Inventor · disambiguated record
Yang-Shan Huang
Also filed as: HUANG YANG-SHAN
21 granted patents·5 pending applications·19 citations·filing 2012–2022
90Inventor score
Files withASML NETHERLANDS BV19LAFARRE RAYMOND WILHELMUS LOUIS2ASML HOLDING NV1BUTLER HANS1HOL SVEN ANTOIN JOHAN1
Top patents by PatentIndex Score
26 records- 0191US11175596B2Particle traps and barriers for particle suppressionASML NETHERLANDS BV·Filed 2018·Granted Nov 16, 2021·5 cites·26 claims
- 0284US11092902B2Method and apparatus for detecting substrate surface variationsASML NETHERLANDS BV·Filed 2018·Granted Aug 17, 2021·2 cites·14 claims
- 0380US9110387B2Lithographic apparatus comprising a substrate table and a surface substrate actuatorBUTLER HANS·Filed 2012·Granted Aug 18, 2015·3 cites·15 claims
- 0477US11232960B2Pick-and-place tool having multiple pick up elementsASML NETHERLANDS BV·Filed 2017·Granted Jan 25, 2022·2 cites·20 claims
- 0574US11204558B2Particle suppression systems and methodsASML NETHERLANDS BV·Filed 2018·Granted Dec 21, 2021·1 cites·21 claims
- 0670US9141004B2Lithographic apparatus and methodVERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS·Filed 2012·Granted Sep 22, 2015·2 cites·20 claims
- 0769US11003095B2Positioning system and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted May 11, 2021·1 cites·22 claims
- 0869US9329501B2Lithographic apparatus, method of deforming a substrate table and device manufacturing methodHUANG YANG-SHAN·Filed 2012·Granted May 3, 2016·2 cites·19 claims
- 0966US2023107989A1Replaceable module for a charged particle apparatusASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1064US10705438B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Jul 7, 2020·0 cites·20 claims
- 1162US12032296B2Fluid handling system, method and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·0 cites·20 claims
- 1262US11961698B2Replaceable module for a charged particle apparatusASML NETHERLANDS BV·Filed 2021·Granted Apr 16, 2024·0 cites·20 claims
- 1362US9389518B2Stage system and a lithographic apparatusASML NETHERLANDS BV·Filed 2012·Granted Jul 12, 2016·1 cites·20 claims
- 1458US9261798B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Feb 16, 2016·0 cites·15 claims
- 1556US10571814B2Lithographic methodASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·0 cites·11 claims
- 1654US9811005B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 7, 2017·0 cites·19 claims
- 1751US11460786B2Positioning system and a method for positioning a substage or a stage with respect to a frameASML NETHERLANDS BV·Filed 2018·Granted Oct 4, 2022·0 cites·20 claims
- 1849US2017010544A1Coil assembly, electromagnetic actuator, stage positioning device, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 1948US9921494B2Lithographic apparatus comprising an actuator, and method for protecting such actuatorASML NETHERLANDS BV·Filed 2013·Granted Mar 20, 2018·0 cites·13 claims
- 2046US11137694B2Particle suppression systems and methodsASML NETHERLANDS BV·Filed 2018·Granted Oct 5, 2021·0 cites·27 claims
- 2145US12332570B2Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debrisASML HOLDING NV·Filed 2020·Granted Jun 17, 2025·0 cites·15 claims
- 2243US8687171B2Electromagnetic actuator, stage apparatus and lithographic apparatusHOL SVEN ANTOIN JOHAN·Filed 2012·Granted Apr 1, 2014·0 cites·15 claims
- 2342US2020183288A1A clear-out tool, a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 2441US2013107241A1Lithographic apparatus and substrate handling methodLAFARRE RAYMOND WILHELMUS LOUIS·Filed 2012·Application pending·0 cites
- 2540US2013077078A1Lithographic Apparatus and Substrate Handling MethodLAFARRE RAYMOND WILHELMUS LOUIS·Filed 2012·Application pending·0 cites
- 2639US11442369B2Object stage bearing for lithographic apparatusASML NETHERLANDS BV·Filed 2018·Granted Sep 13, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →