Retaining ring and articles for carrier head

Abstract

A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.

What is claimed is: 
     
       1. A retaining ring for a chemical mechanical polishing head, comprising:
 an upper portion configured to be secured to a base; and 
 a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the lower portion includes a material selected from the group consisting of perfluoroalkoxy and polyetherketoneketone. 
 
     
     
       2. The retaining ring of  claim 1 , wherein the lower portion consists of perfluoroalkoxy. 
     
     
       3. The retaining ring of  claim 1 , wherein the lower portion consists of polyetherketoneketone. 
     
     
       4. The retaining ring of  claim 1 , wherein the lower portion includes at least one of graphite or carbon fibers. 
     
     
       5. The retaining ring of  claim 4 , wherein the lower portion includes perfluoroalkoxy. 
     
     
       6. The retaining ring of  claim 4 , wherein the lower portion includes polyetherketoneketone. 
     
     
       7. The retaining ring of  claim 1 , wherein the upper portion is more rigid than the lower portion. 
     
     
       8. The retaining ring of  claim 7 , wherein the upper portion comprises stainless steel or aluminum. 
     
     
       9. The retaining ring of  claim 1 , wherein the upper portion and the lower portion are the same material. 
     
     
       10. A carrier head for chemical mechanical polishing, comprising:
 a base; 
 a mounting assembly attached to the base having a surface for contacting a substrate; and 
 a retainer having an upper portion configured to be secured to a base and a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the lower portion includes a material selected from the group consisting of perfluoroalkoxy and polyetherketoneketone. 
 
     
     
       11. The carrier head of  claim 10 , wherein the lower portion consists of perfluoroalkoxy. 
     
     
       12. The carrier head of  claim 10 , wherein the lower portion consists of polyetherketoneketone. 
     
     
       13. The carrier head of  claim 10 , wherein the lower portion includes at least one of graphite or carbon fibers. 
     
     
       14. The carrier head of  claim 13 , wherein the lower portion includes perfluoroalkoxy. 
     
     
       15. The carrier head of  claim 13 , wherein the lower portion includes polyetherketoneketone. 
     
     
       16. The carrier head of  claim 10 , wherein the upper portion is more rigid than the lower portion. 
     
     
       17. The carrier head of  claim 16 , wherein the upper portion comprises stainless steel or aluminum. 
     
     
       18. The carrier head of  claim 10 , wherein the upper portion and the lower portion are the same material.