Inventor · disambiguated record
Takashi Kakegawa
Also filed as: KAKEGAWA TAKASHI
6 granted patents·8 pending applications·85 citations·filing 2002–2023
81Inventor score
Top patents by PatentIndex Score
14 records- 0192US12188125B2Showerhead and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 7, 2025·2 cites·8 claims
- 0289US7661386B2Film forming deviceTOKYO ELECTRON LTD·Filed 2002·Granted Feb 16, 2010·41 cites·14 claims
- 0387US8133323B2Film forming apparatus and method, gas supply device and storage mediumKAKEGAWA TAKASHI·Filed 2008·Granted Mar 13, 2012·31 cites·20 claims
- 0487US8128751B2Film-forming apparatusKASAI SHIGERU·Filed 2009·Granted Mar 6, 2012·11 cites·15 claims
- 0561US2024191357A1Shower head assembly and film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0652US2007175396A1Film-forming apparatusKASAI SHIGERU·Filed 2007·Application pending·0 cites
- 0748US2010107977A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 0846US2011061432A1Surface treatment method, shower head, processing container, and processing apparatus using themTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 0945US11306847B2Valve device, processing apparatus, and control methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 19, 2022·0 cites·9 claims
- 1045US2012115400A1Surface treatment method, shower head, processing container, and processing apparatus using themKAKEGAWA TAKASHI·Filed 2012·Application pending·0 cites
- 1139US2007131168A1Gas Supplying unit and substrate processing apparatusGOMI HISASHI·Filed 2006·Application pending·0 cites
- 1236US10156014B2Gas treatment apparatus and gas treatment methodTOKYO ELECTRON LTD·Filed 2017·Granted Dec 18, 2018·0 cites·6 claims
- 1336US2019078207A1Gas supply apparatus and film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1431US2015322571A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →