Inventor · disambiguated record
Martin Jeffrey Salinas
Also filed as: SALINAS MARTIN J · SALINAS MARTIN JEFFREY
31 granted patents·18 pending applications·168 citations·filing 2006–2025
96Inventor score
Top patents by PatentIndex Score
49 records- 0195US7846497B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Dec 7, 2010·37 cites·21 claims
- 0294US10204805B2Thin heated substrate supportAPPLIED MATERIALS INC·Filed 2016·Granted Feb 12, 2019·10 cites·19 claims
- 0393US7775236B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·25 cites·20 claims
- 0490US7967996B2Process for wafer backside polymer removal and wafer front side photoresist removalAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·16 cites·20 claims
- 0589US10090181B2Method and apparatus for substrate transfer and radical confinementLEE JARED AHMAD·Filed 2012·Granted Oct 2, 2018·9 cites·15 claims
- 0689US7879183B2Apparatus and method for front side protection during backside cleaningAPPLIED MATERIALS INC·Filed 2008·Granted Feb 1, 2011·13 cites·25 claims
- 0788US11965241B2Cluster tools, systems, and methods having one or more pressure stabilization chambersAPPLIED MATERIALS INC·Filed 2022·Granted Apr 23, 2024·2 cites·19 claims
- 0887US8074677B2Method and apparatus for controlling gas flow to a processing chamberGOLD EZRA ROBERT·Filed 2007·Granted Dec 13, 2011·19 cites·20 claims
- 0986US12325914B2Precursor delivery system and method for cyclic depositionEUGENUS INC·Filed 2022·Granted Jun 10, 2025·1 cites·21 claims
- 1086US8329593B2Method and apparatus for removing polymer from the wafer backside and edgeYOUSIF IMAD·Filed 2007·Granted Dec 11, 2012·14 cites·17 claims
- 1184US10566205B2Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2013·Granted Feb 18, 2020·4 cites·20 claims
- 1284US7552736B2Process for wafer backside polymer removal with a ring of plasma under the waferAPPLIED MATERIALS INC·Filed 2007·Granted Jun 30, 2009·9 cites·10 claims
- 1381US12094715B2Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2023·Granted Sep 17, 2024·0 cites·17 claims
- 1480US8414736B2Plasma reactor with tiltable overhead RF inductive sourceCOLLINS KENNETH S·Filed 2010·Granted Apr 9, 2013·4 cites·11 claims
- 1575US9947559B2Thermal management of edge ring in semiconductor processingAPPLIED MATERIALS INC·Filed 2012·Granted Apr 17, 2018·3 cites·18 claims
- 1674US2025297364A1Precursor delivery system and method for cyclic depositionEUGENUS INC·Filed 2025·Application pending·0 cites
- 1772US11574831B2Method and apparatus for substrate transfer and radical confinementAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·0 cites·18 claims
- 1872US11171008B2Abatement and strip process chamber in a dual load lock configurationAPPLIED MATERIALS INC·Filed 2019·Granted Nov 9, 2021·1 cites·20 claims
- 1968US2025285846A1Plasma preclean system for cluster toolAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2067US2024018688A1Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operationsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2166US10943788B2Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2019·Granted Mar 9, 2021·0 cites·19 claims
- 2265US12467144B2Methods of correlating zones of processing chambers, and related systems and methodsAPPLIED MATERIALS INC·Filed 2022·Granted Nov 11, 2025·0 cites·13 claims
- 2365US2020144067A1Abatement and strip process chamber in a load lock configurationAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2463US2024021444A1Batch processing apparatus, systems, and related methods and structures for epitaxial deposition operationsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2562US12428731B2Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustabilityAPPLIED MATERIALS INC·Filed 2022·Granted Sep 30, 2025·0 cites·22 claims
- 2662US12243761B2Detection and analysis of substrate support and pre-heat ring in a process chamber via imagingAPPLIED MATERIALS INC·Filed 2022·Granted Mar 4, 2025·0 cites·19 claims
- 2762US9464732B2Apparatus for uniform pumping within a substrate process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Oct 11, 2016·1 cites·20 claims
- 2861US10991552B2Cooling mechanism utilized in a plasma reactor with enhanced temperature regulationAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·0 cites·20 claims
- 2960US2024384413A1Showerhead assembly for cyclic vapor deposition with enhanced gas mixingEUGENUS INC·Filed 2024·Application pending·0 cites
- 3059US12334318B2Plasma preclean system for cluster toolAPPLIED MATERIALS INC·Filed 2022·Granted Jun 17, 2025·0 cites·12 claims
- 3158US11177136B2Abatement and strip process chamber in a dual loadlock configurationAPPLIED MATERIALS INC·Filed 2019·Granted Nov 16, 2021·0 cites·17 claims
- 3256US10249475B2Cooling mechanism utlized in a plasma reactor with enhanced temperature regulationAPPLIED MATERIALS INC·Filed 2014·Granted Apr 2, 2019·0 cites·15 claims
- 3356US9330887B2Plasma reactor with tiltable overhead RF inductive sourceAPPLIED MATERIALS INC·Filed 2013·Granted May 3, 2016·0 cites·8 claims
- 3455US9587789B2Methods and apparatus for providing a gas mixture to a pair of process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Mar 7, 2017·0 cites·18 claims
- 3555US2024035162A1System and method for auto correction of substrate misalignmentAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3654US2024254627A1Injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing of semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3754US2025118576A1Chamber kits, processing chambers, and methods for gas activation in semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3853US2024062993A1Temperature-controlled showerhead assembly for cyclic vapor depositionEUGENUS INC·Filed 2023·Application pending·0 cites
- 3952US12428753B2Lift assemblies, and related methods and components, for substrate processing chambersAPPLIED MATERIALS INC·Filed 2023·Granted Sep 30, 2025·0 cites·19 claims
- 4049US9885567B2Substrate placement detection in semiconductor equipment using thermal response characteristicsAPPLIED MATERIALS INC·Filed 2014·Granted Feb 6, 2018·0 cites·19 claims
- 4149US2022267898A1Precursor delivery system and method for high speed cyclic depositionEUGENUS INC·Filed 2022·Application pending·0 cites
- 4247US10453694B2Abatement and strip process chamber in a dual loadlock configurationLEE JARED AHMAD·Filed 2012·Granted Oct 22, 2019·0 cites·20 claims
- 4346US2011120505A1Apparatus and method for front side protection during backside cleaningAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 4446US2013334199A1Thin heated substrate supportYOUSIF IMAD·Filed 2012·Application pending·0 cites
- 4544US2008179287A1Process for wafer backside polymer removal with wafer front side gas purgeCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 4644US2008179288A1Process for wafer backside polymer removal and wafer front side scavenger plasmaCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 4742US2007254493A1Integrated thermal unit having vertically arranged bake and chill platesAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 4841US2013105085A1Plasma reactor with chamber wall temperature controlAPPLIED MATERIALS INC·Filed 2012·Application pending·0 cites
- 4939US2012222813A1Vacuum chambers with shared pumpPAL ANIRUDDHA·Filed 2012·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Martin Jeffrey Salinas files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →