Inventor · disambiguated record
Dong Li
Also filed as: LI DONG · LI DONG QING
19 granted patents·12 pending applications·1,406 citations·filing 1995–2024
95Inventor score
Top patents by PatentIndex Score
31 records- 0198US8841182B1Silane and borane treatments for titanium carbide filmsASM IP HOLDING BV·Filed 2013·Granted Sep 23, 2014·529 cites·22 claims
- 0297US9228259B2Method for treatment of deposition reactorASM IP HOLDING BV·Filed 2014·Granted Jan 5, 2016·515 cites·14 claims
- 0396US11976361B2Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatusASM IP HOLDING BV·Filed 2022·Granted May 7, 2024·2 cites·14 claims
- 0495US11306395B2Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatusASM IP HOLDING BV·Filed 2017·Granted Apr 19, 2022·7 cites·14 claims
- 0594US5776615ASuperhard composite materials including compounds of carbon and nitrogen deposited on metal and metal nitride, carbide and carbonitrideUNIV NORTHWESTERN·Filed 1995·Granted Jul 7, 1998·150 cites·11 claims
- 0693US7205240B2HDP-CVD multistep gapfill processAPPLIED MATERIALS INC·Filed 2003·Granted Apr 17, 2007·114 cites·36 claims
- 0789US7666474B2Plasma-enhanced pulsed deposition of metal carbide filmsASM INC·Filed 2008·Granted Feb 23, 2010·17 cites·31 claims
- 0888US8329569B2Deposition of ruthenium or ruthenium dioxideLI DONG·Filed 2010·Granted Dec 11, 2012·9 cites·33 claims
- 0986US10872771B2Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structuresASM IP HOLDING BV·Filed 2019·Granted Dec 22, 2020·4 cites·16 claims
- 1086US9236247B2Silane and borane treatments for titanium carbide filmsASM IP HOLDING BV·Filed 2014·Granted Jan 12, 2016·5 cites·22 claims
- 1184US11056567B2Method of forming a doped metal carbide film on a substrate and related semiconductor device structuresASM IP HOLDING BV·Filed 2019·Granted Jul 6, 2021·3 cites·29 claims
- 1282US9631272B2Atomic layer deposition of metal carbide films using aluminum hydrocarbon compoundsASM INC·Filed 2013·Granted Apr 25, 2017·4 cites·13 claims
- 1372US6812153B2Method for high aspect ratio HDP CVD gapfillAPPLIED MATERIALS INC·Filed 2002·Granted Nov 2, 2004·13 cites·7 claims
- 1471US5725913ASuperhard composite materials including compounds of carbon and nitrogen deposited on metal and metal nitride carbide and carbonitrideUNIV NORTHWESTERN·Filed 1996·Granted Mar 10, 1998·32 cites·12 claims
- 1565US11967488B2Method for treatment of deposition reactorASM IP HOLDING BV·Filed 2022·Granted Apr 23, 2024·0 cites·19 claims
- 1661US11501973B2Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structuresASM IP HOLDING BV·Filed 2020·Granted Nov 15, 2022·0 cites·18 claims
- 1758US2021328036A1Method for forming a doped metal carbide film on a substrate and related semiconductor device structuresASM IP HOLDING BV·Filed 2021·Application pending·0 cites
- 1857US9583348B2Silane and borane treatments for titanium carbide filmsASM IP HOLDING BV·Filed 2016·Granted Feb 28, 2017·0 cites·20 claims
- 1957US2023298902A1Systems and methods for deposition of molybdenum for source/drain contactsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 2056US2017154778A1Silane and borane treatments for titanium carbide filmsASM IP HOLDING BV·Filed 2017·Application pending·0 cites
- 2155US2009315093A1Atomic layer deposition of metal carbide films using aluminum hydrocarbon compoundsASM INC·Filed 2009·Application pending·0 cites
- 2254US2024420958A1Method, system, and apparatus for deposition of transition metal filmASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 2354US2023160057A1Metal-on-metal deposition methods for filling a gap feature on a substrate surfaceASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 2451US9466574B2Plasma-enhanced atomic layer deposition of conductive material over dielectric layersASM INC·Filed 2013·Granted Oct 11, 2016·0 cites·12 claims
- 2551US2023215763A1Systems and methods for cleaning and treating a surface of a substrateASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 2651US2023163028A1Metal-on-metal deposition methods for filling a gap feature on a substrate surfaceASM IP HOLDING BV·Filed 2022·Application pending·0 cites
- 2750US7064077B2Method for high aspect ratio HDP CVD gapfillAPPLIED MATERIALS INC·Filed 2004·Granted Jun 20, 2006·2 cites·20 claims
- 2849US2016115590A1Method and system for treatment of deposition reactorASM IP HOLDING BV·Filed 2016·Application pending·0 cites
- 2948US2023238243A1Structure and device including metal carbon nitride layer and method of forming sameASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 3046US2016376700A1System for treatment of deposition reactorASM IP HOLDING BV·Filed 2016·Application pending·0 cites
- 3141US2012100308A1Ternary metal alloys with tunable stoichiometriesMILLIGAN ROBERT B·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →