Inventor · disambiguated record
Takehiko Orii
Also filed as: ORII TAKEHIKO
62 granted patents·18 pending applications·519 citations·filing 2000–2022
98Inventor score
Top patents by PatentIndex Score
80 records- 0197US7402523B2Etching methodTOKYO ELECTRON LTD·Filed 2006·Granted Jul 22, 2008·59 cites·18 claims
- 0296US11367630B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jun 21, 2022·3 cites·20 claims
- 0396US7543593B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jun 9, 2009·32 cites·4 claims
- 0494US9953826B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·15 cites·18 claims
- 0593US7404407B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jul 29, 2008·21 cites·4 claims
- 0691US7332055B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Feb 19, 2008·42 cites·14 claims
- 0789US7482281B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Jan 27, 2009·14 cites·22 claims
- 0889US6634806B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Oct 21, 2003·39 cites·18 claims
- 0988US10115609B2Separation and regeneration apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 30, 2018·6 cites·8 claims
- 1088US8113221B2Substrate cleaning method, substrate cleaning apparatus and computer readable recording mediumNANBA HIROMITSU·Filed 2011·Granted Feb 14, 2012·10 cites·14 claims
- 1187US7171973B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Feb 6, 2007·33 cites·14 claims
- 1286US8651121B2Substrate processing apparatus, substrate processing method, and storage mediumORII TAKEHIKO·Filed 2009·Granted Feb 18, 2014·13 cites·9 claims
- 1386US6863741B2Cleaning processing method and cleaning processing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Mar 8, 2005·37 cites·10 claims
- 1484US9881784B2Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 30, 2018·4 cites·12 claims
- 1584US9799538B2Substrate cleaning systemTOKYO ELECTRON LTD·Filed 2013·Granted Oct 24, 2017·6 cites·12 claims
- 1684US9662685B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted May 30, 2017·5 cites·5 claims
- 1784US8337659B2Substrate processing method and substrate processing apparatusORII TAKEHIKO·Filed 2005·Granted Dec 25, 2012·10 cites·13 claims
- 1883US10046370B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 14, 2018·3 cites·3 claims
- 1983US6817790B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Nov 16, 2004·23 cites·18 claims
- 2082US10811283B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·2 cites·18 claims
- 2182US7862680B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Jan 4, 2011·6 cites·9 claims
- 2281US10043652B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2014·Granted Aug 7, 2018·5 cites·15 claims
- 2381US8372212B2Supercritical drying method and apparatus for semiconductor substratesTOSHIBA KK·Filed 2012·Granted Feb 12, 2013·5 cites·5 claims
- 2481US7354484B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Apr 8, 2008·7 cites·7 claims
- 2581US6979655B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Dec 27, 2005·22 cites·19 claims
- 2680US10835908B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Nov 17, 2020·2 cites·11 claims
- 2779US8771429B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusJI LINAN·Filed 2012·Granted Jul 8, 2014·5 cites·8 claims
- 2879US7275553B2Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Oct 2, 2007·22 cites·27 claims
- 2977US10998183B2Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory mediumTOKYO ELECTRON LTD·Filed 2016·Granted May 4, 2021·2 cites·20 claims
- 3077US8794250B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Aug 5, 2014·3 cites·7 claims
- 3177US6513537B1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Feb 4, 2003·20 cites·11 claims
- 3275US7803230B2Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the methodTOKYO ELECTRON LTD·Filed 2005·Granted Sep 28, 2010·5 cites·10 claims
- 3374US2022277968A1Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3473US9583330B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 28, 2017·2 cites·4 claims
- 3573US8747689B2Liquid processing method, liquid processing apparatus and storage mediumOHNO HIROKI·Filed 2012·Granted Jun 10, 2014·3 cites·7 claims
- 3669US9443712B2Substrate cleaning method and substrate cleaning systemTOKYO ELECTRON LTD·Filed 2013·Granted Sep 13, 2016·2 cites·13 claims
- 3765US11189498B2Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing filmTOKYO ELECTRON LTD·Filed 2019·Granted Nov 30, 2021·1 cites·5 claims
- 3864US10207349B2High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure containerTOKYO ELECTRON LTD·Filed 2013·Granted Feb 19, 2019·1 cites·14 claims
- 3963US12172198B2Gas cluster processing device and gas cluster processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Dec 24, 2024·0 cites·7 claims
- 4063US10096462B2Substrate processing method and storage mediumTOSHIBA KK·Filed 2013·Granted Oct 9, 2018·1 cites·7 claims
- 4162US10199240B2Substrate processing method, substrate processing apparatus, and storage mediumHAYASHI HIDEKAZU·Filed 2012·Granted Feb 5, 2019·1 cites·7 claims
- 4262US7927429B2Substrate cleaning method, substrate cleaning apparatus and computer readable recording mediumTOKYO ELECTRON LTD·Filed 2004·Granted Apr 19, 2011·7 cites·12 claims
- 4362US7329616B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Feb 12, 2008·1 cites·10 claims
- 4461US8978671B2Substrate processing method and substrate processing apparatusTANAKA SATORU·Filed 2011·Granted Mar 17, 2015·1 cites·8 claims
- 4561US7300598B2Substrate processing method and apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Nov 27, 2007·7 cites·6 claims
- 4660US8003509B2Semiconductor manufacturing apparatus and semiconductor manufacturing methodTOKYO ELECTRON LTD·Filed 2009·Granted Aug 23, 2011·1 cites·11 claims
- 4757US11581192B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Feb 14, 2023·0 cites·2 claims
- 4857US10665470B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 26, 2020·0 cites·8 claims
- 4956US2020234974A1Etching Method and Etching ApparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 5055US7416632B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2002·Granted Aug 26, 2008·4 cites·6 claims
Showing the top 50 of 80 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →