Determining Physical Property of Substrate

Abstract

A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.

1 . A method of determining a polishing endpoint of a substrate, the method comprising:
 polishing a surface of a substrate;   storing in a database a plurality of previously recorded spectra, each of the previously recorded spectra having a value associated therewith stored in the database;   during polishing, directing a beam of white light to impinge the surface of the substrate and generate a reflected light beam and measuring a sequence of first spectra of the reflected light beam;   for each first spectrum from the first spectra, determining a second spectrum from the plurality of previously recorded spectra stored in the database that matches the first spectrum to generate a sequence of second spectra, wherein the second spectrum matches the first spectrum when the second spectrum is similar to the first spectrum;   for each second spectrum in the sequence of second spectra, identifying from the database the value stored in the database associated with the second spectrum to generate a sequence of values; and   determining a polishing endpoint from the sequence of physical property values.   
     
     
         2 . The method of  claim 1 , wherein the value is a value of a physical property selected from the group consisting of: a layer thickness on the substrate and a step height on the substrate. 
     
     
         3 . The method of  claim 2 , wherein the physical property is a layer thickness on the substrate. 
     
     
         4 . The method of  claim 2 , wherein the physical property is a step height on the substrate. 
     
     
         5 . The method of  claim 1 , further comprising determining a linear function for the sequence of physical property values. 
     
     
         6 . The method of  claim 5 , wherein determining a linear function comprising fitting a linear function to the sequence of values. 
     
     
         7 . The method of  claim 5 , further comprising calculating a resulting value of the physical property from the linear function. 
     
     
         8 . The method of  claim 7 , wherein calculating includes extrapolation of the resulting value from the linear function. 
     
     
         9 . The method of  claim 6 , further comprising determining the polishing endpoint from the linear function. 
     
     
         10 . The method of  claim 9 , wherein determining the polishing endpoint from the linear function comprises calculating when the linear function reaches a target value. 
     
     
         11 . A computer program product tangibly embodied in a computer-readable storage device, the computer program product including instructions that, when executed, cause a processor to perform operations comprising:
 polishing a surface of a substrate;   storing in a database a plurality of previously recorded spectra, each of the previously recorded spectra having a value associated therewith stored in the database;   during polishing, directing a beam of white light to impinge the surface of the substrate and generate a reflected light beam and measuring a sequence of first spectra of the reflected light beam;   for each first spectrum from the first spectra, determining a second spectrum from the plurality of previously recorded spectra stored in the database that matches the first spectrum to generate a sequence of second spectra, wherein the second spectrum matches the first spectrum when the second spectrum is similar to the first spectrum;   for each second spectrum in the sequence of second spectra, identifying from the database the value stored in the database associated with the second spectrum to generate a sequence of values; and   determining a polishing endpoint from the sequence of values.   
     
     
         12 . The computer program product of  claim 11 , wherein the value is a value of a physical property selected from the group consisting of: a layer thickness on the substrate and a step height on the substrate. 
     
     
         13 . The computer program product of  claim 12 , wherein the physical property is a layer thickness on the substrate. 
     
     
         14 . The computer program product of  claim 12 , wherein the physical property is a step height on the substrate. 
     
     
         15 . The computer program product of  claim 11 , further comprising determining a linear function for the sequence of physical property values. 
     
     
         16 . The computer program product of  claim 15 , wherein determining a linear function comprising fitting a linear function to the sequence of values. 
     
     
         17 . The computer program product of  claim 15 , further comprising calculating a resulting value of the physical property from the linear function. 
     
     
         18 . The computer program product of  claim 17 , wherein calculating includes extrapolation of the resulting value from the linear function. 
     
     
         19 . The computer program product of  claim 16 , further comprising determining the polishing endpoint from the linear function. 
     
     
         20 . The computer program product of  claim 19 , wherein determining the polishing endpoint from the linear function comprises calculating when the linear function reaches a target value.