Inventor · disambiguated record
Julien Gatineau
Also filed as: GATINEAU JULIEN
30 granted patents·20 pending applications·552 citations·filing 2004–2022
95Inventor score
Files withAIR LIQUIDE16GATINEAU JULIEN13L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude5DUSSARRAT CHRISTIAN4L AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE4
Top patents by PatentIndex Score
50 records- 0198US8227032B2Method of forming silicon oxide containing filmsDUSSARRAT CHRISTIAN·Filed 2006·Granted Jul 24, 2012·472 cites·12 claims
- 0292US9109281B2Metal heterocyclic compounds for deposition of thin filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2014·Granted Aug 18, 2015·6 cites·20 claims
- 0388US8691668B2Dihalide germanium(II) precursors for germanium-containing film depositionsGATINEAU JULIEN·Filed 2010·Granted Apr 8, 2014·9 cites·17 claims
- 0487US10364259B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2016·Granted Jul 30, 2019·2 cites·21 claims
- 0587US8092721B2Deposition of ternary oxide films containing ruthenium and alkali earth metalsGATINEAU SATOKO·Filed 2009·Granted Jan 10, 2012·8 cites·9 claims
- 0686US8546276B2Deposition of group IV metal-containing films at high temperatureGATINEAU JULIEN·Filed 2010·Granted Oct 1, 2013·5 cites·14 claims
- 0785US9633838B2Vapor deposition of silicon-containing films using penta-substituted disilanesL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2015·Granted Apr 25, 2017·4 cites·5 claims
- 0884US8101237B2Tellurium precursors for film depositionOKUBO SHINGO·Filed 2009·Granted Jan 24, 2012·7 cites·10 claims
- 0983US7544389B2Precursor for film formation and method for forming ruthenium-containing filmAIR LIQUIDE·Filed 2005·Granted Jun 9, 2009·8 cites·17 claims
- 1082US9416443B2Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursorsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2012·Granted Aug 16, 2016·5 cites·20 claims
- 1182US8753718B2Method for the deposition of a ruthenium-containing filmL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2013·Granted Jun 17, 2014·4 cites·19 claims
- 1279US9240319B2Chalcogenide-containing precursors, methods of making, and methods of using the same for thin film depositionGATINEAU JULIEN·Filed 2010·Granted Jan 19, 2016·7 cites·12 claims
- 1376US9206507B2Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing films depositionsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2012·Granted Dec 8, 2015·3 cites·18 claims
- 1474US8802194B2Tellurium precursors for film depositionISHII HANA·Filed 2011·Granted Aug 12, 2014·2 cites·20 claims
- 1573US8636845B2Metal heterocyclic compounds for deposition of thin filmsGATINEAU JULIEN·Filed 2009·Granted Jan 28, 2014·6 cites·16 claims
- 1671US2020032397A1Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2019·Application pending·0 cites
- 1769US9187511B2Titanium-aluminum alloy deposition with titanium-tetrahydroaluminate bimetallic moleculesL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2013·Granted Nov 17, 2015·1 cites·16 claims
- 1868US8404306B2Method for the deposition of a ruthenium containing filmDUSSARRAT CHRISTIAN·Filed 2006·Granted Mar 26, 2013·2 cites·7 claims
- 1967US10895012B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameLAIR LIQUIDE SA POUR LETUDE ET LEXPLOITATION DES PROCEDES GEROGES CLAUDE·Filed 2019·Granted Jan 19, 2021·0 cites·17 claims
- 2067US10337104B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2016·Granted Jul 2, 2019·0 cites·20 claims
- 2167US8658249B2Heteroleptic iridium precursors to be used for the deposition of iridium-containing filmsAIR LIQUIDE AMERICAN·Filed 2012·Granted Feb 25, 2014·0 cites·14 claims
- 2266US8309174B2Heteroleptic iridium precursors to be used for the deposition of iridium-containing filmsGATINEAU JULIEN·Filed 2009·Granted Nov 13, 2012·0 cites·13 claims
- 2365US12467134B2Method for deposition of gallium-containing film with gallium precursorsAIR LIQUIDE·Filed 2022·Granted Nov 11, 2025·0 cites·20 claims
- 2465US10465289B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2016·Granted Nov 5, 2019·0 cites·9 claims
- 2559US9543144B2Vapor deposition of chalcogenide-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2014·Granted Jan 10, 2017·1 cites·17 claims
- 2659US2012070582A1Deposition of ternary oxide films containing ruthenium and alkali earth metalsGATINEAU SATOKO·Filed 2011·Application pending·0 cites
- 2757US2009028745A1Ruthenium precursor with two differing ligands for use in semiconductor applicationsGATINEAU JULIEN·Filed 2008·Application pending·0 cites
- 2854US2019027357A1Vapor disposition of silicon-containing films using penta-substituted disilanesAIR LIQUIDE·Filed 2018·Application pending·0 cites
- 2953US8613976B2Method of forming silicon oxide containing filmsDUSSARRAT CHRISTIAN·Filed 2012·Granted Dec 24, 2013·0 cites·7 claims
- 3053US2024384400A1Method of forming a ruthenium-containing layer and laminateAIR LIQUIDE·Filed 2022·Application pending·0 cites
- 3152US9790591B2Titanium-containing film forming compositions for vapor deposition of titanium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2015·Granted Oct 17, 2017·0 cites·20 claims
- 3251US2016032454A1Bis(alkylimido)-bis(alkylamido)tungsten molecules for deposition of tungsten-containing filmsAIR LIQUIDE·Filed 2013·Application pending·0 cites
- 3350US2016040289A1Bis(alkylimido)-bis(alkylamido)molybdenum molecules for deposition of molybdenum-containing filmsGATINEAU JULIEN·Filed 2014·Application pending·0 cites
- 3450US2010104755A1Deposition method of ternary filmsDUSSARRAT CHRISTIAN·Filed 2005·Application pending·0 cites
- 3550US2017186597A1Vapor deposition of silicon-containing films using penta-substituted disilanesL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2017·Application pending·0 cites
- 3649US2008253948A1Method for the recycling and purification of an inorganic metallic precursorGATINEAU JULIEN·Filed 2008·Application pending·0 cites
- 3748US7807223B2Precursors having open ligands for ruthenium containing films depositionAIR LIQUIDE·Filed 2007·Granted Oct 5, 2010·0 cites·1 claims
- 3848US2022372053A1Stable bis(alkyl-arene) transition metal complexes and methods of film deposition using the sameAIR LIQUIDE·Filed 2021·Application pending·0 cites
- 3946US10309010B2Cobalt-containing compounds, their synthesis, and use in cobalt-containing film depositionAIR LIQUIDE·Filed 2014·Granted Jun 4, 2019·0 cites·18 claims
- 4046US8557339B2Method for the deposition of a Ruthenium containing filmGATINEAU JULIEN·Filed 2007·Granted Oct 15, 2013·0 cites·11 claims
- 4146US2011206862A1Titanium Nitride Film Deposition by Vapor Deposition Using Cyclopentadienyl Alkylamino Titanium PrecursorsAIR LIQUIDE·Filed 2011·Application pending·0 cites
- 4246US2008121249A1Method for Cleaning Film-Forming ApparatusesGATINEAU JULIEN·Filed 2004·Application pending·0 cites
- 4346US2009162973A1Germanium precursors for gst film depositionGATINEAU JULIEN·Filed 2008·Application pending·0 cites
- 4446US2012308739A1Methods for deposition of alkaline earth metal fluoride filmsLANSALOT-MATRAS CLEMENT·Filed 2012·Application pending·0 cites
- 4544US2008152793A1Method for the deposition of a ruthenium containing film with aryl and diene containing complexesAIR LIQUIDE·Filed 2007·Application pending·0 cites
- 4643US2011020547A1High dielectric constant films deposited at high temperature by atomic layer depositionGATINEAU JULIEN·Filed 2009·Application pending·0 cites
- 4743US2016002786A1Bis(alkylimido)-bis(alkylamido)molybdenum molecules for deposition of molybdenum-containing filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET I EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2015·Application pending·0 cites
- 4842US2011262660A1Chalcogenide-containing precursors, methods of making, and methods of using the same for thin film depositionAIR LIQUIDE·Filed 2010·Application pending·0 cites
- 4941US8859047B2Use of ruthenium tetroxide as a precursor and reactant for thin film depositionsGATINEAU JULIEN·Filed 2010·Granted Oct 14, 2014·0 cites·8 claims
- 5041US2005238808A1Methods for producing ruthenium film and ruthenium oxide filmAIR LIQUIDE·Filed 2005·Application pending·0 cites
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