Inventor · disambiguated record
Vladimir Levinski
Also filed as: LEVINSKI VLADIMIR
96 granted patents·12 pending applications·635 citations·filing 2003–2024
99Inventor score
Top patents by PatentIndex Score
108 records- 0198US11164307B1Misregistration metrology by using fringe Moiré and optical Moiré effectsKLA CORP·Filed 2020·Granted Nov 2, 2021·18 cites·35 claims
- 0298US10228320B1Achieving a small pattern placement error in metrology targetsKLA—TENCOR CORP·Filed 2015·Granted Mar 12, 2019·17 cites·17 claims
- 0397US10197389B2Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fieldsKLA TENCOR CORP·Filed 2016·Granted Feb 5, 2019·19 cites·23 claims
- 0497US8441639B2Metrology systems and methodsKANDEL DANIEL·Filed 2010·Granted May 14, 2013·35 cites·22 claims
- 0596US11073768B2Metrology target for scanning metrologyKLA CORP·Filed 2019·Granted Jul 27, 2021·19 cites·21 claims
- 0696US9080971B2Metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Jul 14, 2015·21 cites·12 claims
- 0796US8345243B2Overlay metrology targetKLA TENCOR CORP·Filed 2010·Granted Jan 1, 2013·15 cites·2 claims
- 0895US12105433B2Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2022·Granted Oct 1, 2024·2 cites·6 claims
- 0995US10824079B2Diffraction based overlay scatterometryKLA TENCOR CORP·Filed 2018·Granted Nov 3, 2020·12 cites·16 claims
- 1095US9864209B2Self-moire target design principles for measuring unresolved device-like pitchesKLA TENCOR CORP·Filed 2016·Granted Jan 9, 2018·13 cites·16 claims
- 1195US9739702B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 22, 2017·31 cites·46 claims
- 1295US7671990B1Cross hatched metrology marks and associated method of useKLA TENCOR TECH CORP·Filed 2007·Granted Mar 2, 2010·40 cites·8 claims
- 1394US12032300B2Imaging overlay with mutually coherent oblique illuminationKLA CORP·Filed 2022·Granted Jul 9, 2024·2 cites·23 claims
- 1494US11841621B2Moiré scatterometry overlayKLA CORP·Filed 2021·Granted Dec 12, 2023·2 cites·39 claims
- 1594US8873054B2Metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Oct 28, 2014·14 cites·26 claims
- 1694US7528941B2Order selected overlay metrologyKLA TENCOR TECHNOLGIES CORP·Filed 2007·Granted May 5, 2009·40 cites·27 claims
- 1794US7310789B2Use of overlay diagnostics for enhanced automatic process controlKLA TENCOR TECH CORP·Filed 2006·Granted Dec 18, 2007·20 cites·33 claims
- 1893US11378394B1On-the-fly scatterometry overlay metrology targetKLA CORP·Filed 2020·Granted Jul 5, 2022·7 cites·24 claims
- 1993US9678421B2Target element types for process parameter metrologyKLA TENCOR CORP·Filed 2015·Granted Jun 13, 2017·22 cites·22 claims
- 2093US8896832B2Discrete polarization scatterometryHILL ANDREW V·Filed 2011·Granted Nov 25, 2014·25 cites·35 claims
- 2192US12253805B2Scatterometry overlay metrology with orthogonal fine-pitch segmentationKLA CORP·Filed 2022·Granted Mar 18, 2025·2 cites·45 claims
- 2292US12001148B2Enhancing performance of overlay metrologyKLA CORP·Filed 2023·Granted Jun 4, 2024·2 cites·26 claims
- 2392US10591406B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Mar 17, 2020·6 cites·20 claims
- 2492US8848186B2Angle-resolved antisymmetric scatterometryKANDEL DANIEL·Filed 2010·Granted Sep 30, 2014·8 cites·17 claims
- 2591US10337991B2Control of amplitude and phase of diffraction orders using polarizing targets and polarized illuminationKLA TENCOR CORP·Filed 2016·Granted Jul 2, 2019·4 cites·23 claims
- 2691US9454072B2Method and system for providing a target design displaying high sensitivity to scanner focus changeKLA TENCOR CORP·Filed 2013·Granted Sep 27, 2016·12 cites·21 claims
- 2790US10551749B2Metrology targets with supplementary structures in an intermediate layerKLA TENCOR CORP·Filed 2017·Granted Feb 4, 2020·3 cites·29 claims
- 2890US9927718B2Multi-layer overlay metrology target and complimentary overlay metrology measurement systemsKANDEL DANIEL·Filed 2011·Granted Mar 27, 2018·9 cites·24 claims
- 2990US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 3090US7352451B2System method and structure for determining focus accuracyKLA TENCOR CORP·Filed 2005·Granted Apr 1, 2008·12 cites·8 claims
- 3189US12235588B2Scanning overlay metrology with high signal to noise ratioKLA CORP·Filed 2023·Granted Feb 25, 2025·1 cites·21 claims
- 3289US9934353B2Focus measurements using scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 3, 2018·5 cites·22 claims
- 3389US8582114B2Overlay metrology by pupil phase analysisMANASSEN AMNON·Filed 2011·Granted Nov 12, 2013·7 cites·23 claims
- 3489US8456641B1Optical systemLEVINSKI VLADIMIR·Filed 2011·Granted Jun 4, 2013·9 cites·13 claims
- 3589US7684038B1Overlay metrology targetKLA TENCOR CORP·Filed 2008·Granted Mar 23, 2010·9 cites·2 claims
- 3688US8913237B2Device-like scatterometry overlay targetsKLA TENCOR CORP·Filed 2013·Granted Dec 16, 2014·9 cites·18 claims
- 3787US12111580B2Optical metrology utilizing short-wave infrared wavelengthsKLA CORP·Filed 2021·Granted Oct 8, 2024·2 cites·38 claims
- 3887US11137692B2Metrology targets and methods with oblique periodic structuresKLA TENCOR CORP·Filed 2018·Granted Oct 5, 2021·3 cites·22 claims
- 3987US8243273B2Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methodsLEVINSKI VLADIMIR·Filed 2009·Granted Aug 14, 2012·11 cites·21 claims
- 4087US7528953B2Target acquisition and overlay metrology based on two diffracted orders imagingKLA TENCOR TECH CORP·Filed 2006·Granted May 5, 2009·10 cites·30 claims
- 4186US10520832B2Topographic phase control for overlay measurementKLA TENCOR CORP·Filed 2016·Granted Dec 31, 2019·4 cites·7 claims
- 4286US10101592B2Self-moiré target design principles for measuring unresolved device-like pitchesKLA TENCOR CORP·Filed 2017·Granted Oct 16, 2018·3 cites·14 claims
- 4385US10890436B2Overlay targets with orthogonal underlayer dummyfillKLA TENCOR CORP·Filed 2013·Granted Jan 12, 2021·4 cites·41 claims
- 4485US7433039B1Apparatus and methods for reducing tool-induced shift during overlay metrologyKLA TENCOR TECH CORP·Filed 2004·Granted Oct 7, 2008·26 cites·28 claims
- 4584US10901325B2Determining the impacts of stochastic behavior on overlay metrology dataKLA TENCOR CORP·Filed 2018·Granted Jan 26, 2021·4 cites·28 claims
- 4684US10444161B2Systems and methods for metrology with layer-specific illumination spectraKLA TENCOR CORP·Filed 2017·Granted Oct 15, 2019·2 cites·57 claims
- 4784US2025021019A1Imaging overlay targets using moiré elements and rotational symmetry arrangementsKLA CORP·Filed 2024·Application pending·0 cites
- 4883US11592755B2Enhancing performance of overlay metrologyKLA CORP·Filed 2021·Granted Feb 28, 2023·1 cites·30 claims
- 4983US7602491B2Optical gain approach for enhancement of overlay and alignment systems performanceKLA TENCOR CORP·Filed 2008·Granted Oct 13, 2009·13 cites·11 claims
- 5082US11614692B2Self-Moire grating design for use in metrologyKLA CORP·Filed 2020·Granted Mar 28, 2023·1 cites·20 claims
Showing the top 50 of 108 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →