Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method

Abstract

A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.

1. A measurement apparatus comprising:
 a first detector that measures an intensity of a line-shaped beam from a light source, said first detector configured such that the intensity of the line-shaped beam from the light source is integrated over the entire range of the beam in the vertical direction of the beam;  
 a second detector for measuring the intensity of the beam at a plurality of points where positions along the vertical direction of the beam are different; and  
 a calculator for calculating a beam profile in the vertical direction of the beam on the basis of the detections by said first and second detectors.  
 
   
   
     2. A measurement method comprising the steps of:
 measuring an intensity of a line-shaped beam, the intensity being integrated over the entire range of the beam in the vertical direction of the beam;  
 measuring the intensity of the beam at plurality of points where positions along the vertical direction of the beam are different; and  
 calculating a beam profile in the vertical direction of the beam on the basis of the respective measumrents.  
 
   
   
     3. An exposure apparatus comprising:
 a mirror for reflecting a beam from a light source;  
 a stage which holds a substrate to be exposed to the beam; and  
 a measuring device disposed for measuring intensity distribution of the beam irradiating the substrate, the measuring device comprising:  
 a first detector that measures an intensity of a line-shaped beam, said first detector configured such that the intensity of the line-shaped beam is integrated over the entire range of the beam in the vertical direction of the beam;  
 a second detector for measuring the intensity of the beam at a plurality of points where positions along the vertical direction of the beam are different; and  
 calculating means for calculating a beam profile in the vertical direction of the beam on the basis of the detections by said first and second detectors.  
 
   
   
     4. An exposure apparatus comprising:
 a mirror for reflecting a beam from a light source;  
 a stage which holds a substrate to be exposed to the beam; and  
 a measuring device having a measuring method for measuring intensity distribution of a line-shaped beam irradiating the substrate, the measuring method comprising:  
 measuring an intensity of a line-shaped beam, the intensity being integrated over the entire range of the beam in the vertical direction of the beam;  
 measuring the intensity of the beam at a plurality of points where positions along the vertical direction of the beam are different; and  
 calculating a beam profile in the vertical direction of the beam on the basis of the respective measurements.