Exposure apparatus, exposure method, and method for producing device
Abstract
A liquid immersion exposure apparatus exposes a substrate by irradiating an exposure beam on the substrate through liquid. The apparatus has a substrate stage which is provided with a substrate holding portion on which the substrate is held and is provided with a stage member having an upper surface. The upper surface of the stage member is provided adjacent to the upper surface of the held substrate with a gap between the held substrate and the stage member. A temperature adjustment system, a part of which is provided under the upper surface of the stage member, performs temperature adjustment for the stage member.
Claims
exact text as granted — not AI-modified1 . A liquid immersion exposure apparatus comprising: a projection system; an immersion area forming member having a liquid supply inlet and a liquid recovery outlet, the immersion area forming member having an opening through which an exposure beam is projected, the immersion area forming member forming a liquid immersion area on a portion of an upper surface of a substrate during exposure of the substrate; a substrate stage which is provided with a substrate holding portion on which the substrate is held and is provided with a stage member having an upper surface, the upper surface of the stage member being provided adjacent to the upper surface of the held substrate with a gap between the held substrate and the stage member; and a temperature adjustment system a part of which. is provided under the upper surface of the stage member and which performs temperature adjustment for the stage member, wherein the substrate stage is movable below the projection system and the immersion area forming member, and a portion of the liquid immersion area is formed on the upper surface of the held substrate and another portion of the liquid immersion area is formed on the upper surface of the stage member, when exposing an edge portion of the upper surface of the substrate with the exposure beam via liquid in the liquid immersion area.
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