claims
- 3868US7879185B2Dual frequency RF matchAPPLIED MATERIALS INC·Filed 2004·Granted Feb 1, 2011·7 cites·19 claims
- 3966US7838430B2Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2004·Granted Nov 23, 2010·8 cites·27 claims
- 4052US2009297404A1Plasma reactor with high speed plasma impedance tuning by modulation of source power or bias powerAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4150US2007000611A1Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4250US2009025879A1Plasma reactor with reduced electrical skew using a conductive baffleRAUF SHAHID·Filed 2007·Application pending·0 cites
- 4349US2008110567A1Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distributionMILLER MATTHEW L·Filed 2007·Application pending·0 cites
- 4448US2009294275A1Method of plasma load impedance tuning by modulation of a source power or bias power rf generatorAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4548US2007006971A1Plasma generation and control using a dual frequency rf sourceAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4646US2013192629A1Substrate cleaning chamber and cleaning and conditioning methodsMEHTA VINEET·Filed 2013·Application pending·0 cites
- 4744US2008178803A1Plasma reactor with ion distribution uniformity controller employing plural vhf sourcesCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →