Charged particle apparatus, scanning electron microscope, and sample inspection method

Abstract

An object of the invention is to be able to select easily and quickly inspection recipes which are appropriate to samples from any number of inspection recipes. A calculating device displays a plurality of inspection recipes on the GUI. An inspection recipe includes settings for controlling charged particle columns which irradiate charged particles on samples with a plurality of characteristics. Plural inspection recipes are arranged and displayed on a coordinate system which is specified by a plurality of axes having characteristic values (robustness variable of charge up, throughput of defect inspection, and accuracy of defect inspection) which have mutually trade-off relationships.

1 . (canceled) 
     
     
         2 . A charged particle apparatus, comprising:
 a sample chamber;   a stage which contains the sample in the sample chamber;   a carry structure which carries the sample to the stage of the sample chamber;   an electron optical system which irradiates an electron beam on the sample;   a control device which controls the electron optical system and which has a calculation device, a memory device and graphical user interface (GUI), where the memory device has an image memory section, a recipe memory section and an inspection program;   wherein the recipe memory section stores a plurality of inspection recipes that determine acquisition conditions for observations according to the electron optical system, the inspection recipes corresponding to recipe IDs for identifying inspection recipes,   wherein individual ones of the inspection recipes have a control condition for a pre-irradiation dose, an observation condition and characteristics of defect inspection,   wherein the characteristics of defect inspection are characteristics for inspection corresponding to the observations, based on the control condition for the pre-irradiation dose and the observation condition, the characteristics of defect inspection incorporate throughput of defects inspection and accuracy of defect inspection of defects which are included in the observation, robustness variable of charge up of the sample and minimum limit of failure detection, and   wherein a coordinate system is generated using a combination of selected characteristics of defect inspection, the recipe IDs of the inspection recipes are plotted on the coordinate system, and when an operator selects one of the recipe IDs by operating a cursor, one of the inspection recipes corresponding to the selected recipe ID is displayed in a separate window.   
     
     
         3 . A charged particle apparatus according to  claim 2 ,
 wherein observation data from the inspection recipe corresponding to the selected recipe ID is shown in the separate window.   
     
     
         4 . A charged particle apparatus according to  claim 2 ,
 wherein a calculating device is pre-stored in the memory device, and   wherein a list representing a combination of the characteristics of defect inspection are shown on the GUI and are configured to be selectable by the operator.   
     
     
         5 . A charged particle apparatus according to  claim 2 ,
 wherein the inspection recipes include screening conditions that are related to the sample, and the screening conditions are shown in the separate window.   
     
     
         6 . A charged particle apparatus according to  claim 2 ,
 wherein the recipe IDs correspond on a one-to-one basis the inspection recipes.   
     
     
         7 . A charged particle apparatus according to  claim 2 ,
 wherein the characteristics of defect inspection for the inspection recipe are updated according to each inspection, and the updated inspection recipes are stored in the recipe memory section.