Inventor · disambiguated record
Daniel Kandel
Also filed as: KANDEL DANIEL
64 granted patents·6 pending applications·681 citations·filing 2005–2025
99Inventor score
Top patents by PatentIndex Score
70 records- 0198US10228320B1Achieving a small pattern placement error in metrology targetsKLA—TENCOR CORP·Filed 2015·Granted Mar 12, 2019·17 cites·17 claims
- 0298US7440105B2Continuously varying offset mark and methods of determining overlayKLA TENCOR TECH CORP·Filed 2005·Granted Oct 21, 2008·93 cites·12 claims
- 0397US8441639B2Metrology systems and methodsKANDEL DANIEL·Filed 2010·Granted May 14, 2013·35 cites·22 claims
- 0496US9080971B2Metrology systems and methodsKLA TENCOR CORP·Filed 2014·Granted Jul 14, 2015·21 cites·12 claims
- 0595US9864209B2Self-moire target design principles for measuring unresolved device-like pitchesKLA TENCOR CORP·Filed 2016·Granted Jan 9, 2018·13 cites·16 claims
- 0695US9739702B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 22, 2017·31 cites·46 claims
- 0795US7277172B2Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signalsKLA TENCOR TECH CORP·Filed 2006·Granted Oct 2, 2007·34 cites·27 claims
- 0894US8873054B2Metrology systems and methodsKLA TENCOR CORP·Filed 2013·Granted Oct 28, 2014·14 cites·26 claims
- 0994US8214771B2Scatterometry metrology target design optimizationADEL MICHAEL·Filed 2009·Granted Jul 3, 2012·32 cites·25 claims
- 1094US7528941B2Order selected overlay metrologyKLA TENCOR TECHNOLGIES CORP·Filed 2007·Granted May 5, 2009·40 cites·27 claims
- 1193US11763181B2Metrology and process control for semiconductor manufacturingNOVA LTD·Filed 2021·Granted Sep 19, 2023·3 cites·20 claims
- 1293US9678421B2Target element types for process parameter metrologyKLA TENCOR CORP·Filed 2015·Granted Jun 13, 2017·22 cites·22 claims
- 1393US9104120B2Structured illumination for contrast enhancement in overlay metrologySELIGSON JOEL·Filed 2012·Granted Aug 11, 2015·13 cites·25 claims
- 1493US8908175B1Flexible scatterometry metrology system and methodKANDEL DANIEL·Filed 2006·Granted Dec 9, 2014·26 cites·36 claims
- 1593US8896832B2Discrete polarization scatterometryHILL ANDREW V·Filed 2011·Granted Nov 25, 2014·25 cites·35 claims
- 1693US7616313B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2006·Granted Nov 10, 2009·17 cites·36 claims
- 1792US10591406B2Symmetric target design in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Mar 17, 2020·6 cites·20 claims
- 1892US9958385B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2014·Granted May 1, 2018·9 cites·36 claims
- 1992US9851300B1Decreasing inaccuracy due to non-periodic effects on scatterometric signalsKLA TENCOR CORP·Filed 2015·Granted Dec 26, 2017·12 cites·20 claims
- 2092US9093458B2Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targetsAMIR NURIEL·Filed 2013·Granted Jul 28, 2015·31 cites·20 claims
- 2192US8848186B2Angle-resolved antisymmetric scatterometryKANDEL DANIEL·Filed 2010·Granted Sep 30, 2014·8 cites·17 claims
- 2291US10203247B2Systems for providing illumination in optical metrologyKLA TENCOR CORP·Filed 2016·Granted Feb 12, 2019·10 cites·21 claims
- 2391US9454072B2Method and system for providing a target design displaying high sensitivity to scanner focus changeKLA TENCOR CORP·Filed 2013·Granted Sep 27, 2016·12 cites·21 claims
- 2490US9927718B2Multi-layer overlay metrology target and complimentary overlay metrology measurement systemsKANDEL DANIEL·Filed 2011·Granted Mar 27, 2018·9 cites·24 claims
- 2590US9581430B2Phase characterization of targetsKLA TENCOR CORP·Filed 2013·Granted Feb 28, 2017·15 cites·12 claims
- 2690US8142966B2Substrate matrix to decouple tool and process effectsIZIKSON PAVEL·Filed 2009·Granted Mar 27, 2012·16 cites·20 claims
- 2789US10533940B2Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrologyKLA TENCOR CORP·Filed 2018·Granted Jan 14, 2020·2 cites·20 claims
- 2889US9934353B2Focus measurements using scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 3, 2018·5 cites·22 claims
- 2989US9903711B2Feed forward of metrology data in a metrology systemKLA TENCOR CORP·Filed 2016·Granted Feb 27, 2018·5 cites·33 claims
- 3089US9784987B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·5 cites·26 claims
- 3189US8582114B2Overlay metrology by pupil phase analysisMANASSEN AMNON·Filed 2011·Granted Nov 12, 2013·7 cites·23 claims
- 3288US8913237B2Device-like scatterometry overlay targetsKLA TENCOR CORP·Filed 2013·Granted Dec 16, 2014·9 cites·18 claims
- 3387US10571811B2Device metrology targets and methodsKLA TENCOR CORP·Filed 2016·Granted Feb 25, 2020·5 cites·25 claims
- 3486US10101592B2Self-moiré target design principles for measuring unresolved device-like pitchesKLA TENCOR CORP·Filed 2017·Granted Oct 16, 2018·3 cites·14 claims
- 3586US9875946B2On-device metrologyKLA TENCOR CORP·Filed 2014·Granted Jan 23, 2018·8 cites·16 claims
- 3686US9164397B2Optics symmetrization for metrologyMANASSEN AMNON·Filed 2011·Granted Oct 20, 2015·7 cites·15 claims
- 3786US9091650B2Apodization for pupil imaging scatterometryKLA TENCOR CORP·Filed 2013·Granted Jul 28, 2015·5 cites·30 claims
- 3883US8655469B2Advanced process control optimizationCHOI DONGSUB·Filed 2011·Granted Feb 18, 2014·4 cites·15 claims
- 3983US7602491B2Optical gain approach for enhancement of overlay and alignment systems performanceKLA TENCOR CORP·Filed 2008·Granted Oct 13, 2009·13 cites·11 claims
- 4081US10831108B2Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrologyKLA CORP·Filed 2016·Granted Nov 10, 2020·5 cites·77 claims
- 4181US9841689B1Approach for model calibration used for focus and dose measurementKLA TENCOR CORP·Filed 2015·Granted Dec 12, 2017·2 cites·17 claims
- 4280US12236364B2Metrology and process control for semiconductor manufacturingNOVA LTD·Filed 2023·Granted Feb 25, 2025·0 cites·18 claims
- 4380US11372340B2Method and system for providing a quality metric for improved process controlKANDEL DANIEL·Filed 2012·Granted Jun 28, 2022·4 cites·22 claims
- 4480US9645079B2Structured illumination for contrast enhancement in overlay metrologyKLA TENCOR CORP·Filed 2015·Granted May 9, 2017·2 cites·28 claims
- 4579US12117347B2Metrology target design for tilted device designsKLA CORP·Filed 2016·Granted Oct 15, 2024·2 cites·40 claims
- 4679US9620426B2Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolationIZIKSON PAVEL·Filed 2011·Granted Apr 11, 2017·5 cites·21 claims
- 4778US7526749B2Methods and apparatus for designing and using micro-targets in overlay metrologyKLA TENCOR TECH CORP·Filed 2006·Granted Apr 28, 2009·6 cites·4 claims
- 4876US10685165B2Metrology using overlay and yield critical patternsKLA TENCOR CORP·Filed 2016·Granted Jun 16, 2020·2 cites·6 claims
- 4976US9869543B2Reducing algorithmic inaccuracy in scatterometry overlay metrologyKLA TENCOR CORP·Filed 2014·Granted Jan 16, 2018·4 cites·25 claims
- 5076US2025035489A1Metrology target design for tilted device designsKLA CORP·Filed 2024·Application pending·0 cites
Showing the top 50 of 70 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →