Metrology method and system

Abstract

A metrology method for use in determining one or more parameters of a patterned structure, the method including providing raw measured TEM image data, TEMmeas, data indicative of a TEM measurement mode, and predetermined simulated TEM image data including data indicative of one or more simulated TEM images of a structure similar to the patterned structure under measurements and a simulated weight map including weights assigned to different regions in the simulated TEM image corresponding to different features of the patterned structure, performing a fitting procedure between the raw measured TEM image data and the predetermined simulated TEM image data and determining one or more parameters of the structure from the simulated TEM image data corresponding to a best fit condition.

What is claimed is: 
     
         1 . A control system for use in measuring one or more parameters of a patterned structure, the control system being configured as a computer system comprising:
 an input utility configured to receive input data comprising raw measured TEM image data, TEM meas , data indicative of a TEM measurement mode; and   a data processor configured to process the raw measured TEM image data, TEM meas , and generate output data indicative of one or more parameters of a patterned structure, wherein said data processor comprises: an optimization module configured and operable to utilize said data indicative of the TEM measurement mode and perform a fitting procedure between the raw measured TEM image data, TEM meas , and predetermined simulated TEM image data, TEM simul , and determining one or more parameters of the structure from the simulated image data corresponding to a best fit condition, wherein said predetermined simulated TEM image data, TEM simul , being based on a parametrized three-dimensional model of features of the patterned structure, and comprising one or more simulated TEM images and a simulated weight map comprising weights assigned to different regions in the simulated TEM image corresponding to different features of the patterned structure.