Inventor · disambiguated record
Thomas M. Cameron
Also filed as: CAMERON THOMAS M
21 granted patents·30 pending applications·59 citations·filing 2005–2025
93Inventor score
Top patents by PatentIndex Score
51 records- 0197US11685752B2Process for preparing organotin compoundsENTEGRIS INC·Filed 2022·Granted Jun 27, 2023·8 cites·13 claims
- 0297US11358975B2Process for preparing organotin compoundsENTEGRIS INC·Filed 2021·Granted Jun 14, 2022·15 cites·18 claims
- 0388US12459824B2Method of preparing iodosilanes and compositions therefromENTEGRIS INC·Filed 2024·Granted Nov 4, 2025·0 cites·17 claims
- 0488US7638074B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsADVANCED TECH MATERIALS·Filed 2007·Granted Dec 29, 2009·9 cites·19 claims
- 0586US8206784B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsXU CHONGYING·Filed 2009·Granted Jun 26, 2012·8 cites·23 claims
- 0684US8455049B2Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor depositionCAMERON THOMAS M·Filed 2008·Granted Jun 4, 2013·5 cites·5 claims
- 0783US9534285B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsENTEGRIS INC·Filed 2014·Granted Jan 3, 2017·3 cites·13 claims
- 0881US2023303596A1Process for preparing organotin compoundsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 0979US2025002509A1Process for preparing organotin compoundsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 1078US2025243226A1Process for preparing organotin compoundsENTEGRIS INC·Filed 2025·Application pending·0 cites
- 1176US9443736B2Silylene compositions and methods of use thereofENTEGRIS INC·Filed 2013·Granted Sep 13, 2016·4 cites·18 claims
- 1275US8784936B2Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric filmsXU CHONGYING·Filed 2012·Granted Jul 22, 2014·2 cites·11 claims
- 1374US12297217B2Process for preparing organotin compoundsENTEGRIS INC·Filed 2022·Granted May 13, 2025·0 cites·4 claims
- 1473US8168811B2Precursors for CVD/ALD of metal-containing filmsCAMERON THOMAS M·Filed 2009·Granted May 1, 2012·2 cites·19 claims
- 1573US2021331930A1Method of preparing iodosilanes and compositions therefromENTEGRIS INC·Filed 2021·Application pending·0 cites
- 1670US12221691B2Organotin precursor compoundsENTEGRIS INC·Filed 2022·Granted Feb 11, 2025·0 cites·8 claims
- 1770US2024116774A1Tungsten precursors and related methodsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 1870US2022402945A1Process for preparing organotin compoundsENTEGRIS INC·Filed 2022·Application pending·0 cites
- 1968US2024116769A1Compounds and methods for preparation of aluminatesENTEGRIS INC·Filed 2023·Application pending·0 cites
- 2067US2024352051A1Multi-nuclear tin compounds and related methodsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 2167US2024317781A1Mono-substituted tin compounds and related methodsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 2266US2024002412A1Compounds and processes for extreme ultraviolet lithographyENTEGRIS INC·Filed 2023·Application pending·0 cites
- 2365US9929014B2Dopant precursors for mono-layer dopingENTEGRIS INC·Filed 2014·Granted Mar 27, 2018·1 cites·18 claims
- 2465US2024092810A1Compositions for extreme ultraviolet lithography and related methodsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 2565US2013251918A1Strontium and barium precursors for use in chemical vapor deposition, atomic layer deposition and rapid vapor depositionADVANCED TECH MATERIALS·Filed 2013·Application pending·0 cites
- 2664US2024174699A1Functionalized organotin precursors and related methodsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 2764US2025074927A1Precursors for selective deposition of silicon-containing filmsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 2863US2023271987A1Organometallic precursors and related methodsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 2962US2023391803A1Compositions and related methods of alkyltintrihalidesENTEGRIS INC·Filed 2023·Application pending·0 cites
- 3061US11203604B2Preparation of triiodosilanesENTEGRIS INC·Filed 2019·Granted Dec 21, 2021·0 cites·16 claims
- 3161US2010270508A1Zirconium precursors useful in atomic layer deposition of zirconium-containing filmsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 3260US8329140B2Method and system for hydrogen evolution and storageTHORN DAVID L·Filed 2008·Granted Dec 11, 2012·0 cites·5 claims
- 3358US2024092816A1Precursors containing fluorinated alkoxides and amidesENTEGRIS INC·Filed 2023·Application pending·0 cites
- 3457US9373677B2Doping of ZrO2 for DRAM applicationsCISSELL JULIE·Filed 2011·Granted Jun 21, 2016·1 cites·20 claims
- 3557US2025270409A1Aluminum-containing inhibitor compounds for selective depositionENTEGRIS INC·Filed 2025·Application pending·0 cites
- 3657US2010209610A1Group iv complexes as cvd and ald precursors for forming metal-containing thin filmsADVANCED TECH MATERIALS·Filed 2008·Application pending·0 cites
- 3757US2024101582A1Indenyl precursorsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 3856US2023245894A1Process for selectively depositing highly-conductive metal filmsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 3955US2010112211A1Zirconium, hafnium, titanium, and silicon precursors for ald/cvdADVANCED TECH MATERIALS·Filed 2008·Application pending·0 cites
- 4054US8524931B2Precursor compositions for ALD/CVD of group II ruthenate thin filmsXU CHONGYING·Filed 2007·Granted Sep 3, 2013·0 cites·4 claims
- 4154US2011060165A1Metal aminotroponiminates, bis-oxazolinates and guanidinatesADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 4253US8574675B2Method and composition for depositing ruthenium with assistive metal speciesLUBGUBAN JR JORGE A·Filed 2010·Granted Nov 5, 2013·1 cites·34 claims
- 4351US10870921B2Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2ENTEGRIS INC·Filed 2014·Granted Dec 22, 2020·0 cites·1 claims
- 4450US2023392702A1Safety relief plug with a fusible metal and related devices and methodsENTEGRIS INC·Filed 2023·Application pending·0 cites
- 4549US7439369B2Method and system for hydrogen evolution and storageLOA ALAMOS NAT SECURITY LLC·Filed 2005·Granted Oct 21, 2008·0 cites·1 claims
- 4647US2010279011A1Novel bismuth precursors for cvd/ald of thin filmsADVANCED TECH MATERIALS·Filed 2008·Application pending·0 cites
- 4746US2016343795A1DOPING OF ZrO2 FOR DRAM APPLICATIONSENTEGRIS INC·Filed 2016·Application pending·0 cites
- 4844US8663735B2In situ generation of RuO4 for ALD of Ru and Ru related materialsXU CHONGYING·Filed 2010·Granted Mar 4, 2014·0 cites·9 claims
- 4943US2009162550A1Copper (i) amidinates and guanidinates, mixed ligand copper complexes, and compositions for chemical vapor deposition, atomic layer deposition, and rapid vapor deposition of copperADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 5038US2012196449A1Zirconium, hafnium and titanium precursors for atomic layer deposition of corresponding metal-containing filmsXU CHONGYING·Filed 2012·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →