Inventor · disambiguated record
William Volk
Also filed as: VOLK WILLIAM · VOLK WILLIAM W
8 granted patents·3 pending applications·86 citations·filing 2003–2019
86Inventor score
Files withKLA TENCOR TECH CORP3KLA TENCOR TECH CORPORATION2VOLK WILLIAM2VOLK WILLIAM W2MARELLA PAUL F1
Top patents by PatentIndex Score
11 records- 0191US8102408B2Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designsVERMA GAURAV·Filed 2007·Granted Jan 24, 2012·23 cites·21 claims
- 0289US7604906B1Films for prevention of crystal growth on fused silica substrates for semiconductor lithographyKLA TENCOR TECH CORP·Filed 2005·Granted Oct 20, 2009·25 cites·40 claims
- 0387US7541115B1Use of calcium fluoride substrate for lithography masksKLA TENCOR TECH CORP·Filed 2005·Granted Jun 2, 2009·12 cites·21 claims
- 0485US9951585B1Method of inducing micro-seismic fractures and dislocations of fracturesVOLK WILLIAM W·Filed 2015·Granted Apr 24, 2018·7 cites·16 claims
- 0579US9002497B2Methods and systems for inspection of wafers and reticles using designer intent dataVOLK WILLIAM·Filed 2004·Granted Apr 7, 2015·14 cites·39 claims
- 0675US10713771B2Methods and systems for inspection of wafers and reticles using designer intent dataKLA TENCOR TECH CORPORATION·Filed 2018·Granted Jul 14, 2020·1 cites·29 claims
- 0765US11348222B2Methods and systems for inspection of wafers and reticles using designer intent dataKLA TENCOR TECH CORPORATION·Filed 2019·Granted May 31, 2022·0 cites·30 claims
- 0857US2008081385A1Methods and systems for inspection of wafers and reticles using designer intent dataMARELLA PAUL F·Filed 2007·Application pending·0 cites
- 0956US2015178914A1Methods and Systems for Inspection of Wafers and Reticles Using Designer Intent DataKLA TENCOR TECH CORP·Filed 2015·Application pending·0 cites
- 1048US8498468B1Mask inspectionVOLK WILLIAM W·Filed 2003·Granted Jul 30, 2013·4 cites·20 claims
- 1135US2009060317A1Mask defect repair through wafer plane modelingVOLK WILLIAM·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →