Inventor · disambiguated record
Damian Fiolka
Also filed as: FIOLKA DAMIAN
81 granted patents·35 pending applications·623 citations·filing 2002–2018
99Inventor score
Top patents by PatentIndex Score
116 records- 0197US8279524B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2005·Granted Oct 2, 2012·33 cites·16 claims
- 0296US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0396US7345740B2Polarized radiation in lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Mar 18, 2008·65 cites·25 claims
- 0495US8289623B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2010·Granted Oct 16, 2012·19 cites·26 claims
- 0595US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0695US7551261B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Jun 23, 2009·24 cites·20 claims
- 0795US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 0895US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0994US8259393B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2009·Granted Sep 4, 2012·34 cites·17 claims
- 1093US8320043B2Illumination apparatus for microlithographyprojection system including polarization-modulating optical elementFIOLKA DAMIAN·Filed 2008·Granted Nov 27, 2012·21 cites·20 claims
- 1192US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 1291US7714983B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2004·Granted May 11, 2010·38 cites·35 claims
- 1390US8270077B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2006·Granted Sep 18, 2012·20 cites·18 claims
- 1489US8237918B2Optical system of a microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2009·Granted Aug 7, 2012·11 cites·27 claims
- 1589US7995280B2Projection exposure system, beam delivery system and method of generating a beam of lightZEISS CARL SMT GMBH·Filed 2005·Granted Aug 9, 2011·14 cites·9 claims
- 1688US9304405B2Microlithography illumination system and microlithography illumination optical unitFIOLKA DAMIAN·Filed 2010·Granted Apr 5, 2016·5 cites·13 claims
- 1788US8482717B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2008·Granted Jul 9, 2013·11 cites·24 claims
- 1888US7408622B2Illumination system and polarizer for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·27 cites·71 claims
- 1987US8724086B2Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisationLAYH MICHAEL·Filed 2010·Granted May 13, 2014·4 cites·24 claims
- 2087US8035803B2Subsystem of an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2007·Granted Oct 11, 2011·10 cites·17 claims
- 2186US9091945B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Jul 28, 2015·3 cites·22 claims
- 2285US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 2383US7782443B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Granted Aug 24, 2010·5 cites·15 claims
- 2482US10151982B2Illumination system of a microlithographic projection exposure apparatus with a birefringent elementZEISS CARL SMT GMBH·Filed 2016·Granted Dec 11, 2018·2 cites·23 claims
- 2582US8004656B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2006·Granted Aug 23, 2011·5 cites·18 claims
- 2680US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 2778US8891057B2Microlithographic projection exposure apparatusLAYH MICHAEL·Filed 2010·Granted Nov 18, 2014·2 cites·21 claims
- 2877US9454085B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Sep 27, 2016·1 cites·25 claims
- 2977US8711479B2Illumination apparatus for microlithography projection system including polarization-modulating optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Apr 29, 2014·1 cites·9 claims
- 3077US8542356B2Measurement method and measurement system for measuring birefringenceFIOLKA DAMIAN·Filed 2011·Granted Sep 24, 2013·5 cites·20 claims
- 3177US8077289B2Device and method for influencing the polarization distribution in an optical systemFIOLKA DAMIAN·Filed 2008·Granted Dec 13, 2011·7 cites·30 claims
- 3276US9013680B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Apr 21, 2015·2 cites·22 claims
- 3376US8025427B2Filter device for the compensation of an asymmetric pupil illuminationZEISS CARL SMT GMBH·Filed 2010·Granted Sep 27, 2011·2 cites·21 claims
- 3475US7916391B2Apparatus for providing a pattern of polarizationZEISS CARL SMT GMBH·Filed 2005·Granted Mar 29, 2011·3 cites·37 claims
- 3574US8264668B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2009·Granted Sep 11, 2012·5 cites·16 claims
- 3674US8068279B2Optical system of an illumination device of a projection exposure apparatusSCHUSTER KARL-HEINZ·Filed 2007·Granted Nov 29, 2011·10 cites·39 claims
- 3774US8040492B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Oct 18, 2011·3 cites·20 claims
- 3873US9778576B2Microlithography illumination system and microlithography illumination optical unitZEISS CARL SMT GMBH·Filed 2016·Granted Oct 3, 2017·1 cites·20 claims
- 3973US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 4073US8928859B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2012·Granted Jan 6, 2015·2 cites·20 claims
- 4173US7940375B2Transmission filter apparatusZEISS CARL SMT GMBH·Filed 2005·Granted May 10, 2011·3 cites·37 claims
- 4268US9588435B2EUV microlithography projection exposure apparatus with a heat light sourceZEISS CARL SMT GMBH·Filed 2013·Granted Mar 7, 2017·1 cites·24 claims
- 4368US9063336B2Optical element having a plurality of reflective facet elementsKIRCH MARC·Filed 2012·Granted Jun 23, 2015·3 cites·29 claims
- 4467US8480261B2Filter device for the compensation of an asymmetric pupil illuminationMAUL MANFRED·Filed 2012·Granted Jul 9, 2013·1 cites·21 claims
- 4567US8395753B2Microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Mar 12, 2013·1 cites·24 claims
- 4667US7798676B2Filter device for the compensation of an asymmetric pupil illuminationZEISS CARL SMT AG·Filed 2005·Granted Sep 21, 2010·2 cites·26 claims
- 4766US9170499B2Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 27, 2015·1 cites·20 claims
- 4866US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 4965US2019094704A1Polarization-modulating optical elementZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 5065US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
Showing the top 50 of 116 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Damian Fiolka files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →